An array substrate, a display panel, and an electronic device are provided. The array substrate includes: a base substrate; a first electrode arranged on the base substrate; a gate line arranged on the base substrate, wherein the gate line is electrically insulated from the first electrode; a second electrode arranged on a side of the gate line away from the base substrate, wherein at least one first sub-pixel unit provided on the base substrate includes: a first connection portion arranged in a same layer as the second electrode and a second connection portion arranged in a same layer as the gate line, wherein the second connection portion is electrically connected to the first electrode, and an orthographic projection of the second connection portion on the base substrate at least partially overlaps an orthographic projection of the first connection portion on the base substrate.

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

The present invention provides an imprint apparatus that forms an imprint material pattern on a substrate by using a mold, comprising: a discharge unit on which a plurality of discharge outlets configured to discharge an imprint material are arranged; a measurement unit configured to measure a relative tilt between the discharge unit and the substrate; and a control unit configured to control a process of causing the discharge unit to discharge the imprint material while relatively moving the discharge unit and the substrate to each other, wherein the control unit is configured to change a relative movement direction of the discharge unit and the substrate in the process in accordance with the relative tilt measured by the measurement unit so as to reduce an arrangement error of the imprint material, discharged from the plurality of discharge outlets, on the substrate.

A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.

A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.

Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.

Some devices, systems, and methods obtain a material map of a region; divide the region into a plurality of subregions; perform, for each of one or more subregions of the plurality of subregions, a first drop-pattern-generation process, wherein the first drop-pattern-generation process generates a respective initial drop pattern for the subregion based on the material map; and perform, for each of the one or more subregions of the plurality of subregions, a second drop-pattern-generation process, wherein the second drop-pattern-generation process generates a respective revised drop pattern for the subregion based on the material map and on the respective initial drop pattern for the subregion.

A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogonal subspace by a first angle such that the first principle component rotates to become a first factor vector and the second principle component rotates to become a second factor vector. An asymmetry vector is generated by rotating the second factor vector by a second angle, where the asymmetry vector and the first factor vector define a non-orthogonal subspace. An asymmetry contribution is determined in the measurement based on the projection of the measurement onto the first factor vector in the non-orthogonal subspace. The method also includes subtracting the asymmetry contribution from the measurement.

A displacement detection device is capable of stably and accurately detecting an amount of displacement. A polarization maintaining fiber has a length not to be equal to a length obtained by dividing, a product of an integral multiple of twice a length of a resonator times a refractive index of the resonator and a beat length obtained from a difference between propagation constants of two polarization modes, by a wavelength of the light source, is selected from a range including a length equal to the above length. The polarization maintaining fiber includes multiple polarization maintaining fibers fitted to each other by removable connectors.