A method and an apparatus for selectively cancelling the effect of the active center of a molecule are provided. The method comprises illuminating a target molecule with two synchronized ultrashort X-ray pulses using a laser, the two synchronized ultrashort X-ray pulses having different central photon energies the subtraction of which matches the photon energy of a peak of the core spectrum of the target molecule, such that a core state of an atom of the target molecule, and also of identical surrounding molecules, is selectively excited by the re-DFG effect as a result of the illumination. The method is implementable for simple or complex molecular systems and bulk materials.

An EUV light source for an illumination device of a microlithographic proj ection exposure apparatus, includes an electron source for generating an electron beam, an accelerator unit for accelerating the electron beam, and an undulator arrangement for generating EUV light by deflecting the electron beam. The undulator arrangement includes a first undulator for generating EUV light having a first polarization state and at least one second undulator for generating EUV light having a second polarization state different than the first polarization state. The second undulator is downstream of the first undulator along the direction of propagation of the electron beam. The undulator arrangement is configured so that it has a first operating mode, in which the first undulator is in saturation with regard to the generation of EUV light, and at least one second operating mode, in which the first undulator is not in saturation with regard to the generation of EUV light.

An EUV light source for an illumination device of a microlithographic proj ection exposure apparatus, includes an electron source for generating an electron beam, an accelerator unit for accelerating the electron beam, and an undulator arrangement for generating EUV light by deflecting the electron beam. The undulator arrangement includes a first undulator for generating EUV light having a first polarization state and at least one second undulator for generating EUV light having a second polarization state different than the first polarization state. The second undulator is downstream of the first undulator along the direction of propagation of the electron beam. The undulator arrangement is configured so that it has a first operating mode, in which the first undulator is in saturation with regard to the generation of EUV light, and at least one second operating mode, in which the first undulator is not in saturation with regard to the generation of EUV light.

A portable computing device is disclosed. The portable computing device can take many forms such as a laptop computer, a tablet computer, and so on. The portable computing device can include at least a single piece housing. The single piece housing can be machined from a single billet of material, such as a billet of aluminum. The single piece housing can include ledges with a surface receiving a trim bead and a cover. Corner brackets can be attached to the single piece housing to improve the damage resistance of the housing.

A female terminal includes a box portion which is formed into a quadrangular prism-like shape so as for a tab of a male terminal to fit therein by bending a copper alloy plate which is obtained by being continuously and repeatedly bent before an age heat treatment is applied thereto, which has a proof stress of 700 MPa or larger and a width of 10 mm or larger and in which no crack is produced therein when bent 180 degrees about a bending axis which is at right angle to a rolling direction of the copper alloy plate. The box portion comprises notches which are formed in inner sides of bent portions produced by bending the copper alloy plate. A depth of the notch is set to be in the range from to of a thickness of the copper alloy plate.

A method for producing a housing structure at least partially enclosing at least one component, wherein the housing structure is produced with a construction process utilizing at least one of repeated layered deposition and solidification of material, which is interrupted at least once before completion of the housing structure, and during at least one interruption at least one component, which is not produced by the construction process, is joined to or disposed in a partially finished housing structure, and the construction process is then continued after the interruption until the housing is completed, wherein at least one of an actuator and sensor comprising at least partially a transformer material selected as the at least one component to be joined to or disposed in the housing structure.

The invention relates to a method for producing a pressure sensor, comprising the following steps: assembling a support substrate with a deformable membrane on which strain gauges have been deposited, wherein the deformable membrane comprises a thinned area at the center thereof, the support substrate is disposed on top of the deformable membrane, the support substrate comprises an upper surface and a lower surface in contact with the deformable membrane, and the support substrate also comprises lateral recesses arranged on top of the strain gauges and a central recess arranged on top of the thinned area of the membrane, so as to obtain a micromechanical structure; and, once the assembly has been obtained, depositing, in a single step, at least one conductive material on the upper surface of the support and in the lateral recesses of the support, said conductive material extending into the recesses in order to be in contact with the strain gauges so as to form electrical contacts in contact with the strain gauges.

The disclosure relates to a free-electron laser system and a method for generating a packet of relativistic electrons capable of propagating in a first propagation direction (Oz), and a device for generating an undulator beam capable of interacting with the packet of relativistic electrons. In the system, the undulator beam results from combining, at an interaction area through which the propagation direction (Oz) of the packet passes, at least two laser beams propagating in different directions and each of which has at least one non-zero component in a plane orthogonal to the propagation direction (Oz) of the packet. The disclosure also relates to a method for generating a free-electron laser beam involving trapping and guiding a packet of relativistic electrons injected into an interaction area and implementing such a free-electron laser system.

An improved optical undulator for use in connection with free electron radiation sources is provided. A tilt is introduced between phase fronts of an optical pulse and the pulse front. Two such pulses in a counter-propagating geometry overlap to create a standing wave pattern. A line focus is used to increase the intensity of this standing wave pattern. An electron beam is aligned with the line focus. The relative angle between pulse front and phase fronts is adjusted such that there is a velocity match between the electron beam and the overlapping optical pulses along the line focus. This allows one to provide a long interaction length using short and intense optical pulses, thereby greatly increasing the radiation output from the electron beam as it passes through this optical undulator.

An improved optical undulator for use in connection with free electron radiation sources is provided. A tilt is introduced between phase fronts of an optical pulse and the pulse front. Two such pulses in a counter-propagating geometry overlap to create a standing wave pattern. A line focus is used to increase the intensity of this standing wave pattern. An electron beam is aligned with the line focus. The relative angle between pulse front and phase fronts is adjusted such that there is a velocity match between the electron beam and the overlapping optical pulses along the line focus. This allows one to provide a long interaction length using short and intense optical pulses, thereby greatly increasing the radiation output from the electron beam as it passes through this optical undulator.