A measurement system comprising: a radiation source arranged to generated a detection beam; a probe; and a probe positioning system arranged to move the probe from an un-aligned position in which it is not illuminated by the detection beam, to an aligned position in which it is illuminated by the detection beam and the detection beam is reflected by the probe to generate a reflected detection beam. A scanner generates a relative scanning motion between the probe and a sample, the sample being aligned with the probe and interacting with the probe during the relative scanning motion. A sensor detects the reflected detection beam during the relative scanning motion to collect a first data set from the sample. A second device is provided for modifying the sample or obtaining a second data set from the sample. A sample stage is arranged to move the sample in accordance with an offset vector stored in a memory so that it becomes un-aligned from the probe and aligned with the second device.

A measurement system comprising: a radiation source arranged to generated a detection beam; a probe; and a probe positioning system arranged to move the probe from an un-aligned position in which it is not illuminated by the detection beam, to an aligned position in which it is illuminated by the detection beam and the detection beam is reflected by the probe to generate a reflected detection beam. A scanner generates a relative scanning motion between the probe and a sample, the sample being aligned with the probe and interacting with the probe during the relative scanning motion. A sensor detects the reflected detection beam during the relative scanning motion to collect a first data set from the sample. A second device is provided for modifying the sample or obtaining a second data set from the sample. A sample stage is arranged to move the sample in accordance with an offset vector stored in a memory so that it becomes un-aligned from the probe and aligned with the second device.

A measurement system comprising: a radiation source arranged to generated a detection beam; a probe; and a probe positioning system arranged to move the probe from an un-aligned position in which it is not illuminated by the detection beam, to an aligned position in which it is illuminated by the detection beam and the detection beam is reflected by the probe to generate a reflected detection beam. A scanner generates a relative scanning motion between the probe and a sample, the sample being aligned with the probe and interacting with the probe during the relative scanning motion. A sensor detects the reflected detection beam during the relative scanning motion to collect a first data set from the sample. A second device is provided for modifying the sample or obtaining a second data set from the sample. A sample stage is arranged to move the sample in accordance with an offset vector stored in a memory so that it becomes un-aligned from the probe and aligned with the second device.

The invention relates to a probe system for a scanning probe microscope which (a) has a receptacle apparatus for a probe, (b) has a probe storage, which provides at least one probe for the scanning probe microscope, (c) wherein the probe, the probe storage, and the receptacle apparatus are embodied in such a way that the probe can form a releasable first connection with the probe storage and a releasable second connection with the receptacle apparatus, wherein the first connection and/or the second connection use a magnetic force; and wherein the receptacle apparatus and the probe storage are movable relative to one another in such a way for receiving the probe that the probe forms the second connection before the first connection is released.

The invention relates to a probe system for a scanning probe microscope which (a) has a receptacle apparatus for a probe, (b) has a probe storage, which provides at least one probe for the scanning probe microscope, (c) wherein the probe, the probe storage, and the receptacle apparatus are embodied in such a way that the probe can form a releasable first connection with the probe storage and a releasable second connection with the receptacle apparatus, wherein the first connection and/or the second connection use a magnetic force; and wherein the receptacle apparatus and the probe storage are movable relative to one another in such a way for receiving the probe that the probe forms the second connection before the first connection is released.

Cantilever probes are formed from a multilayer structure comprising an upper substrate, a lower substrate, an interior layer, a first separation layer, and a second separation layer, wherein the first separation layer is situated between the upper substrate and the interior layer, the second separation layer is situated between the lower substrate and the interior layer, and wherein the first and the second separation layers are differentially etchable with respect to the first and the second substrates, the interior layer. The upper substrate is a first device layer from which a probe tip is formed. The interior layer is a second device layer from which a cantilever arm is formed. The lower substrate is a handle layer from which a handle, or base portion, is formed. Patterning and etching processing of any layer is isolated from the other layers by the separation layers.

Cantilever probes are formed from a multilayer structure comprising an upper substrate, a lower substrate, an interior layer, a first separation layer, and a second separation layer, wherein the first separation layer is situated between the upper substrate and the interior layer, the second separation layer is situated between the lower substrate and the interior layer, and wherein the first and the second separation layers are differentially etchable with respect to the first and the second substrates, the interior layer. The upper substrate is a first device layer from which a probe tip is formed. The interior layer is a second device layer from which a cantilever arm is formed. The lower substrate is a handle layer from which a handle, or base portion, is formed. Patterning and etching processing of any layer is isolated from the other layers by the separation layers.

An apparatus for exchanging a probe includes a stacker configured to receive a probe and to align the probe, a probe connector connected to the probe, and a laser alignment unit including a light emitter and a light receiver. The light emitter is configured to emit a laser beam to the probe, and the light receiver is configured to detect the laser beam reflected by the probe. The laser alignment unit is configured to detect when the probe is properly aligned on the probe connector using the light receiver, and the laser alignment unit is configured to stop moving the stacker when it is detected that the probe is properly aligned.

A probe cassette for storing, transporting and handling one or more probe devices for a probe based system, the cassette including a body having at least one probe receptacle arranged to accommodate a probe device, wherein, at the probe receptacle, a vacuum clamping member is arranged for selectively holding the probe device under a retaining force, wherein the receptacle includes at least one aperture which is, during selective holding of the probe device, connectable to a vacuum pressure through a passageway arranged in the cassette body, wherein the cassette includes a first fluid port connectable to a first source of vacuum for delivering the vacuum pressure.

A probe cassette for storing, transporting and handling one or more probe devices for a probe based system, the cassette including a body having at least one probe receptacle arranged to accommodate a probe device, wherein, at the probe receptacle, a vacuum clamping member is arranged for selectively holding the probe device under a retaining force, wherein the receptacle includes at least one aperture which is, during selective holding of the probe device, connectable to a vacuum pressure through a passageway arranged in the cassette body, wherein the cassette includes a first fluid port connectable to a first source of vacuum for delivering the vacuum pressure.