Provided is a semiconductor package and a method of manufacturing the same, wherein in the semiconductor package, an area on a surface of a heat release metal layer pressed by a molding die is expanded and the molding die directly and uniformly compresses an upper substrate and/or a lower substrate, each of which does not include heat release posts so that contamination of a substrate occurring due to a molding resin may be prevented and molding may be stably performed.

A circuit structure is provided. The circuit structure may include a first die area including an output gate, a second die area including a circuit and an input gate and a die-to-die interconnect. The input gate may include a transistor. The circuit may be connected between the die-to-die interconnect and a gate region of the transistor. The circuit may include a MOS transistor. A first source/drain region of the MOS transistor may be connected to the die-to-die interconnect.

An interposer comprises a semiconductor material and includes cache memory under a location on the interposer for a host device. Memory interface circuitry may also be located under one or more locations on the interposer for memory devices. Microelectronic device assemblies incorporating such an interposer and comprising a host device and multiple memory devices are also disclosed, as are methods of fabricating such microelectronic device assemblies.

A semiconductor memory device according to an embodiment includes a substrate, a first conductor layer, second conductor layers, a first semiconductor layer, a pillar, and a contact. The pillar has a portion provided to penetrate the second conductor layers and the first semiconductor layer. The contact is electrically connected to the pillar and the first conductor layer. The pillar includes a second semiconductor layer, a first insulator layer provided at least between the second semiconductor layer and the second conductor layers, and a third semiconductor layer provided between the second semiconductor layer and the first semiconductor layer and in contact with each of the second semiconductor layer and the first semiconductor layer.

In certain aspects, a memory device includes an array of memory cells and a plurality of peripheral circuits coupled to the array of memory cells. The peripheral circuits include a first peripheral circuit including a recess gate transistor. The peripheral circuits also include a second peripheral circuit including a flat gate transistor.

In certain aspects, a method for forming a three-dimensional (3D) memory device is disclosed. A first semiconductor structure including an array of NAND memory strings is formed on a first substrate. A second semiconductor structure including a recess gate transistor is formed on a second substrate. The recess gate transistor includes a recess gate structure protruding into the second substrate. The first semiconductor structure and the second semiconductor structure are bonded in a face-to-face manner, such that the array of NAND memory strings is coupled to the recess gate transistor across a bonding interface.

In certain aspects, a three-dimensional (3D) memory device includes a first semiconductor structure, a second semiconductor structure, and a bonding interface between the first and the second semiconductor structures. The first semiconductor structure includes an array of NAND memory strings, a first peripheral circuit of the array of NAND memory strings including a first transistor, a polysilicon layer between the array of NAND memory strings and the first peripheral circuit, and a first semiconductor layer in contact with the first transistor. The polysilicon layer is in contact with sources of the array of NAND memory strings. The second semiconductor structure includes a second peripheral circuit of the array of NAND memory strings including a second transistor, and a second semiconductor layer in contact with the second transistor. The second semiconductor layer is between the bonding interface and the second peripheral circuit. The first semiconductor layer is between the polysilicon layer and the second semiconductor layer.

A three-dimensional 3D memory device includes a first semiconductor structure and a second semiconductor structure. The first semiconductor structure includes a first semiconductor layer and an array of NAND memory strings. The second semiconductor structure is under a second side of the first semiconductor layer. The second side of the first semiconductor layer is opposite to the first side of the first semiconductor layer. The second semiconductor structure includes a second semiconductor layer, a first peripheral circuit, and a second peripheral circuit. The first peripheral circuit includes a first transistor in contact with a first side of the second semiconductor layer. The second peripheral circuit includes a second transistor in contact with a second side of the second semiconductor layer. The second side of the second semiconductor layer is opposite to the first side of the second semiconductor layer.

A device includes: a first chip including a qubit; and a second chip bonded to the first chip, the second chip including a substrate including first and second opposing surfaces, the first surface facing the first chip, wherein the second chip includes a single layer of superconductor material on the first surface of the substrate, the single layer of superconductor material including a first circuit element. The second chip further includes a second layer on the second surface of the substrate, the second layer including a second circuit element. The second chip further includes a through connector that extends from the first surface of the substrate to the second surface of the substrate and electrically connects a portion of the single layer of superconducting material to the second circuit element.

One superconducting qubit device package disclosed herein includes a die having a first face and an opposing second face, and a package substrate having a first face and an opposing second face. The die includes a quantum device including a plurality of superconducting qubits and a plurality of resonators on the first face of the die, and a plurality of conductive pathways coupled between conductive contacts at the first face of the die and associated ones of the plurality of superconducting qubits or of the plurality of resonators. The second face of the package substrate also includes conductive contacts. The device package further includes first level interconnects disposed between the first face of the die and the second face of the package substrate, coupling the conductive contacts at the first face of the die with associated conductive contacts at the second face of the package substrate.