Systems and methods of fabricating electrodes, including thin metallic films, include depositing a first metallic layer on a substrate and passivating the deposited layer. The processes of deposition and passivation may be done sequentially. In some embodiments, a plurality of substrates may be coated with a metallic layer and further processed at a later time, including passivation and disposal of additional layers as discussed herein.

A fan-out semiconductor package includes: a semiconductor chip having an active surface with connection pads disposed thereon and an inactive surface opposing the active surface; an encapsulant encapsulating at least portions of the semiconductor chip; and a first connection member disposed on the active surface of the semiconductor chip, wherein the encapsulant is a cured photosensitive resin composition including a thermosetting resin, a carboxylic resin, an ethylenically unsaturated compound, and a reinforcing agent. The photosensitive resin composition may be used in the fan-out semiconductor package.

Disclosed are infrared light absorbing aminium and diimmonium compositions that have at least one absorption maximum in the infrared spectral region between about 700 and 1500 nm and that are useful, for example, as infrared absorbers. In one example, an infrared light aminium absorbing composition includes an anionic borate moiety and an aminium radical cation, which has at least one absorption peak in the near infrared wavelength region between about 700 and 1500 nm. In another example, an infrared light diimmonium absorbing composition includes two anionic borate moieties and a diimmonium radical cation, which has at least one absorption peak in the near infrared wavelength region between about 700 and 1500 nm. Such compositions may be incorporated into films or bulk materials to form light filters for electromagnetic radiation, including laser radiation.

The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.

Compounds useful as fluorescent or colored dyes are disclosed. The compounds have the following structure (I), including salts thereof, wherein R.sup.1a, R.sup.1b, R.sup.1c, R.sup.1d, R.sup.1e, R.sup.1f, R.sup.2a, R.sup.2b, R.sup.2c, R.sup.2d, R.sup.2e, R.sup.2f, R.sup.2g, R.sup.2h, R.sup.2i, R.sup.2j, x and y are as defined herein. Methods associated with preparation and use of such compounds are also provided.

##STR00001##

A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

Coating with photochromic properties, method for producing said coating and use thereof applicable to optical articles and glazed surfaces. The coating is formed by the combination of the following three elements: (1) a polymeric matrix, which is typically rigid and deposited on the surface of interest; (2) hollow, sealed micro- and/or nanocapsules dispersed within said matrix; and (3) solutions of photochromic compounds (chosen from a group comprising spirooxazine, azobenzenes or chromenes) in a liquid solvent that does not react (with the photochromic compound and with the capsule wall), which are encapsulated inside said micro- or nanocapsules.

Systems and methods of fabricating electrodes, including thin metallic films, include depositing a first metallic layer on a substrate and passivating the deposited layer. The processes of deposition and passivation may be done sequentially. In some embodiments, a plurality of substrates may be coated with a metallic layer and further processed at a later time, including passivation and disposal of additional layers as discussed herein.

The present invention relates to a solid tempera and to the method for manufacturing the same, which includes a dispersion of resin having a concentration value of 10% to 70%, sodium stearate having a concentration of 10% to 20%, glycerine having a concentration value of 4% to 20%, water having a concentration of 7% to 50%, a pigment having a concentration value of 5% to 15%, an anti-foaming agent having a concentration of 1% to 3%, and a biocide having a concentration of 0.10% to 0.4%, the above concentration values relating to the final product. The tempera of the invention is used for painting or drawing on a substrate such as paper, Bristol board, wood or cardboard, being applied directly to said substrates without having to add water.

The present invention relates to a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device, and a positive resist insulating layer prepared therefrom, and in particular, to a silsesquioxane-based photosensitive resin composition having high heat resistance and a low dielectric property, capable of being used as an insulating layer forming a via hole of the thin film transistor (TFT), and simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.