Patent classifications
G21K5/00
Electron beam sterilization apparatus
One object is to provide an electron beam sterilization apparatus including: an inner-surface sterilization chamber (5) including an inner-surface electron beam application device; and a blocking chamber (6) for receiving a preform product (P) from the inner-surface sterilization chamber (5) and blocking X-rays produced by application of the electron beam. The blocking chamber (6) includes an upstream opening (62) and a downstream opening (63) formed therein, the preform product (P) being received through the upstream opening (62) and transferred through the downstream opening (63). The blocking chamber (6) includes: a gripper (74) for gripping the preform product (P); a sterilized rotation table (71) for conveying the gripped preform product (P) in a circular path; and a blocking wall (81) not in contact with the sterilized rotation table (71) and configured to block the X-rays.
Electron beam sterilization apparatus
One object is to provide an electron beam sterilization apparatus including: an inner-surface sterilization chamber (5) including an inner-surface electron beam application device; and a blocking chamber (6) for receiving a preform product (P) from the inner-surface sterilization chamber (5) and blocking X-rays produced by application of the electron beam. The blocking chamber (6) includes an upstream opening (62) and a downstream opening (63) formed therein, the preform product (P) being received through the upstream opening (62) and transferred through the downstream opening (63). The blocking chamber (6) includes: a gripper (74) for gripping the preform product (P); a sterilized rotation table (71) for conveying the gripped preform product (P) in a circular path; and a blocking wall (81) not in contact with the sterilized rotation table (71) and configured to block the X-rays.
RADIATION MEASURING METHOD, APPARATUS AND DEVICE
The present disclosure discloses a method for measuring and checking the irradiation of a product by a radiation source using a measuring device. After conveying the product in front of the radiation source, the radiation beam irradiates the front of the product and passes through to hit the at least two detectors, which are pointing to the same target zone of the radiation source by a collimator. Finally, the recorded signal of each detector is compared with the signals determined in the performance qualification.
RADIATION MEASURING METHOD, APPARATUS AND DEVICE
The present disclosure discloses a method for measuring and checking the irradiation of a product by a radiation source using a measuring device. After conveying the product in front of the radiation source, the radiation beam irradiates the front of the product and passes through to hit the at least two detectors, which are pointing to the same target zone of the radiation source by a collimator. Finally, the recorded signal of each detector is compared with the signals determined in the performance qualification.
Photocathode kit, electron gun, and electron beam applicator
Provided is a photocathode kit that does not require adjustment of the distance between a photocathode film and a lens focusing on the photocathode film when the photocathode and the lens are installed inside an electron gun. The photocathode kit includes: a photocathode including a substrate in which a photocathode film is formed on a first surface; a lens; and a holder that holds the substrate and the lens, and the holder has a retaining member that retains the photocathode film and the lens to be spaced apart by a predetermined distance, and a first communication path that communicates between inside of the holder and outside of the holder.
DEVICES AND METHODS FOR MANIPULATING BEAMS FROM AN ELECTRON CYCLOTRON RESONANCE ACCELERATOR
Apparatuses and methods for accelerating electrons include an electron source configured to provide a beam of electrons and an accelerator that utilizes electron cyclotron resonance acceleration (eCRA). The accelerator includes a radio frequency (RF) cavity having a longitudinal axis, one or more inlets, and one or more outlets and a first electro-magnet substantially surrounding at least a portion of the cavity and configured to produce an axial magnetic field. The RF cavity is coupled to an RF source and configured to accelerate the beam of electrons axially entering the RF cavity with non-linear cyclotron resonance acceleration. A second electro-magnet located downstream of the one or more outlets of the RF cavity is configured to generate an inverse cusp in the axial magnetic field to manipulate the beam of electrons leaving the RF cavity from a helical orbit to a substantially linear path.
ULTRAVIOLET RADIATION APPARATUS
The present disclosure provides an ultraviolet (UV) radiation apparatus, where the UV radiation apparatus includes a chamber containing substrates, a sample stage supporting the substrates, UV lamps emitting UV light arranged opposite to the sample stage, and a mirror reflective structure arranged in the chamber. The sample stage is positioned at a top of the chamber or a bottom of the chamber. The mirror reflective structure includes protrusions or recesses that are orderly arranged; the protrusions or the recesses reflect the UV light along all directions and the UV light is irradiated on the mirror reflective structure.
ULTRAVIOLET RADIATION APPARATUS
The present disclosure provides an ultraviolet (UV) radiation apparatus, where the UV radiation apparatus includes a chamber containing substrates, a sample stage supporting the substrates, UV lamps emitting UV light arranged opposite to the sample stage, and a mirror reflective structure arranged in the chamber. The sample stage is positioned at a top of the chamber or a bottom of the chamber. The mirror reflective structure includes protrusions or recesses that are orderly arranged; the protrusions or the recesses reflect the UV light along all directions and the UV light is irradiated on the mirror reflective structure.
Method of optimizing a mask using pixel-based learning and method for manufacturing a semiconductor device using an optimized mask
A mask optimization method for optimizing a target mask used for a partial coherent system including a plurality of spatial filters is provided. The mask optimization method includes obtaining a trainer mask that is an optimized sample mask by performing a mask optimization on a sample mask, generating a mask optimization estimation model by performing a pixel-based learning using, as a feature vector of each of pixels of the trainer mask, partial signals of each of the pixels of the trainer mask respectively determined based on the spatial filters and using, as a target value, a degree of overlap between each of the pixels and a mask polygon of the trainer mask, and performing a mask optimization on the target mask using the mask optimization estimation model.
Radioisotope Production
A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).