The present specification relates to a connecting material for a solid oxide fuel cell, comprising a conductive substrate; and a ceramic protective film provided on one surface of the conductive substrate, in which the ceramic protective film comprises an oxide represented by Formula 1, a manufacturing method thereof, and a solid oxide fuel cell comprising the same.

Proposed is a method for manufacturing a spherical YOF-based powder. Specifically, proposed is a method for manufacturing a spherical YOF-based powder. The YOF-based powder injected into the plasma jet and melted into the refrigerant in a droplet state is sprayed and quenched, thereby improving density and controlling the component ratio through particle spheroidization.

Proposed is a method for manufacturing a spherical YOF-based powder. Specifically, proposed is a method for manufacturing a spherical YOF-based powder. The YOF-based powder injected into the plasma jet and melted into the refrigerant in a droplet state is sprayed and quenched, thereby improving density and controlling the component ratio through particle spheroidization.

A method includes applying a material coating on a surface of a machine component using a thermal spray, wherein the material coating is formed from a combination of a hardfacing material and aluminum-containing particles. The method also includes thermally treating the material coating to generate an oxide layer comprising aluminum from the aluminum-containing particles, wherein the oxide layer is configured to reduce oxidation of the hardfacing material.

In one example, a method for forming an environmental barrier coating (EBC) and/or abradable coating on a substrate. The method may include depositing a coating on a ceramic or ceramic matrix composite (CMC) substrate to form an as-deposited coating, wherein the coating includes at least one of an environmental barrier coating (EBC) and an abradable coating. The method further comprises heat treating the as-deposited coating at or above a first temperature for a first period of time following the deposition of the as-deposited coating on the substrate, wherein heat treating the as-deposited coating includes heating the as-deposited coating to or above the first temperature at a controlled rate. The heat treatment may be configured to at least one of decrease the open pores and/or microcracks of the heat-treated coating compared to the as-deposited coating or control a grain size of the heat-treated coating.

In one example, a method for forming an environmental barrier coating (EBC) and/or abradable coating on a substrate. The method may include depositing a coating on a ceramic or ceramic matrix composite (CMC) substrate to form an as-deposited coating, wherein the coating includes at least one of an environmental barrier coating (EBC) and an abradable coating. The method further comprises heat treating the as-deposited coating at or above a first temperature for a first period of time following the deposition of the as-deposited coating on the substrate, wherein heat treating the as-deposited coating includes heating the as-deposited coating to or above the first temperature at a controlled rate. The heat treatment may be configured to at least one of decrease the open pores and/or microcracks of the heat-treated coating compared to the as-deposited coating or control a grain size of the heat-treated coating.

To provide a new tungsten-based thermal spray coating suitable as e.g. a component for plasma etching device using halogen gas, and a material for thermal spraying for obtaining the thermal spray coating.

A thermal spray coating characterized by containing tungsten as a matrix phase and oxides containing silicon and boron as a dispersed phase, and a component for plasma etching device having such a thermal spray coating. A material for thermal spraying characterized by containing from 1 to 7 wt % of silicon, from 0.5 to 3 wt % of boron and the reminder being tungsten and unavoidable impurities, and a method for producing a thermal spray coating by thermally spraying the material for thermal spraying.

A brake element for a transportation vehicle, having a base body that is planar at least in some regions, to the planar sides of which at least two build-up layers are applied in each case at least in some regions. The build-up layers form a surface which, in the mounted state of the brake element on the transportation vehicle, serves as a friction surface for a brake pad. There is a bonding zone in which both a material of the base body and a material of a build-up layer adjacent to the base body are present, wherein the bonding zone has a thickness perpendicular to an areal extent of a planar side that is less than 10 μm.

A spray nozzle device according to an embodiment includes a first nozzle having a first spray hole for spraying plasma, a second nozzle spaced apart from the first nozzle and having at least one second spray hole through which the plasma sprayed from the first nozzle passes, a coupling member spaced apart from the second nozzle and coupled to the first nozzle, and at least one connecting member connecting the second nozzle with the coupling member. The second nozzle includes at least one inflow channel for the injection of a deposition material into the second spray hole.

A seal system includes a ceramic component, a metallic component, a coating system. The ceramic component has a first surface region that defines a first surface roughness. The metallic component is situated adjacent to the first surface region and has a second surface region facing the first surface region. The coating system includes a silicon-containing layer on the surface region of the ceramic component and barrier layer on the silicon-containing layer. The silicon containing layer has a surface in contact with the barrier layer and the barrier layer has a surface in contact with the metallic component. The surface of the barrier layer has a second surface roughness that is less than the first surface roughness. The barrier layer serves to limit interaction between silicon of the silicon-containing layer and elements of the metallic component. The barrier layer includes at least one of mullite, zircon, or hafnon.