An alignment system (100) and method for positioning and/or keeping a first object (1) at a controlled distanced (D1) with respect to a second object (2). An object stage (11) is configured to hold a surface (1a) of the first object (1) at a distance (D1) over a surface (2a) of the second object (2). A sensor device (31) comprising a probe tip (31a) is connected at a predetermined probe level distance (Dp) relative to the surface (1a) of the first object (1). The probe tip (31a) is configured to perform an atomic force measurement (AFM) of a force (F1) exerted via the probe tip (31a) on a surface (2a) of the second object (2). A controller (80) is configured to control an object stage actuator (21) as a function of the probe level distance (Dp) and the measured force (F1) to maintain the controlled distanced (D1).

The present document relates to a method of calibrating, in a scanning probe microscopy system, an optical microscope. The optical microscope is configured for providing a reference data for positioning a probe tip on a surface of a substrate. The calibration is performed using a calibration structure being a spatial structure including features at different Z-levels relative to a Z-axis, the Z-axis being perpendicular to the surface of the substrate. The method comprises a step of obtaining, with the optical microscope, at least two images of at least a part of the calibration structure. The at least two images are focused in at least two different levels of the Z-levels. The method further comprises a step of determining a lateral shift, in a direction perpendicular to the Z-axis, of the calibration structure as depicted in the at least two images focused in the at least two different levels. The invention is further directed at a calibration structure, a substrate carrier and scanning probe microscopy device.

The present document relates to a method of calibrating, in a scanning probe microscopy system, an optical microscope. The optical microscope is configured for providing a reference data for positioning a probe tip on a surface of a substrate. The calibration is performed using a calibration structure being a spatial structure including features at different Z-levels relative to a Z-axis, the Z-axis being perpendicular to the surface of the substrate. The method comprises a step of obtaining, with the optical microscope, at least two images of at least a part of the calibration structure. The at least two images are focused in at least two different levels of the Z-levels. The method further comprises a step of determining a lateral shift, in a direction perpendicular to the Z-axis, of the calibration structure as depicted in the at least two images focused in the at least two different levels. The invention is further directed at a calibration structure, a substrate carrier and scanning probe microscopy device.

Method of tuning parameter settings for performing acoustic scanning probe microscopy for subsurface imaging, scanning probe microscopy system, and computer program product. This document relates to a method of tuning a scanning probe microscopy system. The method comprises: a) applying an acoustic vibration signal comprising a first frequency and a second frequency to a sample; b) at a first position of the probe tip, sweeping the first frequency across a first frequency range, and obtaining a first signal; c) at a second position of the probe tip, sweeping the first frequency across at least said first frequency range, and obtaining a second signal; d) analyzing the first and second signals to obtain a difference characteristic dependent on the first frequency. The first and second position are selected such that a subsurface structure of the sample at the first and second position is different.

Method of tuning parameter settings for performing acoustic scanning probe microscopy for subsurface imaging, scanning probe microscopy system, and computer program product. This document relates to a method of tuning a scanning probe microscopy system. The method comprises: a) applying an acoustic vibration signal comprising a first frequency and a second frequency to a sample; b) at a first position of the probe tip, sweeping the first frequency across a first frequency range, and obtaining a first signal; c) at a second position of the probe tip, sweeping the first frequency across at least said first frequency range, and obtaining a second signal; d) analyzing the first and second signals to obtain a difference characteristic dependent on the first frequency. The first and second position are selected such that a subsurface structure of the sample at the first and second position is different.

A method and system for calibrating force (F12) in a dynamic mode atomic force microscope (AFM). An AFM tip (11) is disposed on a first cantilever (12). The first cantilever (12) is actuated to oscillate the AFM tip (11) in a dynamic mode. A first sensor (16) is configured to measure a first parameter (A1) of the oscillating AFM tip (11). A second sensor (26) is configured to measure a second parameter (A2) of a resilient element (22). The oscillating AFM tip (11) is moved in proximity to the resilient element (22) while measuring the first parameter (A1) of the AFM tip (11) and the second parameter (A2) of the resilient element (22). A force (F12) between the oscillating AFM tip (11) and the resilient element (22) is calculated based on the measured second parameter (A2) and a calibrated force constant (K2) of the resilient element (22).

A method for estimating a stiffness of a deformable part of a system including a four-photodiode detector for analyzing at least one characteristic of a sample. The method includes receiving the signals recorded by the four photodiodes, calculating the resultant signals from the recorded signals, calculating a cross-correlation of the resultant signals calculated for obtaining an intercorrelated signal, estimating the stiffness of the deformable part depending on the intercorrelated signal.

A method for estimating a stiffness of a deformable part of a system including a four-photodiode detector for analyzing at least one characteristic of a sample. The method includes receiving the signals recorded by the four photodiodes, calculating the resultant signals from the recorded signals, calculating a cross-correlation of the resultant signals calculated for obtaining an intercorrelated signal, estimating the stiffness of the deformable part depending on the intercorrelated signal.

The present invention relates to nanoprocessing and heterostructuring of silk. It has been shown that few-cycle femtosecond pulses are ideal for controlled nanoprocessing and heterostructuring of silk in air. Two qualitatively different responses, ablation and bulging, were observed for high and low laser fluence, respectively. Using this approach, new classes of silk-based functional topological microstructures and heterostructures which can be optically propelled in air as well as on fluids remotely with good control have been fabricated.

The present invention relates to nanoprocessing and heterostructuring of silk. It has been shown that few-cycle femtosecond pulses are ideal for controlled nanoprocessing and heterostructuring of silk in air. Two qualitatively different responses, ablation and bulging, were observed for high and low laser fluence, respectively. Using this approach, new classes of silk-based functional topological microstructures and heterostructures which can be optically propelled in air as well as on fluids remotely with good control have been fabricated.