Patent classifications
G01Q80/00
Initiating and monitoring the evolution of single electrons within atom-defined structures
A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.
Method and tip substrate for scanning probe microscopy
The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.
Phononic system to achieve quantum-analogue phase-based unitary operations
Various embodiments of a phononic system to achieve quantum-analogue phase-based unitary operations are disclosed. A plurality of diatomic molecules is adsorbed on a cubic crystal surface. At least a first pair of parallel chains is created from the plurality of diatomic molecules, such that the two constituent chains of the first pair of parallel chains each comprise three or more diatomic molecules. One or more diatomic molecules of the first pair of parallel chains are displaced in order to thereby create one or more kinks in the first pair of parallel chains. The one or more kinks apply a first desired phase transformation to elastic waves scattered by the plurality of diatomic molecules and adjusting the number of kinks or adjusting the order in which kinks are created or modified causes a corresponding adjustment to the first desired phase transformation.
Phononic system to achieve quantum-analogue phase-based unitary operations
Various embodiments of a phononic system to achieve quantum-analogue phase-based unitary operations are disclosed. A plurality of diatomic molecules is adsorbed on a cubic crystal surface. At least a first pair of parallel chains is created from the plurality of diatomic molecules, such that the two constituent chains of the first pair of parallel chains each comprise three or more diatomic molecules. One or more diatomic molecules of the first pair of parallel chains are displaced in order to thereby create one or more kinks in the first pair of parallel chains. The one or more kinks apply a first desired phase transformation to elastic waves scattered by the plurality of diatomic molecules and adjusting the number of kinks or adjusting the order in which kinks are created or modified causes a corresponding adjustment to the first desired phase transformation.
Device and method for analysing a defect of a photolithographic mask or of a wafer
The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.
Rugged, single crystal wide-band-gap-material scanning-tunneling-microscopy/lithography tips
Provided is a composite metal-wide-bandgap semiconductor tip for scanning tunneling microscopy and/or scanning, tunneling lithography, a method of forming, and a method for using the composite metal-wide-bandgap semiconductor tip.
Rugged, single crystal wide-band-gap-material scanning-tunneling-microscopy/lithography tips
Provided is a composite metal-wide-bandgap semiconductor tip for scanning tunneling microscopy and/or scanning, tunneling lithography, a method of forming, and a method for using the composite metal-wide-bandgap semiconductor tip.
METHOD AND TIP SUBSTRATE FOR SCANNING PROBE MICROSCOPY
The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.
Nano-indent Process for Creating Single Photon Emitters in a Two-dimensional Materials Platform
A nano-indent process for creating a single photon emitter in a two-dimensional materials platform comprising the steps of providing a substrate, providing a layer of polymer, providing a layer of two-dimensional material, utilizing a proximal probe, applying mechanical stress to the layer of two-dimensional material and to the layer of polymer, deforming the layer of two-dimensional material and the layer of polymer, and forming a nano-indent in the two-dimensional material. A single photon emitter in a two-dimensional materials platform comprising a substrate, a deformable polymer film, a two-dimensional material, and a nano-indent in the two-dimensional material.
Depassivation lithography by scanning tunneling microscopy
Methods, devices, and systems for forming atomically precise structures are provided. In some embodiments, the methods, devices, and systems of the present disclosure utilize a scanning tunneling microscope (STM) system to receive a sample having a surface to be patterned. The system positions a conductive tip over a pixel region of the surface. While the conductive tip remains laterally fixed relative to the surface, the system applies a bias voltage between the conductive tip and the surface such that a current between the conductive tip and the surface removes at least one atom from the pixel region. The system stops applying the voltage and current when it senses the removal of the at least one atom. The system then verifies that the at least one atom has been removed from the pixel region.