The invention relates to a fabrication method for a part intended to be welded comprising a burnishing step for forming a perpendicular wall with respect to the surface undergoing burnishing intended to improve the flatness of the face to be welded.

The invention relates to a fabrication method for a part intended to be welded comprising a burnishing step for forming a perpendicular wall with respect to the surface undergoing burnishing intended to improve the flatness of the face to be welded.

The present invention relates to a micromechanical timepiece (1) having a plurality of mutually secured functional sub-assemblies (1a, 1b) stacked in a direction (Z) to form a multistage assembly, characterised in that each functional sub-assembly (1a, 1b) consists of a single semiconductor material and is secured to another sub-assembly (1a, 1b) via bridges (5) made of said semiconductor material, and in that at least one sub-assembly (1a, 1b) comprises at least two portions (2, 3), said portions being movable relative to each other and relative to another sub-assembly (1a, 1b) to which at least one of said portions (2, 3) is secured via at least one deformable link integrally formed between said portions (2, 3). The invention also relates to a method for making such a timepiece.

A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, forming pores on the surface of at least one part of a surface of said silicon-based substrate of a determined depth, entirely filling the pores with a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, in order to form, in the pores, a layer of the material of a thickness at least equal to the depth of the pores. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a determined depth, the pores being filled entirely with a layer of a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, of a thickness at least equal to the depth of the pores.

A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, forming pores on the surface of at least one part of a surface of said silicon-based substrate of a determined depth, entirely filling the pores with a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, in order to form, in the pores, a layer of the material of a thickness at least equal to the depth of the pores. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a determined depth, the pores being filled entirely with a layer of a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, of a thickness at least equal to the depth of the pores.

Provided is a watch component made of silicon and including a front surface, a back surface, and a side surface intersecting with the front surface and the back surface, the watch component including a first recessed portion formed at the front surface side, a second recessed portion formed at the back surface side, and a communicating groove causing one of the first recessed portion and the second recessed portion to communicate with the side surface.

A process for producing a part provided with an external element includes: providing an electrically conductive substrate having an upper surface and a raised pattern with a crest on the upper surface; depositing an electrically insulating layer onto the upper surface around the pattern to a thickness less than or equal to the distance between the crest and the upper surface; depositing a metal layer onto the crest by galvanic growth so that the metal layer partly rests on the insulating layer; dissolving the insulating layer; covering an assembly including the substrate and the metal layer with a mass of a base material of the part to form an imprint; separating the mass and the metal layer from the substrate, the mass then exhibiting an external element formed by a recess, the shape of which corresponds to the imprint and the base of which interfaces with the metal layer.

A method for manufacturing a silicon timepiece component (1) with a functional external profile.

The process for manufacturing a ceramic timepiece component includes:manufacturing an intermediate component (E1) in the form of green body based on ceria-zirconia;totally or partially debinding (E2) the intermediate component to obtain a debound intermediate component:partially impregnating (E3) the debound intermediate component with at least one solution comprising at least one metal salt, on one portion only of its surface, to obtain an impregnated debound intermediate component:sintering and thermally treating (E4) the impregnated debound intermediate component by performing at least one heat treatment under a reducing atmosphere (E42; E41).

A method for manufacturing a one-piece timepiece dial assembly made of light alloy includes making, in a first assembled state, a dial including a flange whose material is a first light alloy, including opposite to the first side of a display area visible to a user, at least one foot for attachment to the dial. The flange includes at least one receiving area complementary to an end area of at least one foot which is a weldable foot that can be welded or brazed to the flange at the interface between the receiving area and the end area. The weldable foot is made of material that is the first light alloy or a second light alloy that can be welded or brazed to the first light alloy. The method further includes irreversibly assembling by welding or brazing at least one weldable foot to the flange.