According to one embodiment, a memory device includes a first wiring line, a second wiring line, a memory cell connected between the first and second wiring lines, including a resistance change memory element having first and second resistance states, and a two-terminal switching element connected in series to the resistance change memory element, and a voltage application circuit which applies a write voltage signal having a first polarity and setting a desired resistance state to the resistance change memory element, to the memory cell, and applies, after the write voltage signal is applied to the memory cell, a second polarity voltage signal having a magnitude that prevents the two-terminal switching element from being set to the on-state, to the memory cell.

An integrated circuit for a print component including a number of memory bits. The integrated circuit may include a selection circuit to select at least one memory bit of the number of memory bits and fire actuators of a fire pulse group. The integrated circuit may include a memory voltage regulator to provide a write voltage to the at least one memory bit of the number of memory bits.

The invention provides a microelectronic device comprising at least two memory cells each comprising a so-called selection transistor and a memory element associated with said selection transistor, each transistor comprising a channel in the form of a wire extending in a first direction (x), a gate bordering said channel, a source extending in a second direction (y), and a drain connected to the memory element, said transistors being stacked in a third direction (z) and each occupying a given altitude level in the third direction (z), the microelectronic device wherein the source and the drain are entirely covered by spacers projecting in the third direction (z) in a plane (xy). The invention also provides a method for manufacturing such a device.

A DPE memristor crossbar array system includes a plurality of partitioned memristor crossbar arrays. Each of the plurality of partitioned memristor crossbar arrays includes a primary memristor crossbar array and a redundant memristor crossbar array. The redundant memristor crossbar array includes values that are mathematically related to values within the primary memristor crossbar array. In addition, the plurality of partitioned memristor crossbar arrays includes a block of shared analog circuits coupled to the plurality of partitioned memristor crossbar arrays. The block of shared analog circuits is to determine a dot product value of voltage values generated by at least one partitioned memristor crossbar array of the plurality of partitioned memristor crossbar arrays.

Provided are memory devices and memory systems. The memory device includes a memory cell array in a first semiconductor layer and including word lines stacked in a first direction, and channel structures passing through the word lines in the first direction; a control logic circuit in a second semiconductor layer located below the first semiconductor layer in the first direction; and a physical unclonable function (PUF) circuit including a plurality of through electrodes passing through the first semiconductor layer and the second semiconductor layer, and configured to generate PUF data according to resistance values of the plurality of through electrodes, and generate the PUF data based on a node voltage between through electrodes connected in series, among the plurality of through electrodes.

An electronic device comprises a semiconductor memory that includes: a memory cell; a protective layer disposed along a profile of the memory cell; and a buffer layer interposed between at least a portion of a sidewall of the memory cell and the protective layer, wherein the buffer layer and the protective layer include silicon nitride, and wherein a density of the protective layer is greater than a density of the buffer layer.

Carbon nanotube (CNT) memory cell elements and methods of forming CNT memory cell elements are provided. A CNT memory cell may comprise a CNT memory cell element, e.g., in combination with a transistor. A CNT memory cell element may include a metal/CNT layer/metal (M/CNT/M) structure formed between adjacent metal interconnect layers or between a silicided active layer (e.g., including MOSFET devices) and a metal interconnect layer. The M/CNT/M structure may be formed by a process including forming a tub opening in a dielectric region, forming a cup-shaped bottom electrode in the tub opening, forming a cup-shaped CNT layer in an interior opening defined by the cup-shaped bottom electrode, and forming a top electrode in an interior opening defined by the cup-shaped CNT layer.

Embodiments of the present invention include a memory cell that has a vertically-oriented fin. The memory cell may also include a resistive memory device located on a first lateral side of the fin. The resistive memory device may include a bottom electrode, a top electrode, and a resistive element between the bottom electrode and the top electrode. The memory cell may also include a vertical field-effect transistor having a metal gate and a gate dielectric contacting a second lateral side of the fin opposite the first lateral side.

An associative-memory-storage unit, and to an associative-memory-storage method are provided. The associative-memory-storage unit includes a first subset of at least memory sub-units over w bits, and a second memory sub-unit over v bits. The associative-memory-storage sub-unit may be used to associate messages with labels, and vice versa.

Provided is an electronic device including a first electrode; a second electrode facing the first electrode; and an active layer between the first electrode and the second electrode, wherein at least one of the first electrode and the second electrode includes a first surface that is closest to the active layer and a second surface that is farthest from the active layer, a size of a cross-sectional horizontal area at the first surface is smaller than a size of a cross-sectional horizontal area at the second surface, the active layer includes a first region, which vertically overlaps the first surface, and a second region outside the first region, and a thickness of the active layer in the first region is smaller than a thickness of the active layer in the second region.