Patent classifications
H01H1/00
Circuit Interrupter and Method of Determining Contact Wear Based Upon Temperature
A circuit interrupter includes a temperature detection system that is configured to detect a measured temperature of at least one of a line conductor, a load conductor, a movable contact, and a stationary contact during operation of the circuit interrupter. The measured temperature is representative of an extent of wear of the set of separable contacts. In one embodiment the temperature detection system includes a temperature sensor that is an infrared sensor. In another embodiment, the temperature detection system includes a temperature sensor that is in physical contact with an electrically conductive structure within the circuit interrupter and therefore additionally employs a voltage filter that filters a line voltage from the signal from the temperature sensor. In another embodiment, the temperature detection system employs a temperature sensor that is in physical contact with an electrically conductive structure, but a wireless transceiver is used to wirelessly communicate the measured temperature
Nanoelectromechanical devices with metal-to-metal contacts
Nanoelectromechanical systems (NEMS) devices/switches and methods for implementing and fabricating the same with conducting contacts are provided. A nanoelectromechanical system (NEMS) switch can include a substrate; a source cantilever formed over the substrate and configured to move relative to the substrate; a drain electrode and at least one gate electrode formed over the substrate; wherein the source cantilever, drain and gate electrodes comprises a metal layer affixed to a support layer, at least a portion of the metal layer at the contact area extending past the support layer; and an interlayer sandwiched between the support layer and substrate.
Planar cavity MEMS and related structures, methods of manufacture and design structures
A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
High speed arc suppressor
A high speed arc suppressor and method include a first phase-specific arc suppressor configured to suppress arcing across contacts of the power contactor in a positive domain and a second phase-specific arc suppressor configured to suppress arcing across the contacts in a negative domain. First and second high speed switches are configured to enable and disable operation of an associated one of the first and second phase-specific arc suppressors. First and second drivers are configured to drive the first and second high speed switches.
SWITCHGEAR WITH AN OPTICAL MONITORING SYSTEM
A switchgear includes an optical monitoring system for examining switchgear switching positions. At least one isolating switch is accommodated in an encapsulated housing. The encapsulated housing is disposed in an installation housing. The encapsulated housing has a first transparent window in one region. A fiber-optic system leads from an outer side of the installation housing to the first transparent window.
Full Symmetric Multi-Throw Switch Using Conformal Pinched Through Via
A hermetically sealed component may comprise a glass substrate, a device with at least one electrical port associated with the glass substrate, and a glass cap. The glass cap may have at least one side wall. The glass cap may have a shaped void extending therethrough, from top surface of the glass cap to bottom surface of glass pillar. An electrically conductive plug may be disposed within the void, the plug configured to hermetically seal the void. The electrically conductive plug may be electrically coupled to the electrical port. The glass cap may be disposed on the glass substrate, with the at least one side wall disposed therebetween, to form a cavity encompassing the device. The side wall may contact the glass substrate and the glass cap to provide a hermetic seal, such that a first environment within the cavity is isolated from a second environment external to the cavity.
Dropout Recloser
A dropout recloser is capable of in accordance with its operating programming after a predetermined number of fault interrupting operations, e.g., 1, 2, 3 or more but typically 3, to drop out of a cutout and hang freely in a hinge contact of the cutout providing sectionalization with an observable visible gap. The recloser includes fault interrupting and reclosing components, a drop out mechanism and a controller. The drop out mechanism may include a bi-stable actuator to affect fault interrupting operation and dropout operation. The device may include motion limiting structures. The recloser may have a number of operating modes or sequences.
SCALABLE NANOTUBE FABRICS AND METHODS FOR MAKING SAME
The present disclosure provides scalable nanotube fabrics and methods for controlling or otherwise adjusting the nanotube length distribution of a nanotube application solution in order to realize scalable nanotube fabrics. In one aspect of the present disclosure, one or more filtering operations are used to remove relatively long nanotube elements from a nanotube solution until nanotube length distribution of the nanotube solution conforms to a preselected or desired nanotube length distribution profile. In another aspect of the present disclosure, a sono-chemical cutting process is used to break up relatively long nanotube elements within a nanotube application solution into relatively short nanotube elements to realize a pre-selected or desired nanotube length distribution profile.
Micro-electro-mechanical system (MEMS) and related actuator bumps, methods of manufacture and design structures
Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are provided. The method of forming a MEMS structure includes forming fixed actuator electrodes and a contact point on a substrate. The method further includes forming a MEMS beam over the fixed actuator electrodes and the contact point. The method further includes forming an array of actuator electrodes in alignment with portions of the fixed actuator electrodes, which are sized and dimensioned to prevent the MEMS beam from collapsing on the fixed actuator electrodes after repeating cycling. The array of actuator electrodes are formed in direct contact with at least one of an underside of the MEMS beam and a surface of the fixed actuator electrodes.
Method of manufacturing a switch
MEMS switches and methods of manufacturing MEMS switches is provided. The MEMS switch having at least two cantilevered electrodes having ends which overlap and which are structured and operable to contact one another upon an application of a voltage by at least one fixed electrode.