A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

A method of operation of a measurement system includes: capturing a probe measurement associated with a key, where the probe measurement is a first response or a second response based on a first microwave excitation or a second microwave excitation, respectively; generating a first channel voltage or a second channel voltage based on the first response or the second response, respectively; determining a phase offset based on the first channel voltage; storing the phase offset associated with the key; and calibrating the probe measurement by adjusting a phase based on computation of the second channel voltage with the phase offset accessed by the key.

A method of operation of a measurement system includes: capturing a probe measurement associated with a key, where the probe measurement is a first response or a second response based on a first microwave excitation or a second microwave excitation, respectively; generating a first channel voltage or a second channel voltage based on the first response or the second response, respectively; determining a phase offset based on the first channel voltage; storing the phase offset associated with the key; and calibrating the probe measurement by adjusting a phase based on computation of the second channel voltage with the phase offset accessed by the key.

In some embodiments of a method for calibrating metrology devices, an array of scanning probe microscopes (SPMs), such as AFMs, scan a plurality of targets on a wafer. Each SPM has a tip that moves vertically and also moves in at least one lateral direction. The AFM conducts a first scan at a wide FOV to locate the targets. For any misaligned AFMs, wherein the target is not within the zoom FOV of the AFM, the tip of such AFMs is actuated to move laterally to navigate to a respective target. Another scan is then performed at the zoom FOV to measure the targets. The array is then sequentially advanced, and the wide-and zoom-FOV scans are repeated, with navigation to correct misalignment as necessary, until all targets are scanned by all AFMs.

In some embodiments of a method for calibrating metrology devices, an array of scanning probe microscopes (SPMs), such as AFMs, scan a plurality of targets on a wafer. Each SPM has a tip that moves vertically and also moves in at least one lateral direction. The AFM conducts a first scan at a wide FOV to locate the targets. For any misaligned AFMs, wherein the target is not within the zoom FOV of the AFM, the tip of such AFMs is actuated to move laterally to navigate to a respective target. Another scan is then performed at the zoom FOV to measure the targets. The array is then sequentially advanced, and the wide-and zoom-FOV scans are repeated, with navigation to correct misalignment as necessary, until all targets are scanned by all AFMs.