A method for manufacturing an aluminum alloy sheet may include melting aluminum alloy composition containing silicon (Si), iron (Fe), copper (Cu) and manganese (Mn) in weight % on the basis of remainder of aluminum (Al) to make cast alloy having a constant initial thickness; rolling the cast alloy to allow the initial thickness to be reduced, whereby the cast alloy is elongated to aluminum alloy sheet; and performing heat treatment on the aluminum alloy sheet.

A glazing includes a glass substrate on which is deposited a coating including at least one layer, the layer being formed from a material including metal nanoparticles dispersed in an inorganic matrix of an oxide, in which the metal nanoparticles are made of a metal chosen from the group formed by silver, gold, platinum, copper and nickel or of an alloy formed from at least two of these metals, in which the matrix including an oxide of at least one element chosen from the group of titanium, silicon and zirconium and in which the atomic ratio M/Me in the material is less than 1.5, M representing all atoms of the elements of the group of titanium, silicon and zirconium present in the layer and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel present in the layer.

Techniques and devices including a biocompatible antibacterial film are provided. An example method for depositing a biocompatible antibacterial film using physical vapor deposition (PVD) includes providing a substrate in a PVD processing chamber, forming a deposited film by co-depositing a first material and a second material onto the substrate from a vapor plume, wherein at least the first material is biocompatible and at least the second material is antibacterial, and nano-texturing the deposited film to produce nano-scale surface asperities that provide at least one of inhibition of bacterial growth, promotion of osseointegration, promotion of epithelial attachment, or promotion of endothelial attachment.

There is provided an inexpensive electromagnetic shield that can achieve exceptional shielding and display visibility characteristics, and provide high environmental resistance as necessary. In an electromagnetic shield (1), an intermediate layer (3) is formed on a glass substrate (2) comprising soda lime glass, an electroconductive layer (4) of Al is formed thereon, and openings (5) are formed by wet etching on the intermediate layer (3) and the electroconductive layer (4) after these layers have been formed by sputtering or vacuum deposition. Furthermore, an ITO layer (6) is formed on the entire glass surface including the intermediate layer (3) and the electroconductive layer (4) after the openings (5) are formed. In this configuration, the intermediate layer (3) comprises a mixture of at least one metal selected from chromium, molybdenum, and tungsten, and at least one oxide selected from oxides of silicon, oxides of aluminum, and oxides of titanium.

A cathode sputtering target is formed, on the one hand, from an oxide of at least one element chosen from the group of titanium, silicon and zirconium and, on the other hand, of particles of a metal included in the group formed by silver, gold, platinum, copper and nickel or particles of an alloy formed from at least two of these metals, the atomic ratio M/Me in the target being less than 1.5, M representing all of the atoms of the elements of the group of titanium, silicon and zirconium present in the layer and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel present in the layer.

Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WO.sub.3 and wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B.sub.2O.sub.3 and one or more high-melting-point oxides having a melting point of 1470 C. or higher and 2800 C. or lower.

A solar energy absorbing device includes a substrate and a solar selective absorber film. The solar selective absorber film has a bottom surface attached on the substrate, and a top surface opposite to the bottom surface. The solar selective absorber film is a TiN.sub.xO.sub.y based film, and x and y vary from 1 to 0.1 and 0.2 to 2, respectively, from the bottom surface to the top surface of the solar selective absorber film.

A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is or more, and wherein the sputtering target contains Nb.sub.2O.sub.5 as a metal oxide component.

Provided is a method of cathodic arc process for making a coating containing macroparticles on an airfoil. A structure and/or composition of the macroparticles is selected to provide self-healing of the coating in a corrosive environment, and to provide corrosion resistance and erosion resistance to the coated airfoil.