A semiconductor substrate includes a buried semiconductor layer and semiconductor wells. A device for detecting a possible thinning of the semiconductor substrate via the rear face thereof is formed on and in the semiconductor wells. The device is a non-inverting buffer including an input terminal and an output terminal, the device being powered between a supply terminal and a reference terminal where the buried semiconductor layer provides the supply terminal. A control circuit delivers an input signal in a first state to the input terminal and outputs a control signal indicating a detection of a thinning of the substrate if a signal generated at the output terminal in response to the input signal is in a second state different from the first state.

Various embodiments of solid state transducer (“SST”) devices are disclosed. In several embodiments, a light emitter device includes a metal-oxide-semiconductor (MOS) capacitor, an active region operably coupled to the MOS capacitor, and a bulk semiconductor material operably coupled to the active region. The active region can include at least one quantum well configured to store first charge carriers under a first bias. The bulk semiconductor material is arranged to provide second charge carriers to the active region under the second bias such that the active region emits UV light.

Various embodiments of the present disclosure are directed towards an integrated chip (IC). The IC comprises a substrate. A resistor overlies the substrate. The resistor comprises a first metal nitride structure, a second metal nitride structure spaced from the first metal nitride structure, and a metal structure disposed between the first metal nitride structure and the second metal nitride structure. A first dielectric structure is disposed over the substrate and the resistor.

An active matrix substrate includes a plurality of source bus lines and a plurality of gate bus lines and a plurality of oxide semiconductor TFTs that have a plurality of pixel TFTs, each of which is associated with one of the plurality of pixel regions, and a plurality of circuit TFTs constituting a peripheral circuit, in which each of oxide semiconductor TFTs has an oxide semiconductor layer and a gate electrode disposed on a channel region of the oxide semiconductor layer via a gate insulating layer, the plurality of oxide semiconductor TFTs have a plurality of first TFTs, a plurality of second TFTs, and/or a plurality of third TFTs, and the plurality of first TFTs have the plurality of pixel TFTs, and the plurality of second TFTs and/or the plurality of third TFTs have at least a portion of the plurality of circuit TFTs.

The present disclosure discloses an oxide semiconductor thin-film transistor and a method of fabricating the same. According to one embodiment of the present disclosure, the oxide semiconductor thin-film transistor includes a substrate, a gate electrode, a gate insulating layer, an oxide semiconductor layer, and source and drain electrodes. Since the gate insulating layer is formed of at least one of zirconium oxide (ZrOx) and lanthanum zirconium oxide (LaZrOx), the electrical characteristics of the oxide semiconductor thin-film transistor may be controlled by the gate insulating layer.

Monolithic multi-throw diode switch structures are described. The monolithic multi-throw diode switches include a hybrid arrangement of diodes with different intrinsic regions. In one example, a method of manufacture of a monolithic multi-throw diode switch includes providing an intrinsic layer on an N-type semiconductor substrate, implanting a first P-type region to a first depth into the intrinsic layer to form a first PIN diode comprising a first effective intrinsic region of a first thickness, implanting a second P-type region to a second depth into the intrinsic layer to form a second PIN diode comprising a second effective intrinsic region of a second thickness, and forming at least one metal layer over the intrinsic layer to electrically couple the first PIN diode to a node between a common port and a first port of the switch.

Monolithic multi-throw diode switch structures are described. The monolithic multi-throw diode switches include a hybrid arrangement of diodes with different intrinsic regions. In one example, a method of manufacture of a monolithic multi-throw diode switch includes providing an intrinsic layer on an N-type semiconductor substrate, implanting a first P-type region to a first depth into the intrinsic layer to form a first PIN diode comprising a first effective intrinsic region of a first thickness, implanting a second P-type region to a second depth into the intrinsic layer to form a second PIN diode comprising a second effective intrinsic region of a second thickness, and forming at least one metal layer over the intrinsic layer to electrically couple the first PIN diode to a node between a common port and a first port of the switch.

A biosensor includes a source element; a drain element; a semiconductor channel element between the source element and the drain element for forming an electrically conductive channel with adjustable conductivity between the source and drain elements; a first gate element configured to be electrically biased to set a given operational regime of the sensor with given electrical conductivity of the channel; and a second gate element, physically separate from the first gate element, configured to contact a solution comprising analytes allowed to interact with a gate contact surface of the second gate element to generate a surface potential change dependent on the concentration of the analytes in the solution. The channel element is substantially fully depleted allowing the first and second gate elements to be electrostatically coupled such that the surface potential change at the second gate element is configured to modify the electrical conductivity of the channel.

A semiconductor device is made by: forming a metal film containing Al on a surface of a substrate product including a substrate and a nitride semiconductor layer on the substrate, the metal film covering a via hole forming predetermined region, and the surface of the substrate product being located on the nitride semiconductor layer side, forming an etching mask having an opening for exposing the via hole forming predetermined region on a back surface of the substrate product, the back surface of the substrate product being located on the substrate side, and forming a via hole in the substrate product by reactive ion etching, the via hole reaching the surface from the back surface and exposing the metal film. In the forming of the via hole, a reaction gas containing fluorine is used during a period at least including a termination of etching.

Disclosed are an adhesive transparent electrode and a method of fabricating the same. More particularly, an adhesive transparent electrode according to an embodiment of the present disclosure includes a substrate and an adhesive silicone-based polymer matrix, in which a metal nanowire network is embedded, deposited on the substrate, wherein the adhesive silicone-based polymer matrix includes a silicone-based polymer including a silicone-based polymer base and a silicone-based polymer crosslinker; and a non-ionic surfactant.