The invention provides a chemical-mechanical polishing composition comprising: (a) colloidal silica particles that are surface modified with metal ions selected from Mg, Ca, Al, B, Be, and combinations thereof, and wherein the colloidal silica particles have a surface hydroxyl group density of from about 1.5 hydroxyls per nm.sup.2 to about 8 hydroxyls per nm.sup.2 of a surface area of the particles, (b) an anionic surfactant, (c) a buffering agent, and (d) water, wherein the polishing composition has a pH of about 2 to about 7, and wherein the polishing composition is substantially free of an oxidizing agent that oxidizes a metal. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon nitride, silicon oxide, and/or polysilicon.

The CMP polishing liquid of the invention comprises a metal salt containing at least one type of metal selected from the group consisting of metals of Groups 8, 11, 12 and 13, 1,2,4-triazole, a phosphorus acid, an oxidizing agent and abrasive grains. The polishing method of the invention comprises a step of polishing at least a palladium layer with an abrasive cloth while supplying a CMP polishing liquid between the palladium layer of a substrate having the palladium layer and the abrasive cloth, wherein the CMP polishing liquid comprises a metal salt containing at least one type of metal selected from the group consisting of metals of Groups 8, 11, 12 and 13, 1,2,4-triazole, a phosphorus acid, an oxidizing agent and abrasive grains.

A method etching a glass material comprises providing an etchant comprising 10-30% HF, 5-15% HNO.sub.3,and at least 10% H.sub.3PO.sub.4 by volume constituted such that the ratio HF:HNO.sub.3 by volume is in the range of 1.7:1 to 2.3:1, providing a glass material to be etched, and contacting the glass material with the etchant. The etchant desirably has no other acid components. The method may be performed with the etchant temperature within the range of 20-30° C. The glass material may be an aluminosilicate glass. Ultrasound energy may be applied to the etchant, to the glass material, or both.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.

An apparatus and method to machine cavities in die blanks having little to no taper. The apparatus includes an elec trode tool (200) including intersecting walls coated with electrically insulating coating (258), an erosion face (204) comprising a cross section of the walls exposed through the electrically insulating coating, and a channel formed by the walls to supply electrolyte to the erosion face, the channels defined by interior surfaces of the walls and having an opening formed by edges of the erosion face. The method includes pulsed electrochemical machining a work piece with the electrode tool.

An apparatus and method to machine cavities in die blanks having little to no taper. The apparatus includes an elec trode tool (200) including intersecting walls coated with electrically insulating coating (258), an erosion face (204) comprising a cross section of the walls exposed through the electrically insulating coating, and a channel formed by the walls to supply electrolyte to the erosion face, the channels defined by interior surfaces of the walls and having an opening formed by edges of the erosion face. The method includes pulsed electrochemical machining a work piece with the electrode tool.

An implantable object (1000′) and a method (100) of fabricating an implantable object is disclosed. The method (100) comprises melting a powder (210) comprising at least nickel and titanium with an energy source (220) and iteratively forming a plurality of stacked metallic layers (330) from the melted powder using an additive manufacturing technique. The implantable object is biased to expand from a first configuration (501) to a second configuration (502) when at or above a transformation temperature.

An implantable object (1000′) and a method (100) of fabricating an implantable object is disclosed. The method (100) comprises melting a powder (210) comprising at least nickel and titanium with an energy source (220) and iteratively forming a plurality of stacked metallic layers (330) from the melted powder using an additive manufacturing technique. The implantable object is biased to expand from a first configuration (501) to a second configuration (502) when at or above a transformation temperature.

The invention relates to a method for recovery of Nd.sub.2Fe.sub.14B grains from bulk sintered Nd—Fe—B magnets and/or magnet scraps. In this method the Nd—Fe—B magnets (1) and/or magnet scraps are anodically oxidized using a non-aqueous liquid electrolyte (5), said anodic oxidation releasing the Nd.sub.2Fe.sub.14B grains (6) in said Nd—Fe—B magnets (1) and/or magnet scraps. The released Nd.sub.2Fe.sub.14B grains (6) are collected during and/or after said anodic oxidation. The proposed method allows a more environmental friendly and cost-effective way for recycling EOL Nd—Fe—B magnets/Nd—Fe—B magnet scraps.

A system for electroplating a web of conductive material with a source material comprises a transport mechanism, an electrical contact, a plating bath, and at least one nozzle. The transport mechanism transports the web through the system. The electrical contact electrically engages the web to cause current to flow into the web. The plating bath contains a volume of an electrically conductive liquid contain ions of the source material. The nozzle is configured to flow a low electrical conductivity fluid onto the web. A portion of the web is immersed in the electrically conductive liquid. The current flowing in the web causes the ions of the source material in the electrically conductive liquid to attach to a surface of the portion of the web.