An improved system and method for reading an upconversion response from nanoparticle inks is provided. A is adapted to direct a near-infrared excitation wavelength at a readable indicia, resulting in a near-infrared emission wavelength created by the upconverting nanoparticle inks. A short pass filter may filter the near-infrared excitation wavelength. A camera is in operable communication with the short pass filter and receives the near-infrared emission wavelength of the readable indicia. The system may further include an integrated circuit adapted to receive the near-infrared emission wavelength from the camera and generate a corresponding signal. A readable application may be in operable communication with the integrated circuit. The readable application receives the corresponding signal, manipulates the signal, decodes the signal into an output, and displays and/or stores the output.

The present disclosure provides apparatuses, systems, and methods for performing particle analysis through flow cytometry at comparatively high event rates and for gathering high resolution images of particles.

Aspects of the disclosure relate to a semiconductor device power management system including a semiconductor device of a set of semiconductor devices provided on a substrate, wherein the semiconductor device includes an independent power supply unit.

The present disclosure describes a method and apparatus of measuring dynamic light scattering of a sample. In an embodiment, the apparatus includes a platen, a light source underneath the platen and configured to emit emitted light through the platen and into the sample, collector optics underneath the platen and configured to capture scattered light, and an optical absorber configured to be in contact with the sample, configured to absorb transmitted light, and configured to redirect reflected light away from the collector optics. In an embodiment, the method includes depositing a sample on a platen, emitting emitted light from a light source underneath the platen through the platen and into the sample, capturing via collector optics underneath the platen scattered light, contacting the sample with an optical absorber, absorbing via the absorber transmitted light, and redirecting via the absorber reflected light away from the collector optics.

A method and device for the remote eradication of pathogens comprising a light source for emitting UV light in the pathogen killing wave length range, and a tangible transmission medium, which is at least initially resistant to degradation by the UV light. An optical interface between the UV light source and the tangible transmission medium is provided whereby the emitted UV light is collected from the light source and transmitted through the tangible transmission medium, whereby UV light emitted from the tangible transmission medium and directed against a pathogen in proximity thereto is at a power level sufficient to substantially effectively kill the pathogen within a reasonable period of time. The device is used for sanitization of biopsy channels of endoscopes and for treating of pathogens within humans and animals.

Aspects of the present disclosure include methods for producing an output laser beam having two or more angularly deflected laser beams (e.g., for irradiating a sample in a flow stream) with a predetermined intensity profile. Systems for practicing the subject methods having a laser, an acousto-optic device, a radiofrequency generator and a controller for adjusting the amplitude of the radiofrequency drive signals to produce an output laser beam of angularly deflected laser beams with a predetermined intensity profile are also described.

A method to determine the throughput speed v of a pore, comprising the steps of feeding, by means of a driving force F, a filiform calibration element through the pore, the calibration element having a plurality of markers spaced apart by known distances and configured to produce an interaction event that transmits a signal away from the pore upon interaction with the pore, detecting a plurality of interaction events, and determining a time interval Δt between successive interaction events, and/or a frequency ω of interaction events.

Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology. Pattern placement discrepancies may be reduced by using sub-resolved assist features in the mask design which have a same periodicity (fine pitch) as the periodic structure and/or by calibrating the measurement results using PPE (pattern placement error) correction factors derived by applying learning procedures to specific calibration terms, in measurements and/or simulations. Metrology targets are disclosed with multiple periodic structures at the same layer (in addition to regular target structures), e.g., in one or two layers, which are used to calibrate and remove PPE, especially when related to asymmetric effects such as scanner aberrations, off-axis illumination and other error sources.

Metrology methods and targets are provided for reducing or eliminating a difference between a device pattern position and a target pattern position while maintaining target printability, process compatibility and optical contrast—in both imaging and scatterometry metrology. Pattern placement discrepancies may be reduced by using sub-resolved assist features in the mask design which have a same periodicity (fine pitch) as the periodic structure and/or by calibrating the measurement results using PPE (pattern placement error) correction factors derived by applying learning procedures to specific calibration terms, in measurements and/or simulations. Metrology targets are disclosed with multiple periodic structures at the same layer (in addition to regular target structures), e.g., in one or two layers, which are used to calibrate and remove PPE, especially when related to asymmetric effects such as scanner aberrations, off-axis illumination and other error sources.

Provided herein are processes for preparing fluorescent 1-cyano-2-substituted isoindole compounds or N-substituted phthalazinium compounds, comprising reacting an aromatic dialdehyde or aromatic aldehyde-ketone compound with a material that contains primary amino or hydrazine groups, and assaying methods involving the processes thereof.