Methods and apparatus disclosed herein generally relate to lamp heating of process chambers used to process semiconductor substrates. More specifically, implementations disclosed herein relate to arrangement and control of lamps for heating of semiconductor substrates. In some implementations of the present disclosure, fine-tuning of temperature control is achieved by dividing different lamps within an array of lamps into various subgroups or lamp assemblies defined by a specific characteristic. These various subgroups may be based on characteristics such as lamp design and/or lamp positioning within the processing chamber.

A emitter is formed of a thin-film membrane disposed within a cavity so as to provide a output beam. The emitter may be configured to obtain broadband light. The emitter may enhance the emissivity of light over a broad spectral band.

A emitter is formed of a thin-film membrane disposed within a cavity so as to provide a output beam. The emitter may be configured to obtain broadband light. The emitter may enhance the emissivity of light over a broad spectral band.

Embodiments of the disclosure provided herein include an apparatus and method for lamp heating in process chambers used to process semiconductor substrates. The apparatus includes a lamp for use in a processing chamber, the lamp having a lamp envelope with an interior volume, a first end of the lamp envelope coupled to a base, a second end of the lamp envelope opposing the first end, a filament disposed within the interior volume, and a radiation shield proximate to the second end. In another embodiment, the lamp assembly has at least one lamp, the at least one lamp having a lamp envelope having an interior volume, a first end of the lamp envelope coupled to a base, a second end of the lamp envelope opposing the first end, a filament disposed within the interior volume, and a radiation shield proximate to the second end.

Embodiments of the disclosure provided herein include an apparatus and method for lamp heating in process chambers used to process semiconductor substrates. The apparatus includes a lamp for use in a processing chamber, the lamp having a lamp envelope with an interior volume, a first end of the lamp envelope coupled to a base, a second end of the lamp envelope opposing the first end, a filament disposed within the interior volume, and a radiation shield proximate to the second end. In another embodiment, the lamp assembly has at least one lamp, the at least one lamp having a lamp envelope having an interior volume, a first end of the lamp envelope coupled to a base, a second end of the lamp envelope opposing the first end, a filament disposed within the interior volume, and a radiation shield proximate to the second end.

A roof rail is disposed on a motor vehicle and furnished with an integrated light system. The light system has at least one light source and one or more batteries that are part of the system arranged in or on a cover of the roof rail. The battery powered light system enables the light system to be operated independently of any connection to the onboard power supply of the motor vehicle, and it is then no longer necessary to provide an electrical connection between the light system and the onboard power supply or the motor vehicle electronics. A computer program, when executed on a light system controller, is configured to detect a position of a vehicle door and switch the at least one light source of the light system on and off.

A method of providing active illumination during biometry that utilizes pulsed lighting synchronized to frame acquisition. Two distinct illumination modalities are provided: the first maximizes the quality of images captured by the imaging system, and the second minimizes the overall illumination perceived by the user in combination with the first. The two modalities are provided substantially simultaneously. The first modality always includes a set of pulses synchronized with frame acquisition. The second modality may be either a second set of pulses not synchronized with frame acquisition or constant background illumination. The two modalities may be generated by two separate sources of illumination or by the same single illumination source. Adding the second modality to the first reduces user discomfort and the chances of an epileptic response as compared to using the first modality alone. The two modalities may have different wavelengths, pulse durations, or intensities.

A lamp and epitaxial processing apparatus are described herein. In one example, the lamp includes a bulb, a filament, and a plurality of filament supports disposed in spaced-apart relation to the filament, each of the filament supports having a hook support and a hook. The hook includes a connector configured to fasten the hook to the hook support, a first vertical portion extending from the connector toward the filament, and a rounded portion extending from an end of the first vertical portion distal from the connector and configured to wrap around the filament. A second vertical portion extends from an end of the rounded portion distal from the first vertical portion and the second vertical portion has a length between 60% and 100% of the length of the first vertical portion.

An irradiation device for introducing infrared radiation into a vacuum processing chamber has an infrared emitter capped on one end and including an emitter casing tube in the form of a round glass tube, of which a closed end projects into the vacuum processing chamber. A vacuum feedthrough holds the emitter casing tube and leads it in a gas-tight manner through an opening of the vacuum processing chamber. A heating filament and a current return are arranged in the emitter casing tube, wherein the heating conductor has, in the section of the emitter casing tube surrounded by the vacuum feedthrough, a connection element that is led out from the emitter casing tube. The connection element of the heating conductor is guided through a tube section and the return conductor has, in the section of the emitter casing tube surrounded by the vacuum feedthrough, a means for compensating for thermal expansion.

An irradiation device for introducing infrared radiation into a vacuum processing chamber has an infrared emitter capped on one end and including an emitter casing tube in the form of a round glass tube, of which a closed end projects into the vacuum processing chamber. A vacuum feedthrough holds the emitter casing tube and leads it in a gas-tight manner through an opening of the vacuum processing chamber. A heating filament and a current return are arranged in the emitter casing tube, wherein the heating conductor has, in the section of the emitter casing tube surrounded by the vacuum feedthrough, a connection element that is led out from the emitter casing tube. The connection element of the heating conductor is guided through a tube section and the return conductor has, in the section of the emitter casing tube surrounded by the vacuum feedthrough, a means for compensating for thermal expansion.