A method of manufacturing an electrode structure includes providing an initial structure, the initial structure including at least two elevated regions extending from a substrate, wherein top portions of the two elevated regions are separated by a first lateral distance, depositing material onto the elevated regions by means of physical vapor deposition such that adjacent top portions of the deposited material are separated by a second lateral distance that is smaller than the first lateral distance, and applying electrodes onto the top portions of the material.

A golf club head having a laser-generated features to create contrast on the club face of the golf club head. The club face includes a central region, a toe region, and a heel region. The central region includes a first plurality of laser-generated features that provide a height-intersection coverage of the central region, a width-intersection coverage of the central region, and a surface-area coverage of the central region. The toe region includes a second plurality of laser-generated features that provide a height-intersection coverage of the toe region, a width-intersection coverage of the toe region, and a surface-area coverage of the toe region. The heel region includes a third plurality of laser-generated features that provide a height-intersection coverage of the heel region, a width-intersection coverage of the heel region, and a surface-area coverage of the heel region.

A surface geometry for an implantable medical electrode that optimizes the electrical characteristics of the electrode and enables an efficient transfer of signals from the electrode to surrounding bodily tissue. The coating is optimized to increase the double layer capacitance and to lower the after-potential polarization for signals having a pulse width in a pre-determined range by keeping the amplitude of the surface geometry with a desired range.

A polishing liquid for polishing a glass substrate includes cerium oxide as polishing abrasive particles, and a substance that reduces cerium oxide in response to irradiation of light.

A method and system is provided for reducing surface roughness of a diesel engine component. The method and system may apply a voltage to a plasma electrolyte polishing cell. The plasma electrolyte polishing cell may include a diesel engine component and an aqueous electrolyte solution. The method and system may cause a plasma layer to form around a surface of the diesel engine component as a result of applying the voltage to the plasma electrolyte polishing cell. The method and system may terminate the voltage to the plasma electrolyte polishing cell. The method and system may apply a coating process to the diesel engine component.

Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 10.sup.8 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

The disclosure provides a metal protective layer, sequentially comprising an organic powder coating, a high-gloss organic coating, a ductile periodic variable alloy protective film and a transparent powder coating, wherein the base powder layer is an epoxy resin or pure polyester powder coating; the high-gloss organic coating is an epoxy resin powder coating, a polyester powder coating, or a polybutadiene organic coating; the ductile periodic variable alloy protective film is formed by direct current magnetron sputtering with two targets in a high vacuum environment, and the material of the targets is composed of a Ni—Cr alloy layer and pure Cr; and the transparent powder layer is an acrylic powder coating or a polyester transparent powder coating.

A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

The invention relates to a method and a vacuum-coating system (10) for coating a band-type material (11), in particular made of metal. For this, the band-type material (11) is moved, via a conveying section (12), in a transport direction (T) and is vacuum-coated within a coating chamber (14), in which a vacuum is applied. As seen in the transport direction (T) of the band-type material (11), at least one flatness optimization device (39) is arranged upstream of the coating chamber (14), through which flatness optimization device the band-type material (11) can be guided. In this way, a desired flatness is generated for the band-type material (11).

An alloy member includes a base member constituted by an alloy material containing chromium, a chromium oxide layer for covering at least a portion of a surface of the base member, a pore that is formed in an interface region of the base member that is located 30 μm or less from an interface between the chromium oxide layer and the base member, and an extending portion extending from the pore into the base member. The pore is configured to inhibit the separation of the chromium oxide layer from the base member The extending portion contains an oxide of an element whose equilibrium oxygen pressure is lower than that of a major element of the base member.