A method for manufacturing catalyst material is provided, which includes putting an M′ target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′.sub.aM″.sub.bN.sub.2 on a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′.sub.aM″.sub.bN.sub.2 is a cubic crystal system.

An electronic device such as a wristwatch may include a conductive housing. A corrosion-resistant coating may be deposited on the conductive housing. The coating may include transition layers and an uppermost alloy layer. The transition layers may include a chromium seed layer on the conductive housing and a chromium nitride layer on the chromium seed layer. The uppermost alloy layer may include TiCrCN or other alloys and may provide the coating with desired optical reflection and absorption characteristics. The transition layers may include a minimal number of coating defects, thereby eliminating potential sites at which visible defects could form when exposed to salt water. This may allow the electronic device to exhibit a desired color and to be submerged in salt water without producing undesirable visible defects on the conductive housing structures.

A method for coating substrates with a decorative layer of hard material which is guided into a vacuum coating chamber. The decorative layer of hard material is deposited by a reactive HIPIMS-process, and the energy content in the power pulses is controlled in such a manner that the deposited layer of hard material has a homogeneous colour, a high degree of smoothness and a high strength.

To provide a decorative member having a cherry blossom pink color.

A cherry blossom pink decorative member of the present invention includes a base and a decorative coating formed on the base, wherein the decorative coating is formed by layering an undercoat layer and a finishing layer from the base side, the undercoat layer is a carbonitride layer composed of a carbonitride of a metal containing Ti and at least one selected from Nb and Ta, and the finishing layer is a Au alloy layer composed of an alloy containing Au, a metal having a silver color, and Cu.

Provided are: an oriented electromagnetic steel sheet with outstanding coating adhesion and magnetic properties after stress relief annealing; and a method for manufacturing the oriented electromagnetic steel sheet. The oriented electromagnetic steel sheet comprises: a steel sheet; a non-oxide ceramic coating disposed on the steel sheet and containing a non-oxide; and an insulating tensile coating disposed on the non-oxide ceramic coating and containing an oxide. The thickness of the non-oxide ceramic coating is 0.020-0.400 μm. The thickness of the insulating tensile coating is at least 1.0 μm. The chromium content on the steel plate side of the non-oxide ceramic coating is less than 25 atomic %, and the chromium content on the insulating tensile coating side of the non-oxide ceramic coating is at least 25 atomic %.

A method for preparing a bactericidal film having a titanium carbonitride carrier layer on metal comprising preprocessing, polishing, plating a bactericidal film carrier layer and a bactericidal film. The surface of the polished metal is smooth. During the plating process, as silver ions do not react with carbon and nitrogen, through changing the number of carbon and nitrogen atoms, various desired colors of the bactericidal film may be achieved. Subsequently, a nano silver sputtering target is initiated, which enables silver ions with bactericidal effect to be uniformly distributed in the titanium carbonitride film layer, thus forming a colored bactericidal film with bactericidal effect. The workpiece is hung on the hanging rack during the plating process, which allows the rotation and revolution of the workpiece to be simultaneously achieved, thus realizing a uniform plating during the target's sputtering while avoiding damage to the workpiece due to local high temperature.

Disclosed are a component for a fuel injector and a method for coating the same. The component for the fuel injector may include a base material, a bonding layer laminated on the base material, a support layer laminated on the outer surface of the bonding layer, and an NbSiCN functional layer including an NbCN layer and an SiCN layer and alternately laminated on the outer surface of the support layer, thereby reducing friction, high hardness, shock resistance, heat resistance, and durability of the component for the fuel injector.

In an embodiment, a cutting insert including a base member, a first face, a second face, a cutting edge, and a nose portion. The base member includes a coating layer on at least a part thereof. The first face has corner portions. The second face is adjacent to the first face. The cutting edge is on at least a part of the ridgeline portion of the first face and the second face, and includes first and second cutting edges. The first cutting edge is on the coating layer and has a C chamfered surface with a first width of 5 μm to 30 μm in the front view of the first face and a chamfer angle of 35° to 50°. The nose portion is at the corner portions between the first cutting edge and the second cutting edge.

A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (Al.sub.aTi.sub.bCr.sub.cα.sub.d)N, where α is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (Al.sub.eTi.sub.fCr.sub.gβ.sub.h)C.sub.xN.sub.1-X, where β is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [Al.sub.iCr.sub.j(SiC).sub.kγ.sub.l]C.sub.YN.sub.1-Y, where γ is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.

A resistive memory element comprises a first electrode, an active material over the first electrode, a buffer material over the active material and comprising longitudinally extending, columnar grains of crystalline material, an ion reservoir material over the buffer material, and a second electrode over the ion reservoir material. A memory cell, a memory device, an electronic system, and a method of forming a resistive memory element are also described.