G01R3/00

Large probe head for testing electronic devices and related manufacturing method
12487253 · 2025-12-02 · ·

A method for manufacturing a probe head for the functionality testing of devices under test (DUT) is disclosed. The method includes providing a containment element, arranging a lower guide at a lower face of the containment element which faces toward the devices under test during the test, and arranging an upper guide at an upper face of the containment element. The containment element is interposed between the lower and upper guides which are initially in the shape of a single plate connected to the containment element. The method further includes cutting the lower and/or upper guide thereby defining a plurality of guide portions that are independent and separated from each other, and inserting a plurality of contact elements into respective guide holes formed in the guides. The contact elements are adapted to contact pads of the devices under test. A probe head obtained by the method is also disclosed.

Large probe head for testing electronic devices and related manufacturing method
12487253 · 2025-12-02 · ·

A method for manufacturing a probe head for the functionality testing of devices under test (DUT) is disclosed. The method includes providing a containment element, arranging a lower guide at a lower face of the containment element which faces toward the devices under test during the test, and arranging an upper guide at an upper face of the containment element. The containment element is interposed between the lower and upper guides which are initially in the shape of a single plate connected to the containment element. The method further includes cutting the lower and/or upper guide thereby defining a plurality of guide portions that are independent and separated from each other, and inserting a plurality of contact elements into respective guide holes formed in the guides. The contact elements are adapted to contact pads of the devices under test. A probe head obtained by the method is also disclosed.

METHODS OF FORMING A PROBE CARD FOR FINE PITCH CIRCUIT PROBE TESTING OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES
20250362322 · 2025-11-27 ·

A probe card for use in circuit probe testing and methods of fabrication thereof. The probe card includes a circuit board, an interposer structure that is mounted to the circuit board, and a probe structure mounted to the interposer structure and including a probe substrate, a redistribution layer over the probe substrate, and a plurality of probe pins over the redistribution layer. The interposer structure may include a plurality of elastically-deformable interposer pins electrically connecting the circuit board to the probe substrate. The center-to-center spacing (i.e., pin pitch) between the interposer pins may be greater than the center-to-center spacing (i.e., a second pin pitch) between the probe pins. A probe card in accordance with various embodiments may enable circuit probe testing of a device-under-test with a pitch between adjacent probe pins that is less than 50 m.

METHODS OF FORMING A PROBE CARD FOR FINE PITCH CIRCUIT PROBE TESTING OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES
20250362322 · 2025-11-27 ·

A probe card for use in circuit probe testing and methods of fabrication thereof. The probe card includes a circuit board, an interposer structure that is mounted to the circuit board, and a probe structure mounted to the interposer structure and including a probe substrate, a redistribution layer over the probe substrate, and a plurality of probe pins over the redistribution layer. The interposer structure may include a plurality of elastically-deformable interposer pins electrically connecting the circuit board to the probe substrate. The center-to-center spacing (i.e., pin pitch) between the interposer pins may be greater than the center-to-center spacing (i.e., a second pin pitch) between the probe pins. A probe card in accordance with various embodiments may enable circuit probe testing of a device-under-test with a pitch between adjacent probe pins that is less than 50 m.

Probe card and manufacturing method thereof

A probe card and a manufacturing method of a probe card are provided. The probe card includes a probe head, first and second substrates, an insulating component, and an adhesive member. The second substrate is disposed between the probe head and the first substrate, and is disposed on the first substrate. The second substrate faces the first substrate and includes second contacts. The second contacts are electrically connected to first contacts of the first substrate. The insulating component is disposed between the first substrate and the second substrate, and disposed at an outer side of the second contacts. The adhesive member is disposed on the first substrate, arranged on at least a part of the side surface of the second substrate, and disposed at an outer side of the insulating component.

Probe card and manufacturing method thereof

A probe card and a manufacturing method of a probe card are provided. The probe card includes a probe head, first and second substrates, an insulating component, and an adhesive member. The second substrate is disposed between the probe head and the first substrate, and is disposed on the first substrate. The second substrate faces the first substrate and includes second contacts. The second contacts are electrically connected to first contacts of the first substrate. The insulating component is disposed between the first substrate and the second substrate, and disposed at an outer side of the second contacts. The adhesive member is disposed on the first substrate, arranged on at least a part of the side surface of the second substrate, and disposed at an outer side of the insulating component.

METHOD FOR MANUFACTURING AN INTERFACE ELEMENT WITH ELASTIC PROPERTIES PROVIDED WITH INTERNAL ELECTRIC VIAS, IN PARTICULAR FOR CONNECTING A DEVICE TO BE TESTED TO A TESTING HEAD, AND INTERFACE ELEMENT OBTAINED WITH SAID METHOD
20250355022 · 2025-11-20 · ·

A method for manufacturing an interface element arranged to put a plurality of terminations of a device to be tested in contact with the corresponding channels of a testing head, the method including the steps of: arranging a planar lower support; depositing a first photoresist layer on the lower support; etching the first photoresist layer so as to form a plurality of through openings in the first photoresist layer; filling the plurality of through openings with a conductive material so as to form at least one conductive segment; repeating the above steps up to reach a desired thickness, where the conductive segments which are contiguous to each other define a plurality of conductors; removing the photoresist layers; and embedding the plurality of conductors in an elastomeric matrix.

METHOD FOR MANUFACTURING AN INTERFACE ELEMENT WITH ELASTIC PROPERTIES PROVIDED WITH INTERNAL ELECTRIC VIAS, IN PARTICULAR FOR CONNECTING A DEVICE TO BE TESTED TO A TESTING HEAD, AND INTERFACE ELEMENT OBTAINED WITH SAID METHOD
20250355022 · 2025-11-20 · ·

A method for manufacturing an interface element arranged to put a plurality of terminations of a device to be tested in contact with the corresponding channels of a testing head, the method including the steps of: arranging a planar lower support; depositing a first photoresist layer on the lower support; etching the first photoresist layer so as to form a plurality of through openings in the first photoresist layer; filling the plurality of through openings with a conductive material so as to form at least one conductive segment; repeating the above steps up to reach a desired thickness, where the conductive segments which are contiguous to each other define a plurality of conductors; removing the photoresist layers; and embedding the plurality of conductors in an elastomeric matrix.

System and method for integrating diode sensors on micromachined wafer probes

A probe chip device and a method for fabricating a probe chip device with an integrated diode sensor are disclosed. In one example, a probe chip device includes a beam head element that includes at least one probe tip that is configured to electrically probe a device under test. The probe chip device further includes a diode sensor that is heterogeneously integrated on the beam head element and is proximally positioned to the at least one probe tip.

System and method for integrating diode sensors on micromachined wafer probes

A probe chip device and a method for fabricating a probe chip device with an integrated diode sensor are disclosed. In one example, a probe chip device includes a beam head element that includes at least one probe tip that is configured to electrically probe a device under test. The probe chip device further includes a diode sensor that is heterogeneously integrated on the beam head element and is proximally positioned to the at least one probe tip.