A housing has a front surface, a rear surface, and side surface connecting the front surface with the rear surface. The housing is formed by injection molding. A first sub-passage is formed in the housing and communicates a first sub-passage inlet formed in the front surface with a first sub-passage outlet formed in the rear surface. A second sub-passage is formed in the housing and communicates a second sub-passage inlet formed in a midway portion of the first sub-passage with a second sub-passage outlet at a position different from the first sub-passage outlet. A flow rate detection unit is provided in the second sub-passage. A mold parting mark is formed in the rear surface of the housing at a position away from an inner opening edge of the first sub-passage outlet.

A sensor system for measuring a gas liquid ratio of a two-phase fluid that flows through a pipe is provided. The sensor system includes a transmitter configured to transmit a radio wave into the pipe. The sensor system includes a receiver configured to receive the radio wave through the pipe. The sensor system includes a controller configured to calculate the gas liquid ratio based on both the radio wave received by the receiver and a decay time taken for attenuation of the radio wave after the transmitter terminates the transmission of the radio wave.

A sensor system for measuring a gas liquid ratio of a two-phase fluid that flows through a pipe is provided. The sensor system includes a transmitter configured to transmit a radio wave into the pipe. The sensor system includes a receiver configured to receive the radio wave through the pipe. The sensor system includes a controller configured to calculate the gas liquid ratio based on both the radio wave received by the receiver and a decay time taken for attenuation of the radio wave after the transmitter terminates the transmission of the radio wave.

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.

A flowmeter is configured to measure a flow rate of a gas flowing through a main passage. The flowmeter includes a housing and a flow rate detector. The housing is made of a resin and includes a bypass passage branched off from the main passage. The flow rate detector is disposed in the bypass passage and transmits detection signals in accordance with the flow rate of the gas flowing through the main passage. The housing includes a non-insulation portion including graphite.

A flowmeter is configured to measure a flow rate of a gas flowing through a main passage. The flowmeter includes a housing and a flow rate detector. The housing is made of a resin and includes a bypass passage branched off from the main passage. The flow rate detector is disposed in the bypass passage and transmits detection signals in accordance with the flow rate of the gas flowing through the main passage. The housing includes a non-insulation portion including graphite.

A differential pressure sensor is provided with an indicator assembly to represent the measured differential pressure. The sensor includes a cylindrical tube with a magnetic piston slidably disposed within. The indicator assembly is positioned adjacent to the tube and includes a first magnet having a first polarity direction and a second magnet having a second polarity direction. The magnets are provided in the indicator assembly such that the first and second polarity directions are parallel to one another. The first and second magnets are symmetrically disposed and offset from one another about a center of rotation of the indicator assembly.

Devices and methods are described herein for directly and accurately measuring sweat flow rates using miniaturized thermal flow rate sensors. The devices (100, 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1100, 1200, 1300, 1400, 1500) include the flow rate sensors (220, 320, 420, 520, 620, 720, 820, 920, 1020, 1120, 1220, 1320, 1420) in or adjacent to a microfluidic component (230, 330, 430, 530, 630, 730, 830, 930, 1030, 1130, 1230, 1330, 1430, 1530) of a wearable sweat sensing device. The devices and methods optimize the sensitivity of the flow rate sensors, while minimizing the presence of noise, in order to accurately and directly measure sweat flow rates.

Devices and methods are described herein for directly and accurately measuring sweat flow rates using miniaturized thermal flow rate sensors. The devices (100, 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1100, 1200, 1300, 1400, 1500) include the flow rate sensors (220, 320, 420, 520, 620, 720, 820, 920, 1020, 1120, 1220, 1320, 1420) in or adjacent to a microfluidic component (230, 330, 430, 530, 630, 730, 830, 930, 1030, 1130, 1230, 1330, 1430, 1530) of a wearable sweat sensing device. The devices and methods optimize the sensitivity of the flow rate sensors, while minimizing the presence of noise, in order to accurately and directly measure sweat flow rates.