X ray apparatus includes a sample stage (4) for supporting a sample (6), an X-ray source (2) and an energy dispersive X-ray detector (8). A conical X-ray collimator (10) is provided either between the sample and the X-ray source or between the sample and the energy-dispersive X-ray detector, the conical X-ray collimator including a plurality of truncated cones arranged concentrically around a central axis, the truncated cones having a common apex defining a central measurement spot on the sample.

To provide an X-ray microscope that has a size small enough to be brought into a room by shortening the path length, an X-ray microscope including at least one of each of an X-ray source 1, a sample holding part 3, a concave KB mirror 4, a convex KB mirror 5, and a light receiving part 8 located at a position in an imaging relation to a position of the sample holding part 3 in this order along an optical axis is fabricated.

X ray apparatus includes a sample stage (4) for supporting a sample (6), an X-ray source (2) and an energy dispersive X-ray detector (8). A conical X-ray collimator (10) is provided either between the sample and the X-ray source or between the sample and the energy-dispersive X-ray detector, the conical X-ray collimator including a plurality of truncated cones arranged concentrically around a central axis, the truncated cones having a common apex defining a central measurement spot on the sample.

An improved microreactor for use in microscopy, use of said microreactor, and a microscope comprising said reactor. The present invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy (EM and FIB), and in particular Transmission Electron Microscopy (TEM). However its application is extendable in principle to any field of microscopy, especially wherein characteristics of a (solid) specimen (or sample) are studied in detail, such as during a reaction.

A product structure (407, 330) is formed with defects (360-366). A spot (S) of EUV radiation which is at least partially coherent is provided on the product structure (604) to capture at least one diffraction pattern (606) formed by the radiation after scattering by the product structure. Reference data (612) describes a nominal product structure. At least one synthetic image (616) of the product structure is calculated from the captured image data. Data from the synthetic image is compared with the reference data to identify defects (660-666) in the product structure. In one embodiment, a plurality of diffraction patterns are obtained using a series overlapping spots (S(1)-S(N)), and the synthetic image is calculated using the diffraction patterns and knowledge of the relative displacement. The EUV radiation may have wavelengths in the range 5 to 50 nm, close to dimensions of the structures of interest.

In the field of resolution test charts for analysis of the resolution of X-ray tomography systems, a test chart comprises a substrate bearing X-ray absorbent zones, with widths and spacings to allow measurement of the system resolution. To avoid shadow effects when the X-ray illumination beam is divergent and when the absorbent zones have a large height/width ratio (from 2 to 5 for example), the absorbent zones in the diverse points of the pattern have a shape of which a general direction of elevation with respect to the surface of the substrate is rotated toward a point of convergence which is the same for all absorbent zones. The X-ray source is placed at the convergence point, eliminating shadow effects. The oblique elevation can be obtained by specific etching steps, or curvature of the substrate after fabrication of the absorbent patterns, or else by use of two superimposed partial test charts.

The invention relates to a method and an imaging system (100) for generating X-ray images. The system (100) comprises at least one X-ray source, preferably an array of X-ray sources (101a-101d), and an X-ray detector (103) with an array of sensitive pixels (103a-103e). A collimator (102) is arranged between the X-ray source and the detector such that two openings (P) of the collimator (102) allow the passage of X-rays towards two neighboring pixels (103a-103e) while the region between said pixels is substantially shielded. This shielding of the usually insensitive regions between pixels reduces unnecessary X-ray exposure. A sufficiently large X-ray intensity can be achieved by using a plurality of small X-ray sources (101a-101d).

A product structure (407, 330) is formed with defects (360-366). A spot (S) of EUV radiation which is at least partially coherent is provided on the product structure (604) to capture at least one diffraction pattern (606) formed by the radiation after scattering by the product structure. Reference data (612) describes a nominal product structure. At least one synthetic image (616) of the product structure is calculated from the captured image data. Data from the synthetic image is compared with the reference data to identify defects (660-666) in the product structure. In one embodiment, a plurality of diffraction patterns are obtained using a series overlapping spots (S(1)-S(N)), and the synthetic image is calculated using the diffraction patterns and knowledge of the relative displacement. The EUV radiation may have wavelengths in the range 5 to 50 nm, close to dimensions of the structures of interest.

A method and high precision robot arm system are provided, for example, for X-ray nanodiffraction with an X-ray nanoprobe. The robot arm system includes duo-vertical-stages and a kinematic linkage system. A two-dimensional (2D) vertical plane ultra-precision robot arm supporting an X-ray detector provides positioning and manipulating of the X-ray detector. A vertical support for the 2D vertical plane robot arm includes spaced apart rails respectively engaging a first bearing structure and a second bearing structure carried by the 2D vertical plane robot arm.