Patent classifications
H05G2/00
Scanning Linear Accelerator System Having Stable Pulsing At Multiple Energies and Doses
A linac-based X-ray system for cargo scanning and imaging applications uses linac design, RF power control, beam current control, and beam current pulse duration control to provide stable sequences of pulses having different energy levels or different doses.
Scanning Linear Accelerator System Having Stable Pulsing At Multiple Energies and Doses
A linac-based X-ray system for cargo scanning and imaging applications uses linac design, RF power control, beam current control, and beam current pulse duration control to provide stable sequences of pulses having different energy levels or different doses.
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.
Method and Apparatus for Radiating Charged Particles, and Method and Apparatus for Emitting X-Rays
In the present invention, a ferroelectric body is irradiated with ultraviolet light, and the ferroelectric body is caused to stably generate electric potential. A method for radiating charged particles, in which the UV-light-receiving surface of the ferroelectric body that receives UV light and is caused to generate a potential difference is irradiated with UV light having a wavelength not transmitted by the ferroelectric body, and charged particles are radiated from the charged-particle-radiation surface of the ferroelectric body, wherein the UV-light-receiving surface is irradiated with pulses of UV light at a peak power of 1 MW or greater. The pulse width of the UV light is measured in picoseconds (less than 1×10.sup.−9 seconds), and the UV pulses can be transmitted by fiber.
Method and Apparatus for Radiating Charged Particles, and Method and Apparatus for Emitting X-Rays
In the present invention, a ferroelectric body is irradiated with ultraviolet light, and the ferroelectric body is caused to stably generate electric potential. A method for radiating charged particles, in which the UV-light-receiving surface of the ferroelectric body that receives UV light and is caused to generate a potential difference is irradiated with UV light having a wavelength not transmitted by the ferroelectric body, and charged particles are radiated from the charged-particle-radiation surface of the ferroelectric body, wherein the UV-light-receiving surface is irradiated with pulses of UV light at a peak power of 1 MW or greater. The pulse width of the UV light is measured in picoseconds (less than 1×10.sup.−9 seconds), and the UV pulses can be transmitted by fiber.
BEAM DUMP APPARATUS, LASER APPARATUS EQUIPPED WITH THE BEAM DUMP APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS
A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.
PRODUCTION OF MOLYBDENUM-99 USING ELECTRON BEAMS
An apparatus for producing .sup.99Mo from a plurality of .sup.100Mo targets through a photo-nuclear reaction on the .sup.100Mo targets. The apparatus comprises: (i) an electron linear accelerator component; (ii) a converter component capable of receiving the electron beam and producing therefrom a shower of bremsstrahlung photons; (iii) a target irradiation component for receiving the shower of bremsstrahlung photons for irradiation of a target holder mounted and positioned therein. The target holder houses a plurality of .sup.100Mo target discs. The apparatus additionally comprises (iv) a target holder transfer and recovery component for receiving, manipulating and conveying the target holder by remote control; (v) a first cooling system sealingly engaged with the converter component for circulation of a coolant fluid therethrough; and (vi) a second cooling system sealingly engaged with the target irradiation component for circulation of a coolant fluid therethrough.
PRODUCTION OF MOLYBDENUM-99 USING ELECTRON BEAMS
An apparatus for producing .sup.99Mo from a plurality of .sup.100Mo targets through a photo-nuclear reaction on the .sup.100Mo targets. The apparatus comprises: (i) an electron linear accelerator component; (ii) a converter component capable of receiving the electron beam and producing therefrom a shower of bremsstrahlung photons; (iii) a target irradiation component for receiving the shower of bremsstrahlung photons for irradiation of a target holder mounted and positioned therein. The target holder houses a plurality of .sup.100Mo target discs. The apparatus additionally comprises (iv) a target holder transfer and recovery component for receiving, manipulating and conveying the target holder by remote control; (v) a first cooling system sealingly engaged with the converter component for circulation of a coolant fluid therethrough; and (vi) a second cooling system sealingly engaged with the target irradiation component for circulation of a coolant fluid therethrough.
Sensor system
A system, comprising an optical component that, in operational use of the optical component, optically interacts with a laser beam, an electrically conductive element disposed on or within the optical component that, in operational use of the optical component, is exposed to the laser beam, and a monitoring system operative to monitor a physical quantity representative of an electrical resistance of the electrically conductive element and to determine based on the physical quantity, a position of the laser beam relative to the optical component.
Apparatus for and method of source material delivery in a laser produced plasma EUV light source
A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.