Disclosed herein is an apparatus for electromagnetic x-ray control. The apparatus comprises a thermionic filament, positioned at a first end of a micro-focus x-ray tube and configured to generate an electron stream. The apparatus also comprises an x-ray generation target, positioned within the micro-focus x-ray tube at a second end of the micro-focus x-ray tube, opposite the first end, to receive the electron stream and to generate x-rays in response to the electron stream impinging on the x-ray generation target. The apparatus further comprises an electromagnetic field element, configured to generate an electromagnetic field that receives the electron stream and operable to vary the electromagnetic field to redirect the electron stream, within the micro-focus x-ray tube, to impinge on the x-ray generation target at variable locations on the x-ray generation target. Each one of the variable locations corresponds to a different one of multiple variations of the electromagnetic field.

An apparatus is disclosed for the examination and inspection of integrated devices such as integrated circuits. X-rays are transmitted through the integrated device, and are incident on a photoemissive structure that absorbs x-rays and emits electrons. The electrons emitted by the photoemissive structure are shaped by an electron optical system to form a magnified image of the emitted electrons on a detector. This magnified image is then recorded and processed. For some embodiments of the invention, the photoemissive structure is deposited directly onto the integrated device. In some embodiments, the incidence angle of the x-rays is varied to allow internal three-dimensional structures of the integrated device to be determined. In some embodiments, the recorded image is compared with a reference data to enable inspection for manufacturing quality control.

An apparatus is disclosed for the examination and inspection of integrated devices such as integrated circuits. X-rays are transmitted through the integrated device, and are incident on a photoemissive structure that absorbs x-rays and emits electrons. The electrons emitted by the photoemissive structure are shaped by an electron optical system to form a magnified image of the emitted electrons on a detector. This magnified image is then recorded and processed. For some embodiments of the invention, the photoemissive structure is deposited directly onto the integrated device. In some embodiments, the incidence angle of the x-rays is varied to allow internal three-dimensional structures of the integrated device to be determined. In some embodiments, the recorded image is compared with a reference data to enable inspection for manufacturing quality control.

An X-ray microscope includes at least one of an X-ray source, a sample holding part, a concave Kirkpatrick-Baez mirror, a convex Kirkpatrick-Baez mirror, and a light receiving part located at a position in an imaging relation to a position of the sample holding part in this order along an optical axis.

An X-ray microscope includes at least one of an X-ray source, a sample holding part, a concave Kirkpatrick-Baez mirror, a convex Kirkpatrick-Baez mirror, and a light receiving part located at a position in an imaging relation to a position of the sample holding part in this order along an optical axis.

The present invention relates to an optical system with a variable focal distance in a predetermined focal distance range, comprising two mirrors and a KB mechanical assembly having two supports adapted to support the mirrors one after the other along their main axis so as to form a propagation path.

The system is characterized in that each mirror has a useful portion whose width and/or thickness is/are variable and selected according to said predetermined distance range, and in that, for each mirror, it further comprises a deformation mechanism adapted to generate a curvature of the corresponding mirror along its length to adjust the focal distance within said predetermined distance range.

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

An energy converter unit and X-ray source system are presented. The energy converter unit comprises a multilayered crystal structure having a selected layers' arrangement comprising at least first and second of layers of at least first and second material compositions. The layers-arrangement is formed of a pattern of n1 layers of said first layer type and n2 layers of said second layer type generating a selected lattice periodicity of said layers. The lattice periodicity is selected such that said multilayered crystal structure responds to the charged particle beam of predetermined parameters by coherent emission of X-ray radiation having selected spectral content and emission direction.

In this patent, we teach methods to generate coherent X-ray and UUV rays beams for X ray and UUV microscopes using intense femtosecond pulses resulting the Ultra-Supercontinuum (USC) and Higher Harmonic Generation (HHG) from χ3 and χ.sup.5 media produce from electronic and molecular Kerr effect. The response of n.sub.2 (χ3) and n.sub.4 (χ5) at the optical frequency from instantaneously response of carrier phase of envelope results in odd HHG and spectral broadening about each harmonic on the anti-Stokes side of the pump pulse at wo typically in the visible, NIR, and MIR. From the slower molecular Kerr response on femtosecond to picosecond from orientation and molecular motion on n.sub.2 and n.sub.4 which follow the envelope of optical field of the laser gives rise to extreme broadening without HHG. The resulting spectra extend on the Stokes side towards the IR, RF to DC covering most of the electromagnetic spectrum. These HHG and Super broadening covering UUV to X rays and possibly to gamma ray regime for microscopes.

An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector has an energy resolution not less than 1 keV or the X-ray detector has no energy analysis function.