Patent classifications
G01Q20/00
Method of measuring a topographic profile and/or a topographic image
Measuring a topographic profile and/or a topographic image of a surface of a sample includes positioning an indenter out of contact with a sample and in a constant position with respect to a headstock; positioning a topographic tip to detect a surface of the sample and positioning a reference structure at a predetermined distance from said surface; measuring the relative position of the indenter with respect to the reference structure by a relative position sensor; translating said sample perpendicular to said longitudinal axis while maintaining the reference structure at said predetermined distance from the surface of the sample by the feedback control system and the second actuator while measuring the relative position of the indenter with respect to the reference structure by the relative position sensor; and generating a topographic profile and/or a topographic image based on measurements of the relative position.
METHOD OF PERFORMING SURFACE MEASUREMENTS ON A SURFACE OF A SAMPLE, AND SCANNING PROBE MICROSCOPY SYSTEM THEREFORE
This document relates to a method of performing surface measurements on a surface of a sample using a scanning probe microscopy system. The system comprises a sample support structure for supporting a sample, a sensor head including a probe comprising a cantilever and a probe tip arranged on the cantilever, and an actuator for scanning the probe tip relative to the substrate surface for mapping of the nanostructures. The method comprising the steps of: vibrating the cantilever using an actuator and moving the probe relative to the substrate surface for performing said scanning. The probe is held at a distance to the substrate surface such as to allow contact at a plurality of intermittent contact moments between the probe tip and the surface during said vibrating of the cantilever. The steps of vibrating of the cantilever and moving of the probe are performed concurrently. For performing the surface measurements, the method comprises obtaining a sensor signal indicative of a position of the probe tip during said scanning, and analyzing this signal by quantifying two or more frequency components in a Fourier transform for determining an estimate of a force value of a force between said substrate surface and said probe tip during said contact moments.
METHOD OF PERFORMING SURFACE MEASUREMENTS ON A SURFACE OF A SAMPLE, AND SCANNING PROBE MICROSCOPY SYSTEM THEREFORE
This document relates to a method of performing surface measurements on a surface of a sample using a scanning probe microscopy system. The system comprises a sample support structure for supporting a sample, a sensor head including a probe comprising a cantilever and a probe tip arranged on the cantilever, and an actuator for scanning the probe tip relative to the substrate surface for mapping of the nanostructures. The method comprising the steps of: vibrating the cantilever using an actuator and moving the probe relative to the substrate surface for performing said scanning. The probe is held at a distance to the substrate surface such as to allow contact at a plurality of intermittent contact moments between the probe tip and the surface during said vibrating of the cantilever. The steps of vibrating of the cantilever and moving of the probe are performed concurrently. For performing the surface measurements, the method comprises obtaining a sensor signal indicative of a position of the probe tip during said scanning, and analyzing this signal by quantifying two or more frequency components in a Fourier transform for determining an estimate of a force value of a force between said substrate surface and said probe tip during said contact moments.
AM/FM MEASUREMENTS USING MULTIPLE FREQUENCY ATOMIC FORCE MICROSCOPY
Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.
Electron vibrometer and determining displacement of a cantilever
An electron vibrometer includes: an electron source providing a beam of primary electrons; a cantilever including: a receiver portion including: a gradient in thickness, a gradient in mass, atomic number of constituent atoms, or a combination thereof, the cantilever being disposed relative to the electron source such that the receiver portion of the cantilever receives the beam of primary electrons, and produces a plurality of scattered electrons from the receiver portion in response to receipt of the beam of primary electrons; and a charged particle detector that receives the plurality of scattered electrons from the receiver portion, and produces a detector signal comprising an amplitude that varies in relation to the gradient subject to receipt of the primary electrons, and the detector signal providing determination of the displacement of the cantilever.
Electron vibrometer and determining displacement of a cantilever
An electron vibrometer includes: an electron source providing a beam of primary electrons; a cantilever including: a receiver portion including: a gradient in thickness, a gradient in mass, atomic number of constituent atoms, or a combination thereof, the cantilever being disposed relative to the electron source such that the receiver portion of the cantilever receives the beam of primary electrons, and produces a plurality of scattered electrons from the receiver portion in response to receipt of the beam of primary electrons; and a charged particle detector that receives the plurality of scattered electrons from the receiver portion, and produces a detector signal comprising an amplitude that varies in relation to the gradient subject to receipt of the primary electrons, and the detector signal providing determination of the displacement of the cantilever.
Motion sensor integrated nano-probe N/MEMS apparatus, method, and applications
A multi-tip nano-probe apparatus and a method for probing a sample while using the multi-tip nano-probe apparatus each employ located over a substrate: (1) an immovable probe tip with respect to the substrate; (2) a movable probe tip with respect to the substrate; and (3) a motion sensor that is coupled with the movable probe tip. The multi-tip nano-probe apparatus and related method provide for improved sample probing due to close coupling of the motion sensor with the movable probe tip, and also retractability of the movable probe tip with respect to the immovable probe tip.
Motion sensor integrated nano-probe N/MEMS apparatus, method, and applications
A multi-tip nano-probe apparatus and a method for probing a sample while using the multi-tip nano-probe apparatus each employ located over a substrate: (1) an immovable probe tip with respect to the substrate; (2) a movable probe tip with respect to the substrate; and (3) a motion sensor that is coupled with the movable probe tip. The multi-tip nano-probe apparatus and related method provide for improved sample probing due to close coupling of the motion sensor with the movable probe tip, and also retractability of the movable probe tip with respect to the immovable probe tip.
SCANNING PROBE MICROSCOPY SYSTEM FOR MAPPING HIGH ASPECT RATIO NANOSTRUCTURES ON A SURFACE OF A SAMPLE
The invention is directed at a scanning probe microscopy system for mapping nanostructures on a surface of a sample, the system being arranged for sensing a high aspect ratio nanostructure, the high aspect ratio nanostructure comprising at least one face having a slope with a slope angle relative to the surface of the sample that exceeds a predetermined threshold angle, the system comprising a metrology frame, a sample support structure for supporting a sample, a sensor head including a probe, wherein the probe comprises a cantilever and a probe tip, and wherein the scanning probe microscopy system further comprises an actuator for scanning the probe tip relative to the substrate surface for mapping of the nanostructures, wherein, for sensing the high aspect ratio nanostructure, the probe tip is arranged under a fixed offset angle with respect to the sensor head such as to be angled relative to the sample surface, and wherein the system further comprises a sensor head carrier for receiving the sensor head, the sensor head carrier and the sensor head being provided with a mutually cooperating mounting structure for forming a kinematic mount having at least three contact points for detachable mounting of the sensor head on the sensor head carrier.
SCANNING PROBE MICROSCOPY SYSTEM FOR MAPPING HIGH ASPECT RATIO NANOSTRUCTURES ON A SURFACE OF A SAMPLE
The invention is directed at a scanning probe microscopy system for mapping nanostructures on a surface of a sample, the system being arranged for sensing a high aspect ratio nanostructure, the high aspect ratio nanostructure comprising at least one face having a slope with a slope angle relative to the surface of the sample that exceeds a predetermined threshold angle, the system comprising a metrology frame, a sample support structure for supporting a sample, a sensor head including a probe, wherein the probe comprises a cantilever and a probe tip, and wherein the scanning probe microscopy system further comprises an actuator for scanning the probe tip relative to the substrate surface for mapping of the nanostructures, wherein, for sensing the high aspect ratio nanostructure, the probe tip is arranged under a fixed offset angle with respect to the sensor head such as to be angled relative to the sample surface, and wherein the system further comprises a sensor head carrier for receiving the sensor head, the sensor head carrier and the sensor head being provided with a mutually cooperating mounting structure for forming a kinematic mount having at least three contact points for detachable mounting of the sensor head on the sensor head carrier.