Patent classifications
G01B21/00
MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFACTURING METHOD
A measurement system used in a manufacturing line for micro-devices includes: a plurality of measurement devices in which each device performs measurement processing on a substrate; and a carrying system to perform delivery of a substrate with the plurality of measurement devices. The plurality of measurement devices includes a first measurement device that acquires position information on a plurality of marks formed on a substrate, and a second measurement device that acquires position information on a plurality of marks formed on a substrate. Position information on a plurality of marks formed on a substrate can be acquired under a setting of a first predetermined condition in the first measurement device, and position information on a plurality of marks formed on another substrate can be acquired under a setting of a second predetermined condition different from the first predetermined condition in the second measurement device.
CONTROL SYSTEM FOR DETERMINING SENSOR BLOCKAGE FOR A MACHINE
A control system for a machine including a perception system comprising at least one sensor disposed on the machine and generating data signals pertaining to the machine and an environment associated with the machine and a controller communicably coupled to the perception system for receiving the data signals from the at least one sensor and determining from the data signals terrain features associated with the work site and presence of one or more objects on the work site or the machine, determining geometry of the at least one sensor, location of the at least one sensor on the machine, generating a field of view for the at least one sensor, estimating cast shadow for at least one object of the one or more objects based on the geometry and location of the at least one sensor and comparing the field of view with the cast shadow to determine sensor blockage.
Variable modelling of a measuring device
A method for providing static and dynamic position information of a designated point of a measuring device having a surface and a structure that includes the designated point and being arranged moveable relatively to the surface. The method includes defining a model for representing an actual position of the designated point relative to the surface and deriving the actual position of the designated point by a calculation based on the defined model. At least two cells are used to model the structure. The at least two cells are linearly arranged in a linear extension direction. At least one of the cells is a variable cell of a set of at least one variable cell and exhibits variable elongation as to the extension direction. An actual elongation of the at least one variable cell is set to model a positional change, particularly in linear extension direction, of the designated point.
Capsize risk level calculation system
Provided is a capsize risk level calculation system which can calculate a capsize risk level providing an index of the capsize risk on an oscillation of hull without using hull information. This system includes an acceleration sensor detecting a reciprocating motion in an up-down direction of a vessel as an oscillation in an up-down direction of a virtual oscillation center axis; an angular velocity sensor detecting a simple pendulum motion in a rolling direction around the vessel center axis as a simple pendulum motion of the vessel COG around the oscillation center axis; and an arithmetic part calculating a capsize risk level from an oscillation radius connecting between the oscillation center axis and the vessel COG, and a capsize limit oscillation radius connecting between the oscillation center axis and the vessel metacenter, which are obtained on the results of detection by the acceleration sensor and the angular velocity sensor.
Capsize risk level calculation system
Provided is a capsize risk level calculation system which can calculate a capsize risk level providing an index of the capsize risk on an oscillation of hull without using hull information. This system includes an acceleration sensor detecting a reciprocating motion in an up-down direction of a vessel as an oscillation in an up-down direction of a virtual oscillation center axis; an angular velocity sensor detecting a simple pendulum motion in a rolling direction around the vessel center axis as a simple pendulum motion of the vessel COG around the oscillation center axis; and an arithmetic part calculating a capsize risk level from an oscillation radius connecting between the oscillation center axis and the vessel COG, and a capsize limit oscillation radius connecting between the oscillation center axis and the vessel metacenter, which are obtained on the results of detection by the acceleration sensor and the angular velocity sensor.
Apparatus associated with analysis of thin film layer and manufacturing method thereof
An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).
Apparatus associated with analysis of thin film layer and manufacturing method thereof
An apparatus associated with an analysis of a thin film layer comprises two layer structures (100, 102) with a cavity (104) therebetween, and an opening (110) through one of the layer structures (102) to the cavity (104), the cavity (104) being configured to receive, through the opening (110), material used to form a thin film layer (900) inside the cavity (104). At least one of the two layer structures (100, 102) comprises at least one positional indicator (108) for an analysis associated with the thin film layer (900).
Information processing apparatus
A motion measurement apparatus according to an embodiment of the present technology includes a controller unit. The controller unit extracts, from an acceleration in each direction of three axes that includes a dynamic acceleration component and a static acceleration component of a detection target that moves within a space, the dynamic acceleration component of the detection target, and generates, as a control signal, a change in kinematic physical quantity of a posture of the detection target from the dynamic acceleration component.
Information processing apparatus
A motion measurement apparatus according to an embodiment of the present technology includes a controller unit. The controller unit extracts, from an acceleration in each direction of three axes that includes a dynamic acceleration component and a static acceleration component of a detection target that moves within a space, the dynamic acceleration component of the detection target, and generates, as a control signal, a change in kinematic physical quantity of a posture of the detection target from the dynamic acceleration component.
INERTIAL MEASUREMENT MODULE AND INERTIAL MEASUREMENT METHOD
An inertial measurement module comprising a depth measurement unit and an inertial data calculation unit is disclosed. When the inertial measurement module moves, the depth measurement unit keeps gathering depth data of the external environment in order to compute the coordinate transformations of a numbers of detected points in the external environment, and then, the inertial data calculation unit converts the coordinate transformations into inertial data of the inertial measurement module movement. Here, inertial data includes rotation and translation of the inertial measurement module on the X, Y and Z axes. Finally, the inertial measurement module outputs the transformed inertial data.