Patent classifications
G01Q10/00
Depassivation Lithography by Scanning Tunneling Microscopy
Methods, devices, and systems for forming atomically precise structures are provided. In some embodiments, the methods, devices, and systems of the present disclosure utilize a scanning tunneling microscope (STM) system to receive a sample having a surface to be patterned. The system positions a conductive tip over a pixel region of the surface. While the conductive tip remains laterally fixed relative to the surface, the system applies a bias voltage between the conductive tip and the surface such that a current between the conductive tip and the surface removes at least one atom from the pixel region. The system stops applying the voltage and current when it senses the removal of the at least one atom. The system then verifies that the at least one atom has been removed from the pixel region.
Atomic force microscope with optical guiding mechanism
An atomic force microscope includes a scanner for scanning a probe along at least one translational axis, a stationary light source for generating an incident light beam, a stationary position sensitive detector for detecting a light beam reflected from a cantilever, an optical guiding mechanism for compensating a scanning motion of the probe and configured to guide the incident light beam to a spot on the cantilever and to guide the reflected light beam from the cantilever to the position sensitive detector, wherein the optical guiding mechanism includes at least two optical deflection elements per translational axis arranged to move synchronously with the probe along the respective translational axis, and configured to define an optical path between the light source and the detector for the incident and reflected light beam such that the optical path length is independent of the translation of the probe along the respective translational axis.
Atomic force microscope with optical guiding mechanism
An atomic force microscope includes a scanner for scanning a probe along at least one translational axis, a stationary light source for generating an incident light beam, a stationary position sensitive detector for detecting a light beam reflected from a cantilever, an optical guiding mechanism for compensating a scanning motion of the probe and configured to guide the incident light beam to a spot on the cantilever and to guide the reflected light beam from the cantilever to the position sensitive detector, wherein the optical guiding mechanism includes at least two optical deflection elements per translational axis arranged to move synchronously with the probe along the respective translational axis, and configured to define an optical path between the light source and the detector for the incident and reflected light beam such that the optical path length is independent of the translation of the probe along the respective translational axis.
Quantitative measurements using multiple frequency atomic force microscopy
The imaging mode presented here combines the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the second resonant drive frequency operates in FM mode and is adjusted to keep the phase at 90 degrees, on resonance. With this approach, frequency feedback on the second resonant mode and topographic feedback on the first are decoupled, allowing much more stable, robust operation.
Quantitative measurements using multiple frequency atomic force microscopy
The imaging mode presented here combines the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the second resonant drive frequency operates in FM mode and is adjusted to keep the phase at 90 degrees, on resonance. With this approach, frequency feedback on the second resonant mode and topographic feedback on the first are decoupled, allowing much more stable, robust operation.
MULTI-MODAL MICROSCOPIC IMAGING
An adapter configured to be optically coupled to a plurality of microscopes and having (i) a first microscope interface configured to optically couple a first microscope system to an optical element that is in optical communication with an optical probe to provide first imaging data of a sample, and (ii) a second microscope interface configured to optically couple a second microscope system to the optical element to provide second imaging data of the sample. An optical imaging apparatus and method utilizing such adapter.
Sparse sampling methods and probe systems for analytical instruments
Sparse sampling approaches and probe systems for analytical instruments are disclosed providing for effective sub-sampling of a specimen and inpainting to reconstruct representations of actual information. The sub-sampling involves serial acquisition of contiguous measured values lying at positions along a scan path extending in a line toward a first direction and having random perturbations in a second direction. The perturbations are limited within a predetermined distance from the line. Inpainting techniques are utilized among the measured values to reconstruct a representation of actual information regarding the specimen.
Modular atomic force microscope with environmental controls
A modular Atomic Force Microscope that allows ultra-high resolution imaging and measurements in a wide variety of environmental conditions is described. The instrument permits such imaging and measurements in environments ranging from ambient to liquid or gas or extremely high or extremely low temperatures.
Modular atomic force microscope with environmental controls
A modular Atomic Force Microscope that allows ultra-high resolution imaging and measurements in a wide variety of environmental conditions is described. The instrument permits such imaging and measurements in environments ranging from ambient to liquid or gas or extremely high or extremely low temperatures.
Debris removal in high aspect structures
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.