A fuse memory comprising a discharge circuit is provided. The fuse memory includes a fuse cell array comprising fuse cells connected to read word lines, programs word lines, and bit lines arranged in rows and columns; and at least one discharge circuit arranged in each of the rows. The discharge circuit discharges a voltage level of a program word line of the fuse cells selected in a read mode to a ground voltage.

An embodiment static random access memory (SRAM) array includes a writable SRAM cell disposed in a first row of the SRAM array and an SRAM read current tracking cell in the first row of the SRAM array. The SRAM current tracking cell includes a first read pull-down transistor and a first read pass-gate transistor. The first read pull-down transistor includes a first gate electrically connected to a first positive supply voltage line; a first source/drain electrically connected to a first ground line; and a second source/drain. The first read pass-gate transistor includes a third source/drain electrically connected to the second source/drain and a fourth source/drain electrically connected to a read tracking bit line (BL). The read tracking BL is electrically connected to a read sense amplifier timing control circuit.

A memory system comprises an SRAM array and a NVM array. The SRAM array and NVM array are both organized in rows and columns. The NVM array is directly coupled to the SRAM array. The memory system may also be coupled to a system bus of a data processing system. The number of columns of the NVM array is an integer multiple of the number of columns of the SRAM array, where the integer multiple is greater than one. Column logic is coupled to the SRAM array and to the NVM array. The column logic controls accesses to the SRAM and to the NVM array, and the column logic controls direct data transfers between the SRAM array and the NVM array.

A semiconductor device includes an active area extending in a first direction, a first transistor including a first gate electrode and first source and drain areas disposed on the active area, the first source and drain areas being disposed at opposite sides of the first gate electrode, a second transistor including a second gate electrode and second source and drain areas disposed on the active area, the second source and drain areas being disposed at opposite sides of the second gate electrode, and a third transistor including a third gate electrode and third source and drain areas disposed on the active area, the third source and drain areas being disposed at opposite sides of the third gate electrode, and the first gate electrode, the second gate electrode, and the third gate electrode extending in a second direction different from the first direction. The second transistor is configured to turn on and off, based on an operation mode of the semiconductor device.

An object is to provide a microcontroller (MCU) system with low power consumption. The MCU system includes a CPU, a first memory cell, and a second memory cell. The first memory cell includes a first transistor and a first capacitor. The second memory cell includes a second transistor and a second capacitor. The first memory cell functions as a data memory. The second memory cell functions as a program memory. Each of the first and second transistors contains an oxide semiconductor in a channel formation region. The capacitance of the second capacitor is preferably larger than that of the first capacitor.

An embodiment is an integrated circuit structure including a static random access memory (SRAM) cell having a first number of semiconductor fins, the SRAM cell having a first boundary and a second boundary parallel to each other, and a third boundary and a fourth boundary parallel to each other, the SRAM cell having a first cell height as measured from the third boundary to the fourth boundary, and a logic cell having the first number of semiconductor fins and the first cell height.

A method of forming a semiconductor device includes receiving a substrate with a plurality of gate structures; forming spacers on sidewalls of the gate structures; evaluating a pitch variation to the gate structures; determining an etch recipe according to the pitch variation; performing an etch process to source/drain regions associated with the gate structures using the etch recipe, thereby forming source/drain recesses with respective depths; and performing an epitaxy growth to form source/drain features in the source/drain recesses using a semiconductor material.

A vertical memory device includes insulating interlayer patterns, of gate electrodes, a channel, and a charge storage pattern structure. The insulating interlayer patterns are spaced in a first direction. The gate electrodes between are neighboring insulating interlayer patterns, respectively. The channel extends through the insulating interlayer patterns and the gate electrodes in the first direction. The charge storage pattern structure includes a tunnel insulation pattern, a charge trapping pattern structure, and a blocking pattern sequentially stacked between the channel and each of the gate electrodes in a second direction. The charge trapping pattern structure includes charge trapping patterns spaced in the first direction. The charge trapping patterns are adjacent to sidewalls of first gate electrodes, respectively. A first charge trapping pattern extends in the first direction along a sidewall of a first insulating interlayer pattern.

In a method of manufacturing a semiconductor device, a first FinFET including a first fin structure, a first gate electrode structure disposed over the first fin structure and a first source/drain region is formed. A second FinFET including one second fin structure, a second gate electrode structure disposed over the second fin structure and a second source/drain region is formed. A first epitaxial layer is formed on the first fin structure in the first source/drain region, and a second epitaxial layer is formed on the second fin structure in the second source/drain region. A width of the first fin structure is smaller than a width of the second fin structure.

Collateral etching of a dielectric material around a trench during formation of a substrate contact via structure can be avoided employing an aluminum oxide layer. The aluminum oxide layer functions as an etch stop layer during an anisotropic etch that removes horizontal portions of an insulating material layer to form an insulating spacer. The aluminum oxide layer may be a conformal or a non-conformal material layer, and may, or may not, include a horizontal portion that overlies an alternating stack of insulating layers and electrically conductive layers. Electrical shorts caused by widening of the top portion of the trench can be avoided through use of the aluminum oxide layer. Memory stack structures can extend through the alternating stack to provide a three-dimensional memory stack structure. A source region can be formed underneath the trench, and the substrate contact via structure can be employed as a source contact via structure.