G01J3/00

Optical local oscillator for all-optical time scales, and associated timekeeping methods

The frequency stability of an optical local oscillator is improved by locking a laser to a silicon Fabry-Perot cavity operating at a temperature near 124 K, where the coefficient of thermal expansion of silicon is near zero. The cavity is mounted inside a cryostat housed in a temperature-stabilized vacuum system that is surrounded by an isolating enclosure and supported by an active vibration platform. Laser light is steered with a superpolished mirror toward a superpolished focusing optic that couples the laser light into the cavity. Light reflected from the cavity is used to stabilize the laser via the Pound-Drever-Hall technique, while light transmitted through the cavity is used to stabilize the laser power. A resonant transimpedance amplifier allows the laser power to be reduced, which reduces heating of the cavity caused by residual absorption of the light.

Optical local oscillator for all-optical time scales, and associated timekeeping methods

The frequency stability of an optical local oscillator is improved by locking a laser to a silicon Fabry-Perot cavity operating at a temperature near 124 K, where the coefficient of thermal expansion of silicon is near zero. The cavity is mounted inside a cryostat housed in a temperature-stabilized vacuum system that is surrounded by an isolating enclosure and supported by an active vibration platform. Laser light is steered with a superpolished mirror toward a superpolished focusing optic that couples the laser light into the cavity. Light reflected from the cavity is used to stabilize the laser via the Pound-Drever-Hall technique, while light transmitted through the cavity is used to stabilize the laser power. A resonant transimpedance amplifier allows the laser power to be reduced, which reduces heating of the cavity caused by residual absorption of the light.

Polarization property image measurement device, and polarization property image measurement method

A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.

Polarization property image measurement device, and polarization property image measurement method

A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.

DMD based UV absorption detector for liquid chromatography

A detector for use in liquid chromatography is provided. The detector includes a light delivery system comprising a light source that emits one or more spectral lines of light of a light spectrum. The detector has an entrance slit configured to receive the one or more spectral lines of light and a wavelength selection module comprising a digital micro-mirror device. The digital micro-mirror device is configured to redirect the one or more spectral lines of light to a flow cell. The flow cell is optically connected to the wavelength selection module.

DMD based UV absorption detector for liquid chromatography

A detector for use in liquid chromatography is provided. The detector includes a light delivery system comprising a light source that emits one or more spectral lines of light of a light spectrum. The detector has an entrance slit configured to receive the one or more spectral lines of light and a wavelength selection module comprising a digital micro-mirror device. The digital micro-mirror device is configured to redirect the one or more spectral lines of light to a flow cell. The flow cell is optically connected to the wavelength selection module.

Labeling using an optical thickness measurement of a biosensor

A system detects an analyte suspected of being present in a sample. The reader reads an optical tag on a substrate, which is configured to immobilize the tag on a substrate surface. The optical tag is bound to a probe and includes a plurality of pores that create an effective index of refraction. The plurality of pores and a thickness of the tag are selected for a reflectance property. The substrate is configured to contact a sample suspected of comprising an analyte. The probe is capable of binding specifically to the analyte. The reader is configured to expose the tag to light to generate a sample spectral signature that is a function of the effective index of refraction, the thickness of the optical tag, and whether the analyte is coupled to the probe. The sample spectral signature is compared to a reference to detect the analyte in the sample.

Labeling using an optical thickness measurement of a biosensor

A system detects an analyte suspected of being present in a sample. The reader reads an optical tag on a substrate, which is configured to immobilize the tag on a substrate surface. The optical tag is bound to a probe and includes a plurality of pores that create an effective index of refraction. The plurality of pores and a thickness of the tag are selected for a reflectance property. The substrate is configured to contact a sample suspected of comprising an analyte. The probe is capable of binding specifically to the analyte. The reader is configured to expose the tag to light to generate a sample spectral signature that is a function of the effective index of refraction, the thickness of the optical tag, and whether the analyte is coupled to the probe. The sample spectral signature is compared to a reference to detect the analyte in the sample.

Fabrication of integrated computational elements using cylindrical substrate support shaped to match a cross-section of a spatial profile of a deposition plume

A system includes a computational system to receive a design of an integrated computational element (ICE) including specification of substrate and layers. Additionally, the system includes a deposition source to provide a deposition plume having a plume spatial profile, and a support having a cylindrical surface. The cylindrical surface of the support is spaced apart from the deposition source and has a shape that corresponds to the plume spatial profile in a particular cross-section orthogonal to a longitudinal axis of the cylindrical surface of the support, such that, when the substrate support, with the supported instances of the substrate distributed over the cylindrical surface of the substrate support, is translated relative to the deposition plume along the longitudinal axis of the cylindrical surface of the substrate support, thicknesses of instances of each of the deposited layers are substantially uniform across the plurality of instances of the ICE.

Fabrication of integrated computational elements using cylindrical substrate support shaped to match a cross-section of a spatial profile of a deposition plume

A system includes a computational system to receive a design of an integrated computational element (ICE) including specification of substrate and layers. Additionally, the system includes a deposition source to provide a deposition plume having a plume spatial profile, and a support having a cylindrical surface. The cylindrical surface of the support is spaced apart from the deposition source and has a shape that corresponds to the plume spatial profile in a particular cross-section orthogonal to a longitudinal axis of the cylindrical surface of the support, such that, when the substrate support, with the supported instances of the substrate distributed over the cylindrical surface of the substrate support, is translated relative to the deposition plume along the longitudinal axis of the cylindrical surface of the substrate support, thicknesses of instances of each of the deposited layers are substantially uniform across the plurality of instances of the ICE.