There is provided an image capturing control apparatus. An AF control unit performs AF control within an area included in a captured area and corresponding to an AF mode, to perform control to determine an in-focus area. After the in-focus area is determined, an display control unit performs control to: if the AF mode is a first AF mode in which the in-focus area is automatically determined within a first area included in the captured area, magnify an LV image with reference to the in-focus area; and if the AF mode is a second AF mode in which the in-focus area is automatically determined within a second area that is smaller than the first area, magnify the LV image with reference to a predetermined position in the second area.

There is provided an image capturing control apparatus. An AF control unit performs AF control within an area included in a captured area and corresponding to an AF mode, to perform control to determine an in-focus area. After the in-focus area is determined, an display control unit performs control to: if the AF mode is a first AF mode in which the in-focus area is automatically determined within a first area included in the captured area, magnify an LV image with reference to the in-focus area; and if the AF mode is a second AF mode in which the in-focus area is automatically determined within a second area that is smaller than the first area, magnify the LV image with reference to a predetermined position in the second area.

The present invention provides an image pickup device that recognizes the object that the user is attempting to capture as the subject, tracks the movement of that subject, and can continue tracking the movement of the subject even when the subject leaves the capturing area so that the subject can always be reliably brought into focus. The image pickup device includes a main camera that captures the subject; an EVF that displays the captured image captured by the main camera, a sub-camera that captures the subject using a wider capturing region than the main camera, and a processing unit that extracts the subject from the captured images captured by the main camera and the sub-camera, tracks the extracted subject, and brings the subject into focus when an image of the subject is actually captured. When the subject moves outside of a capturing region of the main camera, the processing unit tracks the subject extracted from the captured image captured by the sub-camera.

The present invention provides an image pickup device that recognizes the object that the user is attempting to capture as the subject, tracks the movement of that subject, and can continue tracking the movement of the subject even when the subject leaves the capturing area so that the subject can always be reliably brought into focus. The image pickup device includes a main camera that captures the subject; an EVF that displays the captured image captured by the main camera, a sub-camera that captures the subject using a wider capturing region than the main camera, and a processing unit that extracts the subject from the captured images captured by the main camera and the sub-camera, tracks the extracted subject, and brings the subject into focus when an image of the subject is actually captured. When the subject moves outside of a capturing region of the main camera, the processing unit tracks the subject extracted from the captured image captured by the sub-camera.

The technology disclosed relates to relates to providing command input to a machine under control. It further relates to gesturally interacting with the machine. The technology disclosed also relates to providing monitoring information about a process under control. The technology disclosed further relates to providing biometric information about an individual. The technology disclosed yet further relates to providing abstract features information (pose, grab strength, pinch strength, confidence, and so forth) about an individual.

The technology disclosed relates to relates to providing command input to a machine under control. It further relates to gesturally interacting with the machine. The technology disclosed also relates to providing monitoring information about a process under control. The technology disclosed further relates to providing biometric information about an individual. The technology disclosed yet further relates to providing abstract features information (pose, grab strength, pinch strength, confidence, and so forth) about an individual.

Various embodiments of the present disclosure provide a method for forming a recessed gate electrode that has high thickness uniformity. A gate dielectric layer is deposited lining a recess, and a multilayer film is deposited lining the recess over the gate dielectric layer. The multilayer film comprises a gate electrode layer, a first sacrificial layer over the gate dielectric layer, and a second sacrificial layer over the first sacrificial dielectric layer. A planarization is performed into the second sacrificial layer and stops on the first sacrificial layer. A first etch is performed into the first and second sacrificial layers to remove the first sacrificial layer at sides of the recess. A second etch is performed into the gate electrode layer using the first sacrificial layer as a mask to form the recessed gate electrode. A third etch is performed to remove the first sacrificial layer after the second etch.

Various embodiments of the present disclosure provide a method for forming a recessed gate electrode that has high thickness uniformity. A gate dielectric layer is deposited lining a recess, and a multilayer film is deposited lining the recess over the gate dielectric layer. The multilayer film comprises a gate electrode layer, a first sacrificial layer over the gate dielectric layer, and a second sacrificial layer over the first sacrificial dielectric layer. A planarization is performed into the second sacrificial layer and stops on the first sacrificial layer. A first etch is performed into the first and second sacrificial layers to remove the first sacrificial layer at sides of the recess. A second etch is performed into the gate electrode layer using the first sacrificial layer as a mask to form the recessed gate electrode. A third etch is performed to remove the first sacrificial layer after the second etch.

Examples of an apparatus are disclosed. In some example, an apparatus includes a photodiode configured to generate a charge in response to incident light; a measurement capacitor to store at least a part of the charge to generate a voltage; and an analog-to-digital converter (ADC) circuit configured to: in a first measurement period, compare the voltage at the measurement capacitor against a static threshold voltage to generate a first output; in a second measurement period, compare the voltage against a varying threshold voltage to generate a second output, wherein the varying threshold voltage varies with time according to a pre-determined pattern; and generate a final output representing an intensity of the incident light based on either the first output or the second output.

Examples of an apparatus are disclosed. In some example, an apparatus includes a photodiode configured to generate a charge in response to incident light; a measurement capacitor to store at least a part of the charge to generate a voltage; and an analog-to-digital converter (ADC) circuit configured to: in a first measurement period, compare the voltage at the measurement capacitor against a static threshold voltage to generate a first output; in a second measurement period, compare the voltage against a varying threshold voltage to generate a second output, wherein the varying threshold voltage varies with time according to a pre-determined pattern; and generate a final output representing an intensity of the incident light based on either the first output or the second output.