According to some aspects, a monochromatic x-ray source is provided. The monochromatic x-ray source comprises an electron source configured to generate electrons, a primary target arranged to receive electrons from the electron source to produce broadband x-ray radiation in response to electrons impinging on the primary target, and a secondary target comprising at least one layer of material capable of producing monochromatic x-ray radiation in response to incident broadband x-ray radiation emitted by the primary target.

An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.

An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.

An x-ray micro-beam radiation production system is provided having: a source of accelerated electrons, an electron focusing component configured to focus the electrons provided by the source, and a target which produces x-rays when electrons impinge thereon from the source. The electron focusing component is configured to focus the electrons provided by the source such that they impinge at a focal spot having a width δ formed on a surface of the target. The focusing component is configured to move the electron beam relative to the target such that the focal spot moves across the target surface in the width direction, and/or the target is movable relative to the focusing component such that the focal spot moves across the target surface in the width direction, the surface velocity of the focal spot across the target surface in the width direction being greater than v.sub.t where: formula (I), k, ρ and c denoting respectively the heat conductivity, the density and the heat capacity of the target material, and d denoting the electron penetration depth in the target material. $\begin{array}{cc}{v}_t=\frac{\pi k}{4\rho c}.Math.\frac{\delta }{d^2},& \left(I\right)\end{array}$

Disclosed is a radiation logging tool, comprising a tool housing; a compact generator that produces radiation; a power supply coupled to the compact generator; and control circuitry. Embodiments of the compact generator comprise a generator vacuum tube comprising a source generating charged particles, and a target onto which the charged particles are directed; and a high voltage supply comprising a high voltage multiplier ladder located laterally adjacent to the generator vacuum tube. The high voltage supply applies a high voltage between the source and the target to accelerate the charged particles to a predetermined energy level. The compact generator also includes an electrical coupling between an output of the high voltage supply and the target of the generator vacuum tube to accommodate the collocated positions of the generator vacuum tube and the high voltage power supply.

The present disclosure provides a reliable X-ray generating tube that forms a focus with a stable size and shape. The X-ray generating tube includes an electron gun including an electron emitting portion, a plurality of grid electrodes, and an insulating support member that supports the plurality of grid electrodes. The electron gun includes a conductive section that hides the insulating support member to prevent the insulating support member from being directly viewed from an electron through path of electrons emitted from the electron emitting portion and passing through the grid electrodes.

In one embodiment, an X-ray source includes a source target configured to generate X-rays when impacted by an electron beam. The source target includes one or more thermally conductive layers; and one or more X-ray generating layers interleaved with the thermally conductive layers, wherein at least one X-ray generating layer comprises regions of X-ray generating material separated by thermally conductive material within the respective X-ray generating layer.

Disclosed are a cartridge-type X-ray source apparatus and an X-ray emission apparatus using the same. The X-ray source includes: a cathode electrode provided with an electron emission source by using a nanostructure; an anode electrode having a target emitting X-rays by electron collision; and a housing forming an external appearance, and exposing a cathode electrode terminal connected to the cathode electrode and an anode electrode terminal connected to the anode electrode to an outside thereof, wherein the cathode electrode terminal and the anode electrode terminal differ from each other in at least one of exposure direction, height, size, and shape.

An X-ray generation device includes an X-ray tube including an electron gun that generates an electron beam and a target that generates an X-ray by incidence of the electron beam; a power supply portion including a booster that boosts an input voltage from outside to generate a high voltage and an insulating block that seals the booster with an insulating material; and a control unit that performs control to generate the X-ray. The control unit includes a first information processing element that performs at least part of the control using a digital signal at a high potential based on the high voltage. The first information processing element is sealed with the insulating material in the insulating block.

An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.