C01B9/00

POROUS METAL HALIDE FILM, FABRICATION METHOD THEREOF, AND FABRICATION METHOD OF ORGANOMETAL HALIDE HAVING PEROVSKITE STRUCTURE USING THE SAME

Provided are a porous metal halide film that reacts with an organic halide to be converted into an organometal halide having a perovskite structure, thereby fabricating the organometal halide, a fabrication method thereof, and a fabrication method of an organometal halide having a perovskite structure using the same, and specifically, the porous metal halide film according to the present disclosure satisfies Relational Expression 1 below:


I(101)/I(001)?0.5(Relational Expression 1) in Relational Expression 1, I(101) is a diffraction intensity of a (101) plane in X-ray diffraction pattern using a Cu K? line of the porous metal halide film, and I(001) is a diffraction intensity of the (001) plane in the same X-ray diffraction pattern.

Solid-electrolyte material and battery including the same

A solid-electrolyte material includes Li, Y, O, and X. X is at least two elements selected from the group consisting of F, Cl, Br, and I.

Method and apparatus for producing compound powders
09926197 · 2018-03-27 · ·

A gas atomization apparatus is disclosed for producing high purity fine refractory compound powders. After the system reaches high vacuum, a first stage inert atomizing gas breaks superheated metal melt into droplets and a second stage reactive atomizing gas breaks the droplets further into ultrafine droplets while reacts with them to form refractory compound powders. The first stage atomizing gas is inert gas able to break up melt into droplets and prevent crust formation on the nozzle front. A reaction time enhancer is arranged at bottom of reaction chamber to furnish a reactive gas flow in a reverse direction of the falling droplets and powders. Under the reverse gas flow, the falling droplets and powders change moving direction and travel longer distance in reaction chamber to increase reaction time. This apparatus can produce refractory powders with ultrahigh purity and uniform powder size while maintain high process energy efficiency.

Method and apparatus for producing compound powders
09926197 · 2018-03-27 · ·

A gas atomization apparatus is disclosed for producing high purity fine refractory compound powders. After the system reaches high vacuum, a first stage inert atomizing gas breaks superheated metal melt into droplets and a second stage reactive atomizing gas breaks the droplets further into ultrafine droplets while reacts with them to form refractory compound powders. The first stage atomizing gas is inert gas able to break up melt into droplets and prevent crust formation on the nozzle front. A reaction time enhancer is arranged at bottom of reaction chamber to furnish a reactive gas flow in a reverse direction of the falling droplets and powders. Under the reverse gas flow, the falling droplets and powders change moving direction and travel longer distance in reaction chamber to increase reaction time. This apparatus can produce refractory powders with ultrahigh purity and uniform powder size while maintain high process energy efficiency.

Expanded graphite sheet and method of manufacturing same
09556033 · 2017-01-31 · ·

An expanded graphite sheet is provided that can remarkably improve the quality and yield rate by preventing chipping and cracks in the surface in molding the sheet into a desired shape by inhibiting degradation in the flexibility while reducing the ash content to a certain degree. An expanded graphite sheet (3) has a flexibility of 25 times or greater, as determined in a flexibility test in which the flexibility is defined as the number of times the expanded graphite sheet (3) can be bent using a flexibility testing device having a rotator (2) to which one end of a plate-shaped expanded graphite sheet (3) is fixed, a weight (7) fixed to the other end of the expanded graphite sheet (3), and a bending position determining member (5) for determining a bending position of the expanded graphite sheet (3) when the rotator (2) is rotated.

Graphene and graphene derivatives as substrate coatings

A coating layer for a substrate includes a coating material. The coating material includes graphene and/or graphene derivatives that reflect and/or absorb an electromagnetic (EM) wave having a frequency of above 20 GHz. The coating layer is deposited on a surface of the substrate.