A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

Provided are blanking panels and methods of use for preventing the exchange of cold and hot air in an electronics rack having at least one module. The blanking panels comprise a face having a top edge and an oppositely positioned bottom edge; a first planar member extending transversely from the top or bottom edge; and a second planar member that is slidably engaged with the first planar member. The second planar member is configured for parallel movement relative to the first planar member. Further, the first and second planar members are configured to prevent airflow from a superior side of the blanking panel to an inferior side of the blanking panel. Methods of making and use are further provided.

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.

A carburized La.sub.2O.sub.3 and Lu.sub.2O.sub.3 co-doped Mo filament cathode is made from lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders, the lanthanum oxide (La.sub.2O.sub.3) and lutetium oxide (Lu.sub.2O.sub.3) doped molybdenum (Mo) powders contain La.sub.2O.sub.3, Lu.sub.2O.sub.3 and Mo with the total concentration of La.sub.2O.sub.3 and Lu.sub.2O.sub.3 being 2.0-5.0 wt. % and the rest being Mo.

Rotatable support system for mounting one or more photovoltaic modules and method thereof. The system includes a stiffener configured to be attached to the one or more photovoltaic modules, a column connected to the stiffener through at least a rotatable component, and a foot connected to the column. The column is configured to rotate from a folded position towards an unfolded position, and stop at the unfolded position separated from the folded position by an angle difference. The angle difference represents the maximum range of rotation for the column.

A technique for controlling and compensating the energy spread of a charged particle beam is provided. This technique is based on a passive dielectric-loaded structure that redistributes the energy within the bunch by means of the wakefield generated in the structure. Cylindrical and planar structure configurations are provided and also means for electrical and mechanical tuning to optimize performance. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

A technique for controlling and compensating the energy spread of a charged particle beam is provided. This technique is based on a passive dielectric-loaded structure that redistributes the energy within the bunch by means of the wakefield generated in the structure. Cylindrical and planar structure configurations are provided and also means for electrical and mechanical tuning to optimize performance. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

A near-field electron laser includes a light source and a sealed container. The interior of the sealed container is filled with an electron gas, the light source produces incident light, under the irradiation of the incident light, electrons will be forced to vibrate, and emit secondary electromagnetic waves, so that the vibrating electrons are in the near-field of each other; the incident light causes an attractive force to be produced among the vibrating electrons, and under the action of the electric field intensity of the incident light and the attractive force, the electrons will vibrate in the same radial straight line and in the same direction, and have a constant frequency, amplitude, and phase difference; the interference effects of the radiation of the vibrating electrons are used to obtain a stronger directionality and intensity to form a laser light.

A near-field electron laser includes a light source and a sealed container. The interior of the sealed container is filled with an electron gas, the light source produces incident light, under the irradiation of the incident light, electrons will be forced to vibrate, and emit secondary electromagnetic waves, so that the vibrating electrons are in the near-field of each other; the incident light causes an attractive force to be produced among the vibrating electrons, and under the action of the electric field intensity of the incident light and the attractive force, the electrons will vibrate in the same radial straight line and in the same direction, and have a constant frequency, amplitude, and phase difference; the interference effects of the radiation of the vibrating electrons are used to obtain a stronger directionality and intensity to form a laser light.