An apparatus and a method for embossing micro- and/or nanostructures include the embossing of the micro- and/or nanostructures in an embossing material.

A structured substrate includes a substrate body having an active side. The substrate body includes reaction cavities that open along the active side and interstitial regions that separate the reaction cavities. The structured substrate includes an ensemble amplifier positioned within each of the reaction cavities. The ensemble amplifier includes a plurality of nanostructures configured to at least one of amplify electromagnetic energy that propagates into the corresponding reaction cavity or amplify electromagnetic energy that is generated within the corresponding reaction cavity.

A device manufacturing method, the method comprising: obtaining a measurement data time series of a plurality of substrates on which an exposure step and a process step have been performed; obtaining a status data time series relating to conditions prevailing when the process step was performed on at least some of the plurality of substrates; applying a filter to the measurement data time series and the status data time series to obtain filtered data; and determining, using the filtered data, a correction to be applied in an exposure step performed on a subsequent substrate.

A mask, a display panel, and an electronic equipment are provided. The mask allows an opening pattern to be moved to a side of a repeat region. Based on this structure, the display panels with the same resolution and different sizes may use the masks with the same size, and differences between these masks are merely different distances between the opening patterns and edges of the repeat regions, thus solving at least one technical problem existing in conventional 8K electronic equipment that the masks with the different sizes require to be manufactured for the display panels with the different sizes.

Provided are: a photosensitive resin composition including a dye containing a mixture of (A-1) a compound represented by a particular chemical formula and a shell surrounding same, (A-2) a compound represented by another particular chemical formula and a shell surrounding same, and (A-3) a compound represented by still another particular chemical formula and a shell surrounding same; a photosensitive resin film prepared using the composition; a color filter including the photosensitive resin film; and a display device including the color filter.

Provided are: a photosensitive resin composition including a dye containing a mixture of (A-1) a compound represented by a particular chemical formula and a shell surrounding same, (A-2) a compound represented by another particular chemical formula and a shell surrounding same, and (A-3) a compound represented by still another particular chemical formula and a shell surrounding same; a photosensitive resin film prepared using the composition; a color filter including the photosensitive resin film; and a display device including the color filter.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition capable of obtaining a pattern having a good shape, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a salt including a cation represented by Formula (X) and a resin of which polarity increases through decomposition by the action of an acid.

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Provided are a curable composition used for forming an interlayer existing between a base material and a curable layer, the curable composition including a curable main agent having a polymerizable functional group, a polymerization inhibitor, and a solvent, in which a content of the polymerization inhibitor is 1 part by mass or greater and lower than 1,000 parts by mass with respect to 1,000,000 parts by mass of the curable main agent; a kit including the curable composition; an interlayer formed from the curable composition; a laminate including the interlayer; an imprint pattern producing method using the laminate; and a method for manufacturing a device including the imprint pattern producing method.

An imprint lithography method for positioning substrates includes supporting first and second substrates respectively atop first and second chucks, pneumatically suspending the first and second chucks laterally within first and second bushings, supporting the first and second chucks vertically within the first and second bushings, maintaining the first and second chucks respectively in first and second fixed rotational orientations, and forcing the first and second chucks in a downward direction independently of each other respectively against first and second vertical resistive forces until first and second top surfaces of the first and second substrates are coplanar, while maintaining the first and second chucks suspended laterally within the first and second bushings and while maintaining the first and second chucks in the first and second fixed rotational orientations.

A lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes an organic polymer particle, and the organic polymer particle is a reaction product obtained by at least reacting an aromatic polyvalent isocyanate compound having a structure represented by Formula PO and water, a method for making a lithographic printing plate having excellent printing resistance in the case of using an ultraviolet-curable ink in printing, a new organic polymer particle, and a resin composition including the organic polymer particle. ##STR00001##