A method for produce a boron containing film by admitting a gaseous boron precursor into a vacuum chamber containing a substrate and directing an electron beam or ion beam into the vacuum chamber onto to the surface of the substrate. The electron beam or ion beam dissociates the gaseous boron precursor at the surface of the substrate creating non-volatile fragments that bind to the substrate surface forming a boron containing film.

A coating source for physical vapor deposition has a coating material which consists of a brittle material and has cracks. The coating source additionally has a support element which is joined to the coating material at a surface of the coating material. Furthermore, the coating material has structuring on at least parts of a surface of the coating material. There is also described a process for producing a coating source.

A pressing tool for producing a workpiece having a pressing surface comprises a base structure and at least two ceramic layers which are arranged on top of one another on the surface and form the pressing surface, of which one of the ceramic layers is a full-surface ceramic layer with one degree of gloss and the other is a partial ceramic layer with a further degree of gloss which differs from the degree of gloss of the full-surface ceramic layer.

A pressing tool for producing a workpiece having a pressing surface. The pressing tool comprises a base structure and at least two ceramic layers which are arranged on the surface and form the pressing surface, of which a first ceramic layer has a first degree of gloss, and a second ceramic layer has a second degree of gloss, which differs from the first degree of gloss of the first ceramic layer.

A method for coating stainless steel press plates includes preparing the stainless steel press plate for coating and coating the stainless steel press plate with a diboride doped with 1%-5% by weight aluminum to produce a diboride-aluminum coating. The step of coating includes applying the diboride-aluminum coating to a stainless steel press plate using a magnetron sputter coating system.

A method for monitoring a device for supplying temperature control media to a mold of a molding machine, wherein the device has a feed line and a return line between which a temperature control line is arranged, a measuring element arranged in each of the temperature control lines actually to be monitored, and a control element arranged in each temperature control line to be regulated or to be controlled. A pressure drop in the temperature control line is measured, a hydraulic resistance and/or a change in resistance of the temperature control line is calculated based on an a volumetric flow rate measured using the measuring element and based on the measured pressure drop. The degree of opening of the control element is taken into consideration in the calculation of the hydraulic resistance and/or the change in resistance.

A target, in particular a sputtering target, includes a target plate of a brittle material and a back plate. The back plate is connected to the target plate over an area and the target plate has micro cracks which pass through from the front side to the rear side of the target plate and divide the target plate into adjacent fragments. A process is also provided for producing such a target which is suitable, in particular, for the use of extremely high power densities. A vacuum coating process uses at least one such target as a sputtering target and as a result particularly high power densities can be used on the target during the sputtering.

A guiding member, having a body provided with a bore for mounting a mobile element is presented. The body consists of a metallic material. The bore has a surface layer treated against jamming over a diffusion depth of less than or equal to 0.6 mm. The surface layer has a hardness of greater than or equal to 500 Hv1 over a depth of between 5 and 50 ?m.

A sputtering target structure includes a back plate characterized by a first size, and a plurality of sub-targets bonded to the back plate. Each of the sub-targets is characterized by a size that is a fraction of the first size and is equal to or less than a threshold target size. Each sub-target includes a ferromagnetic material containing iron (Fe) and boron (B). Each of the plurality of sub-targets is in direct contact with one or more adjacent sub-targets.

A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.