Patent classifications
G01Q20/00
Method and apparatus of operating a scanning probe microscope
An improved mode of AFM imaging (Peak Force Tapping (PFT) Mode) uses force as the feedback variable to reduce tip-sample interaction forces while maintaining scan speeds achievable by all existing AFM operating modes. Sample imaging and mechanical property mapping are achieved with improved resolution and high sample throughput, with the mode workable across varying environments, including gaseous, fluidic and vacuum.
Method and apparatus of operating a scanning probe microscope
An improved mode of AFM imaging (Peak Force Tapping (PFT) Mode) uses force as the feedback variable to reduce tip-sample interaction forces while maintaining scan speeds achievable by all existing AFM operating modes. Sample imaging and mechanical property mapping are achieved with improved resolution and high sample throughput, with the mode workable across varying environments, including gaseous, fluidic and vacuum.
METHOD OF MODIFYING A SURFACE OF A SAMPLE, AND A SCANNING PROBE MICROSCOPY SYSTEM
This document relates to a method and system for modifying a sample surface using a scanning probe microscopy system comprising a probe having a cantilever and a probe tip. The method comprises vibrating the probe; controlling a distance between the surface and the probe for tapping of the probe tip on the surface; and adjusting a tapping force of the probe tip on the surface during said tapping, so as to selectively modify the surface during the tapping. The probe is vibrated by employing a multi-frequency excitation comprising at least two frequencies for simultaneous imaging and modifying of the surface.
DEVICE FOR MEASURING AND/OR MODIFYING A SURFACE
The present invention relates to a device for measuring and/or modifying a surface of a sample, including a sample holder, including a first area configured to receive the sample fixedly mounted relative to the first area, a support, a first probe configured to detect a first parameter at a point of the surface and to generate a first measurement signal representative of the first parameter, and a second probe configured to detect a second parameter at a point of the surface, and to generate a second measurement signal representative of the second parameter, the first parameter being different from the second parameter, or one of the first probe and the second probe being configured to modify a third parameter of the surface at the point of the surface.
DEVICE FOR MEASURING AND/OR MODIFYING A SURFACE
The present invention relates to a device for measuring and/or modifying a surface of a sample, including a sample holder, including a first area configured to receive the sample fixedly mounted relative to the first area, a support, a first probe configured to detect a first parameter at a point of the surface and to generate a first measurement signal representative of the first parameter, and a second probe configured to detect a second parameter at a point of the surface, and to generate a second measurement signal representative of the second parameter, the first parameter being different from the second parameter, or one of the first probe and the second probe being configured to modify a third parameter of the surface at the point of the surface.
AM/FM measurements using multiple frequency atomic force microscopy
Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.
AM/FM measurements using multiple frequency atomic force microscopy
Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.
Systems and methods for detection of blank fields in digital microscopes
Systems and methods for rapidly identifying blank fields while capturing a plurality of color field images using a slide scanning microscope having a movable slide stage, a movable objective lens, and a digital video camera having a color digital image sensor that encodes RGB color data for each pixel in a field image.
METHOD OF AND SYSTEM FOR PERFORMING DEFECT DETECTION ON OR CHARACTERIZATION OF A LAYER OF A SEMICONDUCTOR ELEMENT OR SEMI-MANUFACTURED SEMICONDUCTOR ELEMENT
The present document relates to a method of performing defect detection on a self-assembled monolayer of a semiconductor element or semi-manufactured semiconductor element, using an atomic force microscopy system. The system comprises a probe with a probe tip, and is configured for positioning the probe tip relative to the element for enabling contact between the probe tip and a surface of the element. The system comprises a sensor providing an output signal indicative of a position of the probe tip. The method comprises: scanning the surface with the probe tip; applying an acoustic vibration signal to the element; obtaining the output signal indicative of the position of the probe tip; monitoring probe tip motion during said scanning for mapping the surface of the semiconductor element, and using a fraction of the output signal for mapping contact stiffness indicative of a binding strength.
METHOD OF AND SYSTEM FOR PERFORMING DEFECT DETECTION ON OR CHARACTERIZATION OF A LAYER OF A SEMICONDUCTOR ELEMENT OR SEMI-MANUFACTURED SEMICONDUCTOR ELEMENT
The present document relates to a method of performing defect detection on a self-assembled monolayer of a semiconductor element or semi-manufactured semiconductor element, using an atomic force microscopy system. The system comprises a probe with a probe tip, and is configured for positioning the probe tip relative to the element for enabling contact between the probe tip and a surface of the element. The system comprises a sensor providing an output signal indicative of a position of the probe tip. The method comprises: scanning the surface with the probe tip; applying an acoustic vibration signal to the element; obtaining the output signal indicative of the position of the probe tip; monitoring probe tip motion during said scanning for mapping the surface of the semiconductor element, and using a fraction of the output signal for mapping contact stiffness indicative of a binding strength.