Patent classifications
G01N22/00
Multi-Stage Device and Process for Production of a Low Sulfur Heavy Marine Fuel Oil
A multi-stage process for the production of an ISO 8217 Table 2 residual marine fuel Product Heavy Marine Fuel Oil from a Feedstock Heavy Marine Fuel Oil that is ISO 8217:2017 Table 2 compliant except for the Environmental Contaminants involves a Reaction System composed of one or more reactor vessels selected from a group reactor wherein said one or more reactor vessels contains one or more reaction sections configured to promote the transformation of the Feedstock Heavy Marine Fuel Oil to the Product Heavy Marine Fuel Oil. The Product Heavy Marine Fuel Oil has an Environmental Contaminant level less than 0.5 wt % and preferably a maximum sulfur content (ISO 14596 or ISO 8754) between the range of 0.05 mass % to 0.5 mass %. A process plant for conducting the process for conducting the process is also disclosed.
Multi-Stage Device and Process for Production of a Low Sulfur Heavy Marine Fuel Oil
A multi-stage process for the production of an ISO 8217 Table 2 residual marine fuel Product Heavy Marine Fuel Oil from a Feedstock Heavy Marine Fuel Oil that is ISO 8217:2017 Table 2 compliant except for the Environmental Contaminants involves a Reaction System composed of one or more reactor vessels selected from a group reactor wherein said one or more reactor vessels contains one or more reaction sections configured to promote the transformation of the Feedstock Heavy Marine Fuel Oil to the Product Heavy Marine Fuel Oil. The Product Heavy Marine Fuel Oil has an Environmental Contaminant level less than 0.5 wt % and preferably a maximum sulfur content (ISO 14596 or ISO 8754) between the range of 0.05 mass % to 0.5 mass %. A process plant for conducting the process for conducting the process is also disclosed.
PROCESSES, APPARATUSES AND SYSTEM FOR MEASURING A MEASURED VARIABLE
It is an object of the invention to improve processes, apparatuses and systems for measuring a measured variable. To this end, a measured variable is measured in a measuring process on the basis of an NV center as a quantum sensor. The NV center has a plurality of quantum states and is optically excitable on the basis of an occupancy of one of the quantum states into at least one excited state of the quantum states by means of an excitation light. The at least one excited state can decay at least with emission of emission light of the NV center. In the measuring process, the NV center is irradiated by the excitation light, the excitation light having a time periodic modulation, and a respective occupancy probability and/or a respective lifetime of the quantum states depending on the measured variable and the excitation light. A phase shift is determined between the emission light of the NV center and the modulation of the excitation light and a measurement value for the measured variable is determined on the basis thereof.
DEVICE PERFORMANCE PREDICTION USING MATERIAL PROPERTIES
One embodiment provides a method for predicting the performance of a device based upon parameters of an underlying material, comprising: measuring a predetermined parameter of a material to be used in manufacturing the device; identifying, from a value generated from the measuring, a value of a property of the material; and determining a predicted performance of the device by correlating the value of the property to a performance value. Other aspects are described and claimed.
Low-cost device and method for measuring radar transmission and reflectance of coated articles
Low-cost devices and methods for measuring radar transmission and/or reflectance of coated articles, as well as methods for forming coatings on articles are provided. An exemplary low-cost radar transmission and reflection measurement device includes a radar transmitter that emits a radar signal, a radar target to which the radar signal is directed, and a radar receiver that receives the radar signal. Further, the exemplary low-cost device includes a sample holder located between the radar transmitter and the radar target and between the radar target and the radar receiver. The sample holder receives a sample including a coating. The low-cost device also includes a controller connected to the radar transmitter and radar receiver. The controller measures a radar signal loss due to the coating.
Low-cost device and method for measuring radar transmission and reflectance of coated articles
Low-cost devices and methods for measuring radar transmission and/or reflectance of coated articles, as well as methods for forming coatings on articles are provided. An exemplary low-cost radar transmission and reflection measurement device includes a radar transmitter that emits a radar signal, a radar target to which the radar signal is directed, and a radar receiver that receives the radar signal. Further, the exemplary low-cost device includes a sample holder located between the radar transmitter and the radar target and between the radar target and the radar receiver. The sample holder receives a sample including a coating. The low-cost device also includes a controller connected to the radar transmitter and radar receiver. The controller measures a radar signal loss due to the coating.
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system
Methods and systems for multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system are provided. A radio frequency (RF) signal is pulsed within a processing chamber in accordance with a set of RF pulsing parameters. Sensor data is received from one or more sensors that indicates a multi-level RF pulse waveform detected within the processing chamber based on the RF signal pulsing. One or more peaks are identified in the detected multi-level RF pulse waveform. Each identified peak corresponds to at least one RF signal pulse of the RF signal pulsing within the processing chamber. A determination is made, based on the identified one or more peaks, whether the detected multi-level RF pulse waveform corresponds to the target multi-level RF pulse waveform. An indication of whether the detected multi-level RF pulse waveform corresponds to the target multi-level RF pulse waveform is provided to a client device.
Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system
Methods and systems for multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system are provided. A radio frequency (RF) signal is pulsed within a processing chamber in accordance with a set of RF pulsing parameters. Sensor data is received from one or more sensors that indicates a multi-level RF pulse waveform detected within the processing chamber based on the RF signal pulsing. One or more peaks are identified in the detected multi-level RF pulse waveform. Each identified peak corresponds to at least one RF signal pulse of the RF signal pulsing within the processing chamber. A determination is made, based on the identified one or more peaks, whether the detected multi-level RF pulse waveform corresponds to the target multi-level RF pulse waveform. An indication of whether the detected multi-level RF pulse waveform corresponds to the target multi-level RF pulse waveform is provided to a client device.
Subterahertz microfabricated spectrometer
A microfabricated spectrometer uses at least one filter to discriminate the frequency components of an incoming RF signal. The filter center frequencies are chosen to correspond to wavelengths of target species which may be present in the gas, and radiating at a characteristic frequency.
Subterahertz microfabricated spectrometer
A microfabricated spectrometer uses at least one filter to discriminate the frequency components of an incoming RF signal. The filter center frequencies are chosen to correspond to wavelengths of target species which may be present in the gas, and radiating at a characteristic frequency.