A method includes determining, by a processing module of a foot force detection system, an athletic mode. The method further includes, when the athletic mode is active, determining, by the processing module, an athletic burst mode. The method further includes determining, by the processing module, a sampling rate for the foot force detection system based on the athletic burst mode for sampling foot force data.

A sensing device including a sensor, a triggering mechanism is provided. The sensing device is attachable to a covering positioned in contact with a body such that the triggering mechanism extends between first and second segments of the body. Movement of at least one of the first and second segments activates the triggering mechanism to provide an input to the sensor, actuating the sensor to generate an output defining at least one measurement of the movement. The measurement may be one or more of rotation, translation, velocity, acceleration, and joint angle. An intermediate mechanism may be interposed between the triggering mechanism and the sensor. The sensing device may include a means to process or record measurements corresponding to movement. A system and method of measuring the movement is also provided.

A sensing device including a sensor, a triggering mechanism is provided. The sensing device is attachable to a covering positioned in contact with a body such that the triggering mechanism extends between first and second segments of the body. Movement of at least one of the first and second segments activates the triggering mechanism to provide an input to the sensor, actuating the sensor to generate an output defining at least one measurement of the movement. The measurement may be one or more of rotation, translation, velocity, acceleration, and joint angle. An intermediate mechanism may be interposed between the triggering mechanism and the sensor. The sensing device may include a means to process or record measurements corresponding to movement. A system and method of measuring the movement is also provided.

Provided is a method for manufacturing a force sensor including: preparing a first substrate which is made of a material that transmits electromagnetic waves and includes on its surface a metal array arranged in a periodic pattern and a second substrate which includes on its surface a metal layer that reflects electromagnetic waves; forming a spacer member on the surface of the first substrate; forming a first metal layer around the spacer member on the surface of the first substrate; forming a second metal layer in a region corresponding to the first metal layer on the second substrate; and fusing the first metal layer and the second metal layer together to fix the first substrate and the second substrate in a state in which the spacer member formed on the surface of the first substrate abuts the surface of the second substrate.

A force sensor is provided, the force sensor including: a first substrate; a metasurface pattern provided on a principal surface; a protective layer covering the metasurface pattern; a second substrate provided so as to face the first substrate; a reflective layer provided on a second principal surface; and a spacer defining a spacing between the first substrate and the second substrate, so that the force sensor is capable of offering desired response characteristics specified at the time of design.

The present disclosure discloses a deformation sensor and device for measuring the load of a wheel hub of a vehicle, and an automobile. The deformation sensor includes: a metal lining fixed on the surface of the wheel hub, and a resistance strain gauge fixed on the metal lining. The resistance strain gauge is fixed on the metal lining through a structural adhesive.

There is provided a force sensor including a substrate and a polymer material layer. The substrate has a circuit layout that includes a first electrode and a second electrode configured to form a capacitor therebetween. The polymer material layer covers at least on a space between the first electrode and the second electrode, and is used to change capacitance of the capacitor while being pressed.

A strain sensor system having a first base plate with an elongate shape defining a first longitudinal axis, a first strain sensor disposed on the first base plate, a second base plate having an elongate shape defining a second longitudinal axis, a second strain sensor disposed on the second base plate, and a control unit configured to process measurement data produced by the first strain sensor and by the second strain sensor, wherein the first base plate and the second base plate are disposed such that the first longitudinal axis is arranged orthogonally or essentially orthogonally with respect to the second longitudinal axis.

For measuring the stress history in a simple form, which is widely applicable to various types of structural materials which the elastic modulus is different from each other, a large number of calcite particles is embedded as a stress sensor in a cement-based composite material that can be elastically deformed after receiving an external.

A twin-crystal density of the calcite particles is measured after an external force is applied to the composite material, to convert the twin-crystal density to a strain by an approximate formula set in terms of a strain ε (%) generated in the composite material and a twin-crystal density Dtw (lines/mm) of the calcite particles, and further to convert this strain to a stress by the elastic modulus of the composite material, whereby to estimate the history of stress and strain. The approximate formula between strain and twin-crystal density is independent of the modulus of the composite material and is used in a common form.

A system for making gradual adjustments to planograms may include at least one processor. The processor may be programmed to receive a first image of a shelf; analyze the first image to determine a first placement of products on the shelf; determine a planned first adjustment to the first placement of products; and provide first information configured to cause the planned first adjustment. The processor may then receive a second image of the shelf captured after the first information was provided; analyze the second image to determine a second placement of products on the shelf; determine a planned second adjustment to the second placement of products; and provide second information configured to cause the planned second adjustment to the determined second placement of products.