Patent classifications
G01J4/00
Polarization property image measurement device, and polarization property image measurement method
A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.
Polarization property image measurement device, and polarization property image measurement method
A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.
Variable aperture mask
A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.
Variable aperture mask
A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.
DISPLAY DEVICE AND OPTICAL INSPECTION METHOD FOR THE SAME
A display device includes: a substrate; a display element layer disposed on the substrate, where the display element layer includes a light emitting element which emits light; a polarizing film disposed on the display element layer, where the polarizing film includes a first polarizer having a first absorption axis extending to a first direction and a first transmission axis extending to a second direction orthogonal to the first direction; and a first layer disposed on one surface of the polarizing film, where the first layer has a first phase difference. Light emitted from the display element layer has a polarizing axis, and an angle between the polarizing axis and one of the first absorption axis and the first transmission axis is in a range of about 25 degrees to about 65 degrees.
Intraoral scanner that compensates for optical inaccuracies
A non-transitory medium includes instructions for generating a three-dimensional virtual model of an intraoral object by receiving surface scan data of the intraoral object while changing a position of at least one lens of focusing optics of an intraoral scanner, wherein the surface scan data comprises data for a plurality of points of the intraoral object, and adjusting the data for one or more of the plurality of points to compensate for one or more inaccuracies associated with at least one of a) different temperatures or b) different positions of the at least one lens. A three-dimensional virtual model of the intraoral object is generated using the adjusted data.
OPTICAL DEVICE AND SPECTROMETER COMPRISING SUCH A DEVICE
The optical device comprises a group of Fabry-Perot resonators, formed by a stack of a first and second partial reflection layer and an intermediate layer between the first and second partial reflection layer. The intermediate layer comprises a dielectric material and a group of arrays of posts embedded in the dielectric material at different positions along the intermediate layer. Each array in the group contains posts of a different non-circular shape and/or orientation in cross-section with a plane parallel to the reflection layers. As a result, Fabry-Perot resonators are formed in areas that contain different arrays, each having first and second resonance peaks at mutually different resonance frequencies for different polarization components. Light intensity sensors may be provided located below the different areas. From the intensities measured by the sensors, the intensities of different polarization components of the light can be computed over a range of wavelengths.
OPTICAL DEVICE AND SPECTROMETER COMPRISING SUCH A DEVICE
The optical device comprises a group of Fabry-Perot resonators, formed by a stack of a first and second partial reflection layer and an intermediate layer between the first and second partial reflection layer. The intermediate layer comprises a dielectric material and a group of arrays of posts embedded in the dielectric material at different positions along the intermediate layer. Each array in the group contains posts of a different non-circular shape and/or orientation in cross-section with a plane parallel to the reflection layers. As a result, Fabry-Perot resonators are formed in areas that contain different arrays, each having first and second resonance peaks at mutually different resonance frequencies for different polarization components. Light intensity sensors may be provided located below the different areas. From the intensities measured by the sensors, the intensities of different polarization components of the light can be computed over a range of wavelengths.
Assembly for Detecting the Intensity Distribution of Components of the Electromagnetic Field in Beams of Radiation
The invention is directed to an arrangement for detecting the intensity distribution of components of the electromagnetic field in beams of radiation. The object of the invention is met, according to the invention, in that a high-resolution two-dimensional intensity sensor array and a field vector detector array comprising different regions with individual detector structures for two transverse and longitudinal field vector components E.sub.x, E.sub.y, E.sub.z are combined, wherein the detector structures are formed as nanostructures, metallic jacket-shaped tips with different apices, for utilization of localized plasmon resonance (LPR) of the individual detector structures and localized surface plasmons (LSP) excited through LPR for a polarization selection of the field distribution according to field vector components E.sub.x, E.sub.y, E.sub.z and transmission thereof to associated sensor elements by means of surface plasmon polaritons (SPP) and wave guiding (WGM).
NORMAL INCIDENCE ELLIPSOMETER AND METHOD FOR MEASURING OPTICAL PROPERTIES OF SAMPLE BY USING SAME
The present invention relates to a normal incidence ellipsometer and a method for measuring the optical properties of a sample by using same. The purpose of the present invention is to provide: a normal incidence ellipsometer in which a wavelength-dependent compensator is replaced with a wavelength-independent linear polarizer such that equipment calibration procedures are simplified while a measurement wavelength range expansion can be easily implemented; and a method for measuring the optical properties of a sample by using same.