A tilt adjusting image including a captured image that is obtained by capturing a wearer wearing a spectacle-type electronic device, and a horizontal line image indicating a horizontal direction identified by a tilt identification part, is displayed. The wearer adjusts a position of the spectacle-type electronic device by a wearer's hand or the like while viewing the tilt adjusting image so that the spectacle-type electronic device becomes horizontal. When the wearer judges that the spectacle-type electronic device has become horizontal, the wearer operates an operation part and inputs a calibration instruction. When the calibration instruction is input, the calibration instruction is transmitted to the spectacle-type electronic device.

A tilt adjusting image including a captured image that is obtained by capturing a wearer wearing a spectacle-type electronic device, and a horizontal line image indicating a horizontal direction identified by a tilt identification part, is displayed. The wearer adjusts a position of the spectacle-type electronic device by a wearer's hand or the like while viewing the tilt adjusting image so that the spectacle-type electronic device becomes horizontal. When the wearer judges that the spectacle-type electronic device has become horizontal, the wearer operates an operation part and inputs a calibration instruction. When the calibration instruction is input, the calibration instruction is transmitted to the spectacle-type electronic device.

The present disclosure provides apparatus and methods for the calibration of analog circuitry on an integrated circuit. One embodiment relates to a method of calibrating analog circuitry within an integrated circuit. A microcontroller that is embedded in the integrated circuit is booted up. A reset control signal is sent to reset an analog circuit in the integrated circuit, and a response signal for the analog circuit is monitored by the microcontroller. Based on the response signal, a calibration parameter for the analog circuit is determined, and the analog circuit is 10 configured using the calibration parameter. Other embodiments, aspects and features are also disclosed.

Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical path equivalent to an optical path in a reference chamber and an optical path in an aged chamber can be compared by determining a correction factor. The correction factor is applied to adjust a measured intensity of plasma radiation through the optical path in the aged chamber. Comparing a measured intensity of plasma radiation in the reference chamber and the adjusted measured intensity in the aged chamber provide an indication of changed chamber conditions. A magnitude of change between the two intensities can be used to adjust the process parameters to yield a processed substrate from the aged chamber which matches that of the reference chamber.

To effectively utilize work information acquired by maintenance of an instrument in a plant, an apparatus is provided, which includes an acquisition unit that acquires work information about at least one of a calibration or an adjustment performed on the instrument in a plant; an extraction unit that extracts a plurality of data elements to be included in output information having a predetermined output format from the work information; and a generation unit that generates the output information from the plurality of data elements.

The invention relates to a technical stage device (1), comprising a fastening element (2), a bearing element (3) and a functional element (4), in particular a camera or a spotlight, wherein the functional element (4) is arranged on the bearing element (3) so as to be pivotable about a tilt axis (14) and wherein the bearing element (3) is arranged on the fastening element (2) so as to be rotatable about a pan axis (13), wherein a position determination arrangement is provided, which is designed in such a way that a relative movement between the bearing element (3) and the fastening element (2) as well as between the bearing element (3) and the functional element (4) can be determined. Further, the invention relates to a method for determining the correlation function of predetermined tilt and pan values of a functional value (4), in particular a camera or a spotlight, to absolute motion values of the functional element (4).

The invention relates to a technical stage device (1), comprising a fastening element (2), a bearing element (3) and a functional element (4), in particular a camera or a spotlight, wherein the functional element (4) is arranged on the bearing element (3) so as to be pivotable about a tilt axis (14) and wherein the bearing element (3) is arranged on the fastening element (2) so as to be rotatable about a pan axis (13), wherein a position determination arrangement is provided, which is designed in such a way that a relative movement between the bearing element (3) and the fastening element (2) as well as between the bearing element (3) and the functional element (4) can be determined. Further, the invention relates to a method for determining the correlation function of predetermined tilt and pan values of a functional value (4), in particular a camera or a spotlight, to absolute motion values of the functional element (4).

An apparatus, system, and method to characterize a focal plane array. The apparatus includes a speckle field source to generate and emit a plurality of uniform speckle fields, a diamond-shape aperture, and a pedestal to mount the focal plane array at a predetermined distance from the aperture. The diamond-shape aperture shapes the uniform speckle fields from the speckle field source so that the uniform speckle fields have a desired power spectral density at the focal plane array. The desired power spectral density has recoverable aliased regions out to two times the Nyquist frequency of the focal plane array. The system includes a controller to characterize, by computing a modulation transfer function, the focal plane array based on the desired power spectral density of the uniform speckle fields impinging on the focal plane array.

The present disclosure provides apparatus and methods for the calibration of analog circuitry on an integrated circuit. One embodiment relates to a method of calibrating analog circuitry within an integrated circuit. A microcontroller that is embedded in the integrated circuit is booted up. A reset control signal is sent to reset an analog circuit in the integrated circuit, and a response signal for the analog circuit is monitored by the microcontroller. Based on the response signal, a calibration parameter for the analog circuit is determined, and the analog circuit is 10 configured using the calibration parameter. Other embodiments, aspects and features are also disclosed.

The present disclosure provides apparatus and methods for the calibration of analog circuitry on an integrated circuit. One embodiment relates to a method of calibrating analog circuitry within an integrated circuit. A microcontroller that is embedded in the integrated circuit is booted up. A reset control signal is sent to reset an analog circuit in the integrated circuit, and a response signal for the analog circuit is monitored by the microcontroller. Based on the response signal, a calibration parameter for the analog circuit is determined, and the analog circuit is configured using the calibration parameter. Other embodiments, aspects and features are also disclosed.