NAND string configurations and semiconductor memory arrays that include such NAND string configurations are provided. Methods of making semiconductor memory cells used in NAND string configurations are also described.

Films that can be useful in large area gap fill applications, such as in the formation of advanced 3D NAND devices, involve processing a semiconductor substrate by depositing on a patterned semiconductor substrate a doped silicon oxide film a doped silicon oxide film configured to expand upon annealing at a temperature above the films glass transition temperature, and annealing the doped silicon oxide film to a temperature above the film glass transition temperature. In some embodiments, reflow of the film may occur. The composition and processing conditions of the doped silicon oxide film may be tailored so that the film exhibits substantially zero as-deposited stress and substantially zero stress shift post-anneal.

According to one embodiment, a semiconductor memory device includes: a first bit line; a first memory cell transistor coupled to the first bit line; and a first capacitor coupled between the first memory cell transistor and the first bit line.

According to one embodiment, a semiconductor memory device includes: a first bit line; a first memory cell transistor coupled to the first bit line; and a first capacitor coupled between the first memory cell transistor and the first bit line.

The Vertical System Integration (VSI) invention herein is a method for integration of disparate electronic, optical and MEMS technologies into a single integrated circuit die or component and wherein the individual device layers used in the VSI fabrication processes are preferably previously fabricated components intended for generic multiple application use and not necessarily limited in its use to a specific application. The VSI method of integration lowers the cost difference between lower volume custom electronic products and high volume generic use electronic products by eliminating or reducing circuit design, layout, tooling and fabrication costs.

A semiconductor device may include a first active region including a first main region and a first protruding part. The semiconductor device may include a second active region including a second main region and a second protruding part. The semiconductor device may include a first transistor formed on the first active region. The semiconductor device may include a second transistor formed on the second active region. The semiconductor device may include a connecting structure connecting the first protruding part and the second protruding part to each other.

Microelectronic devices include a stack structure of vertically alternating insulative and conductive structures arranged in tiers. The insulative structures of a lower portion of the stack structure are thicker than the insulative structures of an upper portion. The conductive structures of the lower portion are as thick, or thicker, than the conductive structures of the upper portion. At least one feature may taper in width and extend vertically through the stack structure. The thicker insulative structures of the lower portion extend a greater lateral distance from the at least one feature than the lateral distance, from the at least one feature, extended by the thinner insulative structures of the upper portion. During methods of forming such devices, sacrificial structures are removed from an initial stack of alternating insulative and sacrificial structures, leaving gaps between neighboring insulative structures. Conductive structures are then formed in the gaps. Systems are also disclosed.

According to one embodiment, a method of controlling a memory device includes supplying a second potential having a first value to a second electrode and simultaneously, or thereafter, supplying a third potential to a third electrode, and thereafter stopping supply of the third potential such that the potential of the third electrode decays while reducing the potential of the second electrode, and thereafter supplying a first potential to the first electrode.

According to an embodiment, a semiconductor device includes a first circuit, a second circuit, and a third circuit. The first circuit is configured to receive a first signal, and output a first voltage to a first node in accordance with a voltage of the first signal being at a first level and output a second voltage to the first node in accordance with the voltage of the first signal being at a second level. The first voltage is higher than the second voltage. The second circuit is coupled to the first node and configured to latch data based on a voltage of the first node. The third circuit includes a first inverter. The first inverter includes a first input terminal coupled to the first node and a first output terminal coupled to the first node.

A memory system has a nonvolatile memory which comprises memory cells capable of storing 4-bit data of first to fourth bits by sixteen threshold regions including a first threshold region corresponding to an erased state and second to sixteenth threshold regions having higher voltage levels than a voltage level of the first threshold region corresponding to a written state; and a controller which causes the nonvolatile memory to execute a first program for writing data of the first bit and the second bit and then causes the nonvolatile memory to execute a second program for writing data of the third bit and the fourth bit. The controller controls such that the threshold region is any threshold region of a seventeenth threshold region corresponding to an erased state and eighteenth to twentieth threshold regions having higher voltage levels than that of the seventeenth threshold region corresponding to a written state.