A method for determining wavefront shapes of N angular channels C.sub.L of different propagation directions P.sub.L, said propagation directions P.sub.L being determined by a mean propagation direction vector , from a single signal image acquisition I(x,y) of a multi-angular signal light beam containing said angular channels, each angular channel Ci being separated from other angular channels Cj by an angular separation Δα.sub.ij defined by Δα.sub.ij=arccos, where “.Math.” stands for the inner product between and .

Method, product and blocking element of short wavelengths in LED-type light sources consisting of a substrate with a pigment distributed on its surface and, in that said pigment has an optical density such that it allows the selective absorption of short wavelengths between 380 nm and 500 nm in a range between 1 and 99%.

An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.

A height measurement apparatus includes: a light irradiation unit that irradiates a sample with irradiation light; a camera system that detects light from the sample irradiated with the irradiation light; and a control apparatus that calculates a height of the sample based on the wavelength information. The camera system includes an inclined dichroic mirror of which a transmittance and a reflectance change according to a wavelength in a predetermined wavelength range and which separates the light from the sample by transmitting and reflecting the light, a light detector that detects a reflected light quantity from light reflected by the inclined dichroic mirror, a light detector that detects a transmitted light quantity from light transmitted through the inclined dichroic mirror, and a processing unit that calculates the wavelength information based on a ratio between the reflected light quantity and the transmitted light quantity, to output the wavelength information.

A height measurement apparatus includes: a light irradiation unit that irradiates a sample with irradiation light; a camera system that detects light from the sample irradiated with the irradiation light; and a control apparatus that calculates a height of the sample based on the wavelength information. The camera system includes an inclined dichroic mirror of which a transmittance and a reflectance change according to a wavelength in a predetermined wavelength range and which separates the light from the sample by transmitting and reflecting the light, a light detector that detects a reflected light quantity from light reflected by the inclined dichroic mirror, a light detector that detects a transmitted light quantity from light transmitted through the inclined dichroic mirror, and a processing unit that calculates the wavelength information based on a ratio between the reflected light quantity and the transmitted light quantity, to output the wavelength information.

An amplified laser device is provided with one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) having tip, tilt and piston capability positioned on either side of the optical amplifier to correct the profile of the beam to improve the gain performance of the optical amplifier or to compensate for atmospheric distortion while steering the amplified beam over a FOR. The MEMS MMAs may be positioned in front of, behind or on both sides of the amplifier. The MEMS MMAs can be configured to optimize the combined amplifier performance, static and time varying, and compensation for atmospheric distortion together or separately.

An amplified laser device is provided with one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) having tip, tilt and piston capability positioned on either side of the optical amplifier to correct the profile of the beam to improve the gain performance of the optical amplifier or to compensate for atmospheric distortion while steering the amplified beam over a FOR. The MEMS MMAs may be positioned in front of, behind or on both sides of the amplifier. The MEMS MMAs can be configured to optimize the combined amplifier performance, static and time varying, and compensation for atmospheric distortion together or separately.

Methods, systems and devices are disclosed to detect and compensate wavefront errors associated with light that spans a large range of wavelengths and different polarization states. One example system includes an optical wavefront sensor that is positioned to receive input light after propagation through a turbulent medium, such as air or water or other liquids, and to detect a wavefront error associated with at least one spectral component of the received light that has a plurality of spectral components. The system further includes a wavefront compensator that is positioned to receive the input light and to simultaneously effectuate wavefront corrections for the plurality of spectral components of the input light based on the detected wavefront error.

Methods, systems and devices are disclosed to detect and compensate wavefront errors associated with light that spans a large range of wavelengths and different polarization states. One example system includes an optical wavefront sensor that is positioned to receive input light after propagation through a turbulent medium, such as air or water or other liquids, and to detect a wavefront error associated with at least one spectral component of the received light that has a plurality of spectral components. The system further includes a wavefront compensator that is positioned to receive the input light and to simultaneously effectuate wavefront corrections for the plurality of spectral components of the input light based on the detected wavefront error.