There is provided a laser system that may include a Raman cell, a pumping light generator, and a Raman cell laser unit. The pumping light generator may include one or more optical parametric amplifiers (OPAs), and may be configured to output first Raman-cell pumping light and second Raman-cell pumping light to the Raman cell. The Raman cell laser unit may be configured to output probing light as a target of wavelength conversion to the Raman cell.

There is provided a laser system that may include a Raman cell, a pumping light generator, and a Raman cell laser unit. The pumping light generator may include one or more optical parametric amplifiers (OPAs), and may be configured to output first Raman-cell pumping light and second Raman-cell pumping light to the Raman cell. The Raman cell laser unit may be configured to output probing light as a target of wavelength conversion to the Raman cell.

A Free Electron Laser source includes: a fiber-based laser having a plurality of amplifying fibers wherein an initial laser pulse is distributed and amplified, and element for grouping together the elementary pulses amplified in the fiber in order to form an a single amplified global laser pulse; a laser plasma accelerator wherein the global laser pulse generates relativistic electron beams, a beam focusing system transporting electron beams from the laser plasma accelerator, an undulator wherein relativistic electron beams generate an electromagnetic beam, and a beam separator system, wherein the electron beam and the electromagnetic beam are separated.

A Free Electron Laser source includes: a fiber-based laser having a plurality of amplifying fibers wherein an initial laser pulse is distributed and amplified, and element for grouping together the elementary pulses amplified in the fiber in order to form an a single amplified global laser pulse; a laser plasma accelerator wherein the global laser pulse generates relativistic electron beams, a beam focusing system transporting electron beams from the laser plasma accelerator, an undulator wherein relativistic electron beams generate an electromagnetic beam, and a beam separator system, wherein the electron beam and the electromagnetic beam are separated.

The present invention provides a burst-laser generator using an optical resonator which produces high pulse-strength of burst-laser in order to conduct laser Compton scattering, comprising: a self-oscillation amplifying optical loop-path and an external optical resonator to burst-amplify laser, wherein, laser supplied by an exciting laser source is self-oscillation amplified with the self-oscillation amplifying optical loop-path and further burst-amplified with the external optical resonator.

The present invention provides a burst-laser generator using an optical resonator which produces high pulse-strength of burst-laser in order to conduct laser Compton scattering, comprising: a self-oscillation amplifying optical loop-path and an external optical resonator to burst-amplify laser, wherein, laser supplied by an exciting laser source is self-oscillation amplified with the self-oscillation amplifying optical loop-path and further burst-amplified with the external optical resonator.

A radiation source contains a collector module comprising an optical collector, positioned in a vacuum chamber with an emitting plasma, further comprising a means for debris mitigation which include at least two casings arranged to output debris-free homocentric beams of the short-wavelength radiation, coming to the optical collector preferably consisting of several identical mirrors. Outside each casing there are permanent magnets that create a magnetic field inside the casings to mitigate charged fraction of debris particles and provide the debris-free homocentric beams of short-wavelength radiation. Other debris mitigating techniques are additionally used. Preferably the plasma is laser-produced plasma of a liquid metal target supplied by a rotating target assembly to a focus area of a laser beam. The technical result of the invention is the creation of high-powerful high-brightness debris-free sources of short-wavelength radiation with large, preferably more than 0.25 sr, collection solid angle.

A linac-based X-ray system for cargo scanning and imaging applications uses linac design, RF power control, beam current control, and beam current pulse duration control to provide stable sequences of pulses having different energy levels or different doses.

A linac-based X-ray system for cargo scanning and imaging applications uses linac design, RF power control, beam current control, and beam current pulse duration control to provide stable sequences of pulses having different energy levels or different doses.

A projection exposure apparatus (10) for microlithography has a plurality of optical components (M1-M6) forming an exposure beam path, as well as a distance measurement system (30, 130, 230) configured to measure a distance between at least one of the optical components and a reference element (40, 140, 240). The distance measurement system comprises a frequency comb generator (32, 132, 232), which is configured to generate electromagnetic radiation (36, 236) having a comb-shaped frequency spectrum.