An interferometric scattering microscope is adapted by performing spatial filtering of output light, which comprises both light scattered from a sample location and illuminating light reflected from the sample location, prior to detection of the output light. The spatial filtering passes the reflected illumination light but with a reduction in intensity that is greater within a predetermined numerical aperture than at larger numerical apertures. This enhances the imaging contrast for coherent illumination, particularly for objects that are weak scatterers.

A weight distribution measurement system includes a portable measuring device configured to measure a linear distance and store a plurality of measurements. The portable measuring device is also configured to measure a first distance between a first location on a vehicle supported by an axle of the vehicle and a second location, wherein the first distance is measured prior to loading the vehicle. The portable measuring device is also configured to measure a second distance between the first location and the second location, wherein the second distance is measured after loading a vehicle. And the portable measuring device can measure a third distance between the first location and the second location, wherein the third distance is measured after loading a vehicle and after a weight distribution mechanism has been engaged, and then calculate the percent weight distribution over the axles of the vehicle using the portable measuring device and display the percent weight distribution.

Provided are a porosity deriving method and a porosity deriving device capable of deriving a porosity of an inspection object being conveyed. The porosity deriving method of deriving a porosity of the inspection object includes: a basis weight measuring step including measuring a basis weight of a specific part of the inspection object being conveyed; a thickness measuring step including measuring a thickness of the specific part of the inspection object being conveyed; and a porosity deriving step including deriving a porosity of the inspection object from the basis weight, the thickness, and a true density of the inspection object.

A Parametric Disturbance Sensor is provided. The parametric disturbance sensor has a stripline enclosure having an internal chamber; a stripline sensor core positioned within the internal chamber; a fill material filling the internal chamber so that the stripline sensor is not in direct contact with the stripline sensor core enclosure; and a cable-end connector connected to the stripline sensor core for connecting the stripline sensor core to a processing unit.

A Parametric Disturbance Sensor is provided. The parametric disturbance sensor has a stripline enclosure having an internal chamber; a stripline sensor core positioned within the internal chamber; a fill material filling the internal chamber so that the stripline sensor is not in direct contact with the stripline sensor core enclosure; and a cable-end connector connected to the stripline sensor core for connecting the stripline sensor core to a processing unit.

Techniques herein include an apparatus and method for measuring and monitoring properties of fluids consumed in a semiconductor fabrication process. The apparatus includes a flow cell having a hollow chamber, a first chamber sidewall of the hollow chamber bisecting the length of the flow cell, the first chamber sidewall having a predetermined angle to the incoming direction of light from the first light source; a refractive index sensor configured to detect the light from the first light source transmitted through the hollow chamber of the flow cell and exiting the flow cell through the second flow cell sidewall of the at least six flow cell sidewalls; and a first light sensor configured to detect the light from the first light source scattered off the fluid in the hollow chamber.

Techniques herein include an apparatus and method for measuring and monitoring properties of fluids consumed in a semiconductor fabrication process. The apparatus includes a flow cell having a hollow chamber, a first chamber sidewall of the hollow chamber bisecting the length of the flow cell, the first chamber sidewall having a predetermined angle to the incoming direction of light from the first light source; a refractive index sensor configured to detect the light from the first light source transmitted through the hollow chamber of the flow cell and exiting the flow cell through the second flow cell sidewall of the at least six flow cell sidewalls; and a first light sensor configured to detect the light from the first light source scattered off the fluid in the hollow chamber.

An analysis device that includes a piezoelectric substrate having a pair of opposing principal surfaces; a groove disposed in one of the principal surfaces of the piezoelectric substrate and that forms a flow passage through which an analysis target flows; a first electrode disposed in at least a portion of a space inside the groove; and a second electrode disposed on another of the principal surfaces of the piezoelectric substrate so as to oppose the first electrode with the piezoelectric substrate disposed therebetween. A projection projects from a bottom surface of the groove, and at least one of the first electrode and an adsorption material is provided in a region extending from the bottom surface of the groove portion to a side surface of the projection.

Techniques herein include an apparatus and method for measuring and monitoring properties of fluids consumed in a semiconductor fabrication process. The apparatus includes a flow cell having a hollow chamber, a first chamber sidewall of the hollow chamber bisecting the length of the flow cell, the first chamber sidewall having a predetermined angle to the incoming direction of light from the first light source; a refractive index sensor configured to detect the light from the first light source transmitted through the hollow chamber of the flow cell and exiting the flow cell through the second flow cell sidewall of the at least six flow cell sidewalls; and a first light sensor configured to detect the light from the first light source scattered off the fluid in the hollow chamber.

Techniques herein include an apparatus and method for measuring and monitoring properties of fluids consumed in a semiconductor fabrication process. The apparatus includes a flow cell having a hollow chamber, a first chamber sidewall of the hollow chamber bisecting the length of the flow cell, the first chamber sidewall having a predetermined angle to the incoming direction of light from the first light source; a refractive index sensor configured to detect the light from the first light source transmitted through the hollow chamber of the flow cell and exiting the flow cell through the second flow cell sidewall of the at least six flow cell sidewalls; and a first light sensor configured to detect the light from the first light source scattered off the fluid in the hollow chamber.