A coated piston ring for a piston is provided. The piston ring includes a running surface, a flank surface, and a transition surface therebetween. The transition surface curves or extends at an angle between the running surface and the flank surface. A running layer is disposed over the running surface and over at least a portion of the transition surface. A flank layer is disposed over the flank surface and over at least a portion of the transition surface. The running layer is applied by physical vapor deposition, and the running layer is applied by galvanic deposition. The running layer is formed of chromium nitride, and the flank layer is formed of chromium. A portion of the flank layer overlaps and is disposed outward of a portion of the running layer. During operation of the piston, the overlapping portion is spaced from both the piston and the cylinder.

A display substrate includes a supporting material layer having at least one flexible material sub-layer and at least one blocking sub-layer, which can be alternately and successively arranged in layers. One blocking sub-layer is at a topmost sub-layer of the supporting material layer, and is provided with a well, located in a display area and configured for accommodating a display component therewithin. One or more of the at least one flexible material sub-layer or the at least one blocking sub-layer is configured as a target material layer. The target material layer includes a planar portion and a protruding portion over the planar portion. An orthographic projection of the protruding portion on a bottom surface of the supporting material layer forms a ring-like structure having an opening that covers an orthographic projection of a bottom surface of the well on the bottom surface of the supporting material layer.

Methods for making solid-state laminate electrode assemblies include methods of forming a solid electrolyte interphase (SEI) by ion implanting nitrogen and/or phosphorous into the glass surface by ion implantation.

A coated tool of the present invention includes a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing aluminum (Al) of 65 atomic % or more 90 atomic % or less, titanium (Ti) of 10 atomic % or more 35 atomic % or less, a total of aluminum (Al) and titanium (Ti) of 85 atomic % or more, and argon (Ar) of 0.20 atomic % or less. The hard coating film satisfies a relationship of Ih×100/Is≤12 when a peak intensity of a (010) plane of AlN of a hexagonal close-packed structure is Ih and a sum of peak intensities due to predetermined nine crystal planes of TiN and AlN is Is in an intensity profile obtained from a selected area diffraction pattern of a transmission electron microscope.

A nitride semiconductor substrate (11, 21) includes: a substrate (2); and an AlN-containing film (100, 200) provided above the substrate (2). A thickness of the AlN-containing film (100, 200) is at most 10000 nm, and a threading dislocation density of the AlN-containing film (100, 200) is at most 2×10.sup.8 cm.sup.−2.

A coated cutting tool and a process for the production thereof id provided. The coated cutting tool consists of a substrate body of WC-Co based cemented carbide and a coating, the coating including a first (Ti,Al)N multilayer, a first gamma-aluminium oxide layer, and a set of alternating second (Ti,Al)N multilayers and second gamma-aluminium oxide layers.

A method of forming a piezoelectric thin film includes sputtering a first surface of a substrate to provide a piezoelectric thin film comprising AlN, AlScN, AlCrN, HfMgAlN, or ZrMgAlN thereon, processing a second surface of the substrate that is opposite the first surface of the substrate to provide an exposed surface of the piezoelectric thin film from beneath the second surface of the substrate, wherein the exposed surface of the piezoelectric thin film includes a first crystalline quality portion, removing a portion of the exposed surface of the piezoelectric thin film to access a second crystalline quality portion that is covered by the first crystalline quality portion, wherein the second crystalline quality portion has a higher quality than the first crystalline quality portion and processing the second crystalline quality portion to provide an acoustic resonator device on the second crystalline quality portion.

An electromagnetic separation type coating device is provided, and belongs to the technical field of vacuum coating. The device comprises a main vacuum cavity, the front side and the rear side of the main vacuum cavity are each provided with a vacuum cavity door, middle positions of the front vacuum cavity door and the rear vacuum cavity door are each provided with a set of magnetron sputtering targets, and the two sets of magnetron sputtering targets are symmetrically arranged; two sets of ion sources are symmetrically arranged on the outer walls of the left side and the right side of the main vacuum cavity, and two sets of magnetic induction coils are symmetrically arranged at two sides of each set of ion sources, respectively; a vacuum pump set is connected to the top of the main vacuum cavity, a workpiece rest is installed at the bottom in the main vacuum cavity, and is used for installing a to-be-deposited sample piece; and an auxiliary anode is further installed in the main vacuum cavity. An electromagnetic separation type coating method is further provided. The electromagnetic separation type coating device and method provided by the present disclosure have the advantages of effectively improving the three-dimensional space plasma density, increasing ion energy, and obtaining a thin film with excellent performance.

The invention relates to a glass substrate including a stack of coating layers having control properties, in which stack comprises at least one niobium metal layer located between a layer of a dielectric material selected from Si.sub.3N.sub.4 or TiOx and a layer of a protective metal material selected from TIN or Ni—Cr, conferring solar control and heat resistance properties on the glass substrate.

A high-temperature component of a refractory metal or a refractory metal alloy has an emissivity-increasing coating. The coating is formed of tantalum nitride and/or zirconium nitride; and tungsten with a tungsten content between 0 and 98 wt. %.