In an embodiment, a method includes: receiving data representative of an electrical circuit including an arrangement of devices, inputs, outputs, and power sources; determining a minimum number of segments based on the received data; grouping the devices into N segments based on common features shared between two or more of the devices, where N is equal to the minimum number of segments; and generating discrete portions of the grouped devices to form a physical layout representative of a physical manifestation of the electrical circuit, such that when the discrete portions are integrated together they form a physical manifestation of the electrical circuit.

A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.

A lithography apparatus comprises a light source for emitting light; a mask mounting zone where a mask for reflecting the light is disposed; and a mask protective module disposed on the mask to transmit the light from the light source toward the mask. The mask protective module comprises a frame and a membrane supported by the frame, wherein the membrane includes a penetration region for transmitting the light and a peripheral region of which a light transmittance is lower than that of the penetration region.

A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.

A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.

A patterning device configured for use in a lithographic apparatus, the lithographic apparatus being configured to use radiation for imaging a pattern at the patterning device via projection optics onto a substrate. The patterning device including a first component for reflecting and/or transmitting the radiation, and a second component covering at least a portion of a surface of the first component and configured to at least partially absorb the radiation incident on the second component. The second component has a sidewall, wherein at least one part of the sidewall extends away from the first component at an angle, the angle being with respect to a plane parallel to the surface of the first component, and wherein the angle is less than 85 degrees.

A mask protective module is provided. The mask protective module includes a frame and a membrane supported by the frame. The membrane may include regions of which light transmittances, heat conductivities and/or strengths are different from each other.

A mask protective module is provided. The mask protective module includes a frame and a membrane supported by the frame. The membrane may include regions of which light transmittances, heat conductivities and/or strengths are different from each other.

The present invention provides a laminate film and a display member including the laminate film, which are excellent in visibility of external information such as scenery and displayability of information from a projection member, and are also excellent in color tone reproducibility. The laminate film includes a laminate of 50 or more alternately arranged layers of a plurality of different thermoplastic resins, the laminate film having a transmittance of light incident perpendicularly to a film surface of 50% or more, the laminate film satisfying a relationship of R20≤R40<R70, wherein R20, R40, and R70 are reflectances of a P-wave incident at angles of 20°, 40°, and 70°, respectively, to the normal to the film surface, the reflectance of R70 being 30% or more, reflected light of the P-wave incident at 70° to the normal to the film surface having a saturation of 20 or less.

A method of manufacturing a display device including: preparing a substrate having a display area and a non-display area; and forming an alignment mark disposed in the non-display area of the substrate. The alignment mark includes a quadrangular-shaped center portion and a plurality of measurement portions that surround the center portion, the plurality of measurement portions including four or more measurement portions, and each of the measurement portions including sides that are parallel with two sides of the quadrangular-shaped center portion.