The present invention relates to a MEMS deposition trap (10) comprising: a manifold layer having manifold inlet channels and manifold outlet channels, a microchannel layer (20) having microchannels (33), wherein the manifold layer and the microchannel layer are bonded together so as to form a fluid path, wherein a fluid is forced to pass through the microchannels (33) when flowing from the manifold inlet channels to the manifold outlet channels. Furthermore, it relates to a vacuum sensor having such a deposition trap as and to a process chamber of a manufacturing equipment, preferably used for thin-film deposition or etching processes, comprising such a vacuum sensor.

An ultra-low pressure, vapor analyte, and vapor pathway parameter monitoring system can include an embedded server comprising a base radio and memory. In some embodiments, the embedded server is communicatively coupled to a third-party database. The system can include a first monitoring device comprising a first ultra-low pressure sensor and a first radio communicatively coupled to the base radio. The embedded server can be remotely located with respect to the first monitoring device whereby the embedded server receives first pressure data from the first monitoring device.

An ultra-low pressure, vapor analyte, and vapor pathway parameter monitoring system can include an embedded server comprising a base radio and memory. In some embodiments, the embedded server is communicatively coupled to a third-party database. The system can include a first monitoring device comprising a first ultra-low pressure sensor and a first radio communicatively coupled to the base radio. The embedded server can be remotely located with respect to the first monitoring device whereby the embedded server receives first pressure data from the first monitoring device.

A vacuum gauge includes an introduction tube, a diaphragm displaced by a gas to be measured that is introduced from the introduction tube, a piezoelectric element that has one end coupled to the diaphragm and is displaced along with the diaphragm, an inner structure to which a circumferential edge of the diaphragm and the other end of the piezoelectric element are secured and that is coupled to the introduction tube, and an airtight container to airtightly enclose the introduction tube and the inner structure. The inner structure, the introduction tube, and the diaphragm airtightly partition a space in the airtight container into a pressure introduction chamber to which the gas to be measured is introduced on one surface side of the diaphragm, and a reference pressure chamber on the other surface side of the diaphragm. the reference pressure chamber being set at a high vacuum that is lower than the pressure lower limit of the measurement gas.

A vacuum gauge includes an introduction tube, a diaphragm displaced by a gas to be measured that is introduced from the introduction tube, a piezoelectric element that has one end coupled to the diaphragm and is displaced along with the diaphragm, an inner structure to which a circumferential edge of the diaphragm and the other end of the piezoelectric element are secured and that is coupled to the introduction tube, and an airtight container to airtightly enclose the introduction tube and the inner structure. The inner structure, the introduction tube, and the diaphragm airtightly partition a space in the airtight container into a pressure introduction chamber to which the gas to be measured is introduced on one surface side of the diaphragm, and a reference pressure chamber on the other surface side of the diaphragm. the reference pressure chamber being set at a high vacuum that is lower than the pressure lower limit of the measurement gas.

The invention relates to a device for monitoring the contact of a workpiece (1) or tool on a spindle (2) of a machine tool, which device has a contact surface (3) for the workpiece (1) or tool. At least one measurement nozzle (4) is arranged in the region of the contact surface in order to produce a fluid flow directed away from the contact surface (3). Upstream of the measurement nozzle, the fluid flow is conducted through a vacuum nozzle, which can comprise a jet nozzle (7c) and a collector nozzle (7b). When the fluid medium flows through the vacuum nozzle, the vacuum nozzle produces a negative pressure in a negative pressure chamber (9c). A pressure sensor (6) or pressure switch senses a measurement pressure (p3) in the negative pressure chamber.

A pressure gauge includes: an outer container defining an outer chamber set to a reference pressure (Pr); an inner container disposed in the outer container; and a tube setting the inside of a first inner chamber of the inner container to a measurement pressure (Px). The inner container includes: a cylindrical rigid wall portion; first and second pressure receiving plates that displace due to a differential pressure between the reference pressure and the measurement pressure; a bellows partitioning the inner container into the first inner chamber and a second inner chamber; and a pressure detection element disposed in the second inner chamber and detecting the measurement pressure based on the displacements of the first and the second pressure receiving plates. The outer chamber and the second inner chamber are set to the reference pressure of a high vacuum that is lower than a lower limit of the measurement pressure.

Disclosed is a vacuum roaster including a chamber, a door cap formed on one side of the chamber so as to be opened or closed, a vacuum cap formed on an opposite side of the chamber, a basket spaced apart from an inner circumferential surface of the chamber, and including a basket door that is opened or closed for introduction and discharge of an object to be processed, a vacuum adjustment device for adjusting a vacuum state inside the chamber, a drive motor connected to the basket via a shaft for rotating the basket, and a heater provided inside the chamber so as to be spaced apart from the basket.

The glass panel unit includes: a first glass panel; a second glass panel; a seal; an evacuated space; and a gas adsorbent. The seal with a frame shape hermetically bonds the first glass panel and the second glass panel to each other. The gas adsorbent is placed in the evacuated space. The gas adsorbent includes a getter. The gas adsorbent is visible through at least one of the first glass panel and the second glass panel. The gas adsorbent has properties of changing its color when adsorbing gas.

The glass panel unit includes: a first glass panel; a second glass panel; a seal; an evacuated space; and a gas adsorbent. The seal with a frame shape hermetically bonds the first glass panel and the second glass panel to each other. The gas adsorbent is placed in the evacuated space. The gas adsorbent includes a getter. The gas adsorbent is visible through at least one of the first glass panel and the second glass panel. The gas adsorbent has properties of changing its color when adsorbing gas.