A meta-optical device for light beam combining is provided to include a substrate and a meta-optical array that is formed on the substrate and that is disposed to receive N number of col-mated light beams. The meta-optical array includes a plurality of nanostructures that are made in such a way that the N number of collimated light beams are deflected to travel in a predetermined direction.

Provided is an image sensor including a metasurface having a light resonance function. The image sensor includes a photoelectric conversion layer, an interlayer material layer on the photoelectric conversion layer, and a single meta pattern layer on the interlayer material layer, wherein the meta pattern layer includes a metasurface, the metasurface having a same phase profile as that of a lens, and the meta pattern layer has a height that causes a resonance at a given wavelength of incident light to block transmission of the given wavelength through the meta pattern layer.

An optical imaging system includes a first lens having negative refractive power, a second lens having negative refractive power, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens. The first to seventh lenses are sequentially disposed from an object side toward an image side. The third lens, the fourth lens, the sixth lens, and the seventh lens are formed of plastic, and the first lens, the second lens, and the fifth lens are formed of glass.

An optical element for introducing a predetermined phase delay into incident electromagnetic radiation. The optical element comprises a first layer and a second layer arranged in a propagation path of a portion of the electromagnetic radiation. The first layer comprises a transmission regions configured to introduce a first phase delay into the portion of electromagnetic radiation propagating therethrough. The second layer comprises a metasurface configured to introduce a second phase delay into the portion of electromagnetic radiation propagating therethrough. The metasurface comprises subwavelength sized structures .

Systems, devices, and techniques for performing wavelength division multiplexing or demultiplexing using one or more metamaterials in an optical communications systems are described. An optical device may be configured to shift one or more phase profiles of an optical signal using one or more stages of metamaterials to multiplex or demultiplex wavelengths of optical signals. The optical device may be an example of a stacked design with two or more stages of metamaterials stacked on top of one another. The optical device may be an example of a folded design that reflects optical signals between different stages of metamaterials.

An optical system, comprising: (i) multiple input optical fibers; (ii) an optical mode multiplexer/demultiplexer coupled to said input optical fibers with, said optical mode multiplexer/demultiplexer comprising a plurality of metamaterial structures having length and forming at least one stage of metamaterials, the at least one stage of metamaterials is being situated on a surface of the optical mode multiplexer/demultiplexer facing the input optical fibers, and the at least one stage of metamaterials is oriented at angles between 60 and 120 degrees relative to the axis of the input fibers; and the metasurfaces are structured to receive a first optical signal having a first mode from at least one of said multiple input optical fibers and convert the first mode to a different mode.

An imaging system, includes: a laser light source having a wavelength from 380 nm to 490 nm; and a beam guidance element, the laser light source configured for generating an average surface power density of more than 10 W/cm.sup.2, the beam guidance element including a glass which has a quality factor F(436 nm)=S(436 nm)*(Abs.sub.0(436 nm)+Abs.sub.1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Abs.sub.1(436 nm) is an additional absorbance in comparison to Abs.sub.0(436 nm) at a wavelength of 436 nm after an irradiation with a power density of 345 W/cm.sup.2 for 72 hours with a laser light having a wavelength of 455 nm, Abs.sub.0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without the irradiation, k is the thermal conductivity, and the quality factor F(436 nm) is <15 ppm/W.

A circular polarization filter of a chiral metasurface structure is disclosed including a substrate having a nanograting pattern extending from the substrate, a dielectric layer formed directly on the nanograting pattern, and a plasmonic structure in direct contact with the dielectric layer, where the plasmonic structure may be oriented at a nonzero angle with respect to the nanograting pattern. An integrated polarization filter array is also disclosed including include a linear polarization filter, and a circular polarization filter. Methods of detecting full-stokes polarization using an integrated polarization filter array having both linear and circular polarization filters made from chiral metasurface structures is disclosed. Methods of using a Mueller matrix to evaluate polarization response of any optical device or system is also disclosed.

Provided is an optical glass, wherein, based on mass, an SiO.sub.2 content is 10.00% or more, a CaO content is 5.00% or more, a total content (La.sub.2O.sub.3+Gd.sub.2O.sub.3+Y.sub.2O.sub.3) of La.sub.2O.sub.3, Gd.sub.2O.sub.3 and Y.sub.2O.sub.3 is more than 0%, a total content (BaO+La.sub.2O.sub.3+Gd.sub.2O.sub.3+Y.sub.2O.sub.3) of BaO, La.sub.2O.sub.3, Gd.sub.2O.sub.3 and Y.sub.2O.sub.3 is 30.00% or less, and a mass ratio ((SiO.sub.2+B.sub.2O.sub.3)/(TiO.sub.2+Nb.sub.2O.sub.5+Ta.sub.2O.sub.5+WO.sub.3+Bi.sub.2O.sub.3)) of a total content of SiO.sub.2 and B.sub.2O.sub.3 relative to a total content of TiO.sub.2, Nb.sub.2O.sub.5, Ta.sub.2O.sub.5, WO.sub.3 and Bi.sub.2O.sub.3 is 0.75 or less.

A nonlinear optical material is represented by the following formula (1).

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