H05H9/00

PARTICLE BEAM GUN CONTROL SYSTEMS AND METHODS
20200330798 · 2020-10-22 ·

Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 sec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.410{circumflex over ()}6cGy/bunch.

METHOD AND APPARATUS FOR PROCESSING A PARTICLE SHOWER USING A LASER-DRIVEN PLASMA
20200335237 · 2020-10-22 ·

A method and apparatus for processing a particle shower using a laser-driven plasma is provided. The method comprises interacting a particle shower with a processing laser-driven plasma stage, the particle shower comprising at least one particle species, wherein the laser is a high-energy, ultra-short pulse laser. In some embodiments, the method comprises accelerating, decelerating, trapping, or collimating the at least one particle species in the processing laser-drive plasma stage. Particularly, the embodiments enable generating high energy particle beams that were only possible using accelerators spanning several hundred meters, in a space of a few meters.

Ultra-compact mass analysis device and ultra-compact particle acceleration device
10804087 · 2020-10-13 ·

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.

Ultra-compact mass analysis device and ultra-compact particle acceleration device
10804087 · 2020-10-13 ·

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.

Compact high energy ion implantation system

An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.

Compact high energy ion implantation system

An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.

Using a rotating 2D X-ray imager as an imaging device to perform target tracking during radiation treatment delivery

A method includes receiving, from a volumetric imager, a first image including a target of a patient. The method further includes receiving a second image including the target of the patient. The method further includes tracking, by a processing device, a position of the target using the first image and the second image.

Electron beam transport system

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

Electron beam transport system

An electron beam transport system for controlling the position of two different electron beams comprises: a main electron beam transport module; a first input electron beam transport module; a second input electron beam transport module; and a controller. The main electron beam transport module comprises a beam monitoring device disposed at a measurement position. The first input electron beam transport module comprises a first actuator for applying a perturbation to a transverse position of a first electron beam at a first actuation point. The second input electron beam transport module comprises a second actuator for applying a perturbation to a transverse position of a second electron beam at a second actuation point. The controller is operable to receive a signal from the beam monitoring device and to send control signals to the first actuator and the second actuator. The controller is operable to determine a first quantity indicative of a difference in a transverse position of the first and second electron beams and a second quantity indicative of an average transverse position of the first and second electron beams. The controller is further operable to control the trajectories of the first and second electron beams independently by implementing a first control loop that iteratively attempts to reduce the first quantity by using the first actuator to perturb a trajectory of the first electron beam, and a second control loop that iteratively perturbs a trajectory of the second electron beam using the second actuator such that the average transverse position of the two different electron beams moves towards a desired transverse position.

A couch-mounted stereoscopic surface imaging and biofeedback system
20200230438 · 2020-07-23 ·

A patient-guided surface stereoscopic imaging and biofeedback system is provided that includes a patient couch mounting system, an array of at least two imaging sensors, a viewing screen that displays images derived from the imaging sensors to a patient, where the imaging sensors, the viewing screen, and the controller are configured to output to a user 3D surface information of the patient under test, extrapolated 2D patient under test position information, and 1D patient under test position information, where the controller is configured to control the viewing screen to display the images from the imaging sensors, where the viewing screen further displays patient position boundary markers that are configured to overlay the displayed images on the viewing screen to provide biofeedback to a patient under test during radiotherapy treatment.